한국공작기계학회:학술대회논문집 (Proceedings of the Korean Society of Machine Tool Engineers Conference)
- 한국공작기계학회 2004년도 춘계학술대회 논문집
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- Pages.494-499
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- 2004
유도결합 플라즈마를 이용한 집속이온빔용 고휘도 이온원의 개발 및 특성연구
Development and characteristic study of high brightness ion source using inductively coupled plasma for focused ion beam
- Kim, Yoon-Jae (Dept.of Nuclear engineering, Seoul National University) ;
- Park, Dong-Hee ;
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Hwang, Yong-Seok
(Dept.of Nuclear engineering, Seoul National University)
- 발행 : 2004.04.01
초록
A ion source using inductively coupled plasma has been tested in order to test its feasibility as a high brightness ion source for focused ion beam. When operating the ion source with filter magentas in front of plasma electrode for a negative ion source, lower remittances are expected. Extracted beam remittances are measured with an Allison-type scanning device for various plasma parameters and extraction conditions. The normalized omittance has been measured to be around 0.2