Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2007.11a
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- Pages.336-337
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- 2007
The effect of $O_2$ flow rate on die characteristics of ATO Thin Films by RF Magnetron Sputtering
RF Magnetron Sputtering을 이용한 ATO 박막의 산소 유량에 따른 특성 변화
- Kyeon, Dong-Min (School of Information and Communication Engineering, Sungkyunkwan University) ;
- Lee, Sung-Uk (School of Information and Communication Engineering, Sungkyunkwan University) ;
- Park, Mi-Ju (School of Information and Communication Engineering, Sungkyunkwan University) ;
- Kim, Young-Ryeol (School of Information and Communication Engineering, Sungkyunkwan University) ;
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Choi, Won-Seok
(Department of Electrical Engineering, Hanbat National University) ;
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Hong, Byung-You
(Center for Advanced Plasma Surface Technology(CAPST), Sungkyunkwan University)
- 견동민 (성균관대학교 정보통신공학부) ;
- 이성욱 (성균관대학교 정보통신공학부) ;
- 박미주 (성균관대학교 정보통신공학부) ;
- 김영렬 (성균관대학교 정보통신공학부) ;
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최원석
(한밭대학교) ;
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홍병유
(플라즈마응용 표면기술 연구센터)
- Published : 2007.11.01
Abstract
현재 투명전극의 재료로 ITO, ZnO,