Chemical Vapour Deposited Diamond for Thermal and Optical Applications

  • Koidi, P. (Fraunhofer-Institut fur Angewandte Festkorperphysik) ;
  • Wild, C. (Fraunhofer-Institut fur Angewandte Festkorperphysik) ;
  • Woerner, E. (Fraunhofer-Institut fur Angewandte Festkorperphysik) ;
  • Muller-Sebert, M. (Fraunhofer-Institut fur Angewandte Festkorperphysik) ;
  • Funer, M. (Fraunhofer-Institut fur Angewandte Festkorperphysik) ;
  • Jehle, M. (Fraunhofer-Institut fur Angewandte Festkorperphysik)
  • 발행 : 1996.12.01

초록

Considerable progress in the development of CVD techniques for the deposition of diamond films has been achieved recently. Despite the polycrystalline structure of this material, its physical properties are now approaching those of natural type IIa diamond crystals. This paper will given some insight into the current status of CVD diamond thechnology with emphasis on optical and thermal applications. The role of process gas impurities like nitrogen will be discussed.

키워드

참고문헌

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