Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2006.07c
- /
- Pages.1408-1409
- /
- 2006
Dielectric Properties of Plasma Polymerized ppMMA Thin Film
플라즈마 증합법으로 증착된 ppMMA 박막의 유전특성
-
Lim, J.S.
(InHa Univ.)
;
-
Shin, P.K.
(InHa Univ.)
;
- Nam, K.Y. (Yuhan Coll.) ;
- Kim, J.S. (DQAA Korea) ;
-
Hwang, M.H.
(InCheon Univ.)
;
- Kim, J.T. (KIPO) ;
-
Lee, Y.H.
(Halla Univ.)
;
- Kang, D.H. (PuKyong Univ.)
-
임재성
(인하대학교)
;
-
신백균
(인하대학교)
;
- 남광우 (유한대학) ;
- 김진식 (국방품질관리소) ;
-
황명환
(인천대학교)
;
- 김종택 (특허청) ;
-
이은학
(한라대학교)
;
- 강대하 (부경대학교)
- Published : 2006.07.12
Abstract
In this paper, poly methyl methacrylate thin films were deposited on a ITO glass substrate using a plasma polymerization technique. In order to investigate the influence of the plasma coupling method and plasma conditions on the plasma polymerized poly methyl methacrylate (ppMMA) thin film properties, inductively coupled (ICP) and capacitively coupled plasma (CCP) were used to generate the plasma and the plasma parameters were varied. Molecular structures of the ppMMAs were investigated using a Fourier Transform Infrared (FT-IR) spectroscopy. Dielectric constants of the ppMMA thin films were investigated using a impedance analyzer (HP4192A, LF Impedance Analyzer). Current-Voltage (I-V) characteristics of the ppMMA thin films were investigated using a source measurement unit (SMU: Keithley 2400). Relationship between the plasma coupling technique/process parameter and ppMMA thin films properties were investigated.
Keywords