Proceedings of the IEEK Conference (대한전자공학회:학술대회논문집)
- 2008.06a
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- Pages.22-23
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- 2008
The DFM-Aware Design with Statistically-based Approaches in 130nm and below
- Jung, Won-Young (TE Center, Dongbu HiTek, Co., Ltd.) ;
- Kim, Taek-Soo (TE Center, Dongbu HiTek, Co., Ltd.)
- Published : 2008.06.18
Abstract
As technology continues to scale down dramatically into 130nm and below, the impacts of process-induced variations on interconnect as well as device become more severe and significant in 130nm and below design. In order to predict changes of circuit characteristics due to process-induced variations accurately and efficiently, the DFM-Aware design environment has been developed and verified.
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