Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)
- 2006.05a
- /
- Pages.659-660
- /
- 2006
- /
- 2005-8446(pISSN)
Fabrication and application of high-aspect-ratio microchannels using laser-induced etching
레이저유도 에칭을 이용한 고세장비 마이크로채널 가공 및 응용
-
Oh Kwang-H.
(Mechatronics Dept., GIST)
;
- Lee M.K. (Mechatronics Dept., GIST) ;
-
Kim S.G.
(Mechatronics Dept., GIST)
;
-
Lim H.T.
(Mechatronics Dept., GIST)
;
-
Jeong S.H.
(Mechatronics Dept., GIST)
-
오광환
(광주과학기술원 기전공학과)
;
- 이민규 (광주과학기술원 기전공학과) ;
-
김수근
(광주과학기술원 기전공학과)
;
-
임현택
(광주과학기술원 기전공학과)
;
-
정성호
(광주과학기술원 기전공학과)
- Published : 2006.05.01
Abstract
High-aspect-ratio(max. 12.5) microchannels with excellent surface quality and good shape uniformity have been realized utilizing laser-induced etching technique. Etch width and depth variations depend largely upon process variables such as laser power and etchant concentration. Etchant concentration in association with viscosity also influence on the cross-sectional profile of the channels. The optimum process conditions for the fabrication of high-aspect-ratio microchannels applicable to micro thermal devices are demonstrated.
Keywords