Characterization of a-C/B:H thin films for KSTAR boronization

  • Sun, Jong-Ho (Department of Electrical Engineering, Hanyang University) ;
  • Hong, Suk-Ho (National Fusion Research Institute) ;
  • Woo, Hyun-Jong (Department of Electrical Engineering, Hanyang University) ;
  • Park, Eun-Kyong (Department of Electrical Engineering, Hanyang University) ;
  • Kim, Hye-Ran (Department of Electrical Engineering, Hanyang University) ;
  • Chung, Kyu-Sun (Department of Electrical Engineering, Hanyang University)
  • 발행 : 2010.02.17

초록

KSTAR vacuum vessel has been boronized by carborane ($C_2B_{10}H_{12}$) to reduce various kinds of impurities including carbon and oxygen from the wall, since carborane is solid, non-toxic, non-explosive and is easily evaporated, while diborane ($B_2D_6$) is toxic and explosive. To find the best wall condition for the removal of contaminants before application to KSTAR, various amounts (0.3g, 0.5g, 1g) of carborane are tested in a test chamber, where filament discharge was generated in the mixture of helium and carborane with the same KSTAR target pressure (~ 5 mTorr) from base pressure (${\sim}10^-7\;Torr$). Discharge is performed by a pulse sequence mode with 3 second power on and 5 second power off. Deposited films of a-C/B:H are characterized by ellipsometery, AES and XPS, and are compared with those of KSTAR.

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