Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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A Study on Physical Properties of BP

  • Hong, Kuen-Kee (Dept. of Electrical and Computer Eng., University of Seoul) ;
  • Lee, Young-Won (Dept. of Electrical and Computer Eng., University of Seoul) ;
  • Im, Jong-Hyun (Dept. of Electrical and Computer Eng., University of Seoul) ;
  • Kim, Chul-Ju (Dept. of Electrical and Computer Eng., University of Seoul)
  • Published : 2005.11.10
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Abstract

Boron Phosphide films were deposited on (111) Si substrate at 650 $^{\circ}C$, by the reaction of $B_2H_6$ with $PH_3$ using APCVD. $N_2$ was carried out as carrier gas. The optimal gas rates were 20 m$\ell$/min for $B_2H_6$, 60 m$\ell$/min for $PH_3$ and 1 $\ell$/min for $N_2$. After as grown the films were insitu annealed for 1hour in N$_2$ ambient at $550^{\circ}C$ and measured. The measurement of AFM shows that the RMS is $29.626{\AA}$ for the reaction temperature at 650$^{\circ}C$. The measurement of XRD shows that the films have the orientation of (101). Also, the measurement of AES is shown that the films have $B_{13}P_2$ stoichiometry.

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