한국정밀공학회:학술대회논문집 (Proceedings of the Korean Society of Precision Engineering Conference)
- 한국정밀공학회 2005년도 추계학술대회 논문집
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- Pages.268-271
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- 2005
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- 2005-8446(pISSN)
AFM 기반 액중 Tribo nanolithography 에서의 마스크 층 내식각성에 관한 연구
Etch Resistance of Mask Layer modified by AFM-based Tribo-Nanolithography in Aqueous Solution
- Park Jeong-Woo (ERC/NSDM, PNU) ;
- Lee Deug-Woo (School of Nano Science and Technology, PNU) ;
- Kawasegi Noritaka (Toyama University) ;
- Morita Noboru (Toyama University)
- 발행 : 2005.10.01
초록
Etch resistance of mask layer on silicon substrate modified by AFM-based Tribo-Nanolithography (TNL) in Aqueous Solution in an aqueous solution was demonstrated. n consists or sequential processes, nano-scratching and wet chemical etching. The simple scratching can form a mask layer on the silicon substrate, which acting as an etching mask. For TNL, a specially designed cantilever with diamond tip, allowing the formation of mask layer on silicon substrate easily by a simple scratching process, has been applied instead of conventional silicon cantilever fur scanning. This study demonstrates how the TNL parameters can affect the etch resistance of mask layer, hence introducing a new process of AFM-based maskless nanolithography in aqueous solution.