Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2007.11a
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- Pages.335-335
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- 2007
Effect of annealing temperature on the Structural, Electrical, Optical Properties of ATO Thin Films by RF Magnetron Sputtering
RF Magnetron Sputtering법에 의해 증착된 ATO박막의 열처리에 따른 구조적, 전기적, 광학적 특성 변화
- Moon, In-Gyu (School of Information and Communication Engineering, Sungkyunkwan University) ;
- Lee, Sung-Uk (School of Information and Communication Engineering, Sungkyunkwan University) ;
- Park, Mi-Ju (School of Information and Communication Engineering, Sungkyunkwan University) ;
- Kim, Young-Ryeol (School of Information and Communication Engineering, Sungkyunkwan University) ;
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Choi, Won-Seok
(Department of Electrical Engineering, Hanbat National University) ;
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Hong, Byung-You
(Center for Advanced Plasma Surface Technology(CAPST), Sungkyunkwan University)
- 문인규 (성균관대학교 정보통신공학부) ;
- 이성욱 (성균관대학교 정보통신공학부) ;
- 박미주 (성균관대학교 정보통신공학부) ;
- 김영렬 (성균관대학교 정보통신공학부) ;
-
최원석
(한밭대학교) ;
-
홍병유
(플라즈마응용 표면기술 연구센터)
- Published : 2007.11.01
Abstract
본 연구에서는 RF Magnetron Sputtering 법으로 94:6 wt%의 비율로 Sb가 첨가된