Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)
- 2004.10a
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- Pages.590-595
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- 2004
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- 2005-8446(pISSN)
Characteristics of Nanolithography Process on Polymer Thin-film using Near-field Scanning Optical Microscope
근접장현미경을 이용한 폴리머박막 나노리쏘그라피 공정의 특성분석
Abstract
The shape and size variations of the nanopatterns produced on a positive photoresist using a near-field scanning optical microscope(NSOM) are investigated with respect to the process variables. A cantilever type nanoprobe having a 100nm aperture at the apex of the pyramidal tip is used with the NSOM and a He-Cd laser at a wavelength of 442nm as the illumination source. Patterning characteristics are examined for different laser beam power at the entrance side of the aperture(
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