Preparation of MgO Protective layer for AC PDP by High Energy Particle Bombardment

고속 입자 충격을 도입한 AC PDP의 MgO 보호층 형성에 관한 연구

  • 김영기 (부산대 공대 전기공학과) ;
  • 박정태 (부산대 공대 전기공학과) ;
  • 고광식 (부산대공대 전기공학과) ;
  • 김규섭 (부산대공대 전기공학과) ;
  • 조정수 (부산대공대 전기공학과) ;
  • 박정후 (부산대공대 전기공학과)
  • Published : 2000.09.01

Abstract

The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with dc bias voltage of -10V showed lower discharge voltage and lower erosion rate byion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardement during deposition process.

Keywords

References

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