Journal of Korean Vacuum Science & Technology
- 제3권1호
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- Pages.49-53
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- 1999
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- 1226-6167(pISSN)
Field emission from hydrogen-free DLC
- Suk Jae chung (Department of Physics, Kyung Hee University) ;
- Han, Eun-Jung (Department of Physics, Kyung Hee University) ;
- Lim, Sung-Hoon (Department of Physics, Kyung Hee University) ;
- Jin Jang (Department of Physics, Kyung Hee University)
- 발행 : 1999.04.01
초록
We have studied the field emission characteristics of diamond-like-carbon (DLC) films deposited by a layer-by-layer technique using plasma enhanced chemical vapor deposition, in which the deposition of a thin layer of DLC and a CH4 plasma exposure on its surface were carried out alternatively. The hydrogen-free DLC can be deposited by CH4 plasma exposure for 140 sec on a 5 nm DLC layer. N2 gas-phase doping in the CH4 plasma was also carried out to reduce the work function of the DLC. The optimum [N2]/[CH4] flow rate ratio was found to be 9% for the efficient electron emission, at which the onset-field was 7.2 V/