Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2008.02a
- /
- Pages.349-349
- /
- 2008
Plasma parameters of the low dielectric constant SiOC(-H) thin films during the PECVD process
- Jung, An-Soo (Nano thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
- Kim, Chang-Young (Nano thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
- Navamathavan, R. (Nano thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
-
Choi, Chi-Kyu
(Nano thin Film Materials Laboratory, Department of Physics, Cheju National University)
- Published : 2008.02.14
Abstract
Keywords