가공 및 측정이 가능한 복합나노가공시스템의 개발

Development of a multi-functional nano-fabrication system for fabrication and measurement

  • 장동영 (서울산업대학교 산업정보시스템공학과) ;
  • 박만진 (서울대학교 기계항공공학) ;
  • 김진현 (서울대학교 기계항공공학) ;
  • 한동철 (서울대학교 기계항공공학부)
  • 발행 : 2004.04.01

초록

In focused-ion-beam (FIB) application of micromachining and device transplantation, four kinds of FIB processes, namely FIB sputtering, FIB-induced etching, redeposition, and FIB-induced deposition, are well utilized. As with FIB systems, scanning electron microscopes(SEMs) were extensively used in the semiconductor industry. They are the tools of choice for defect review and providing the image resolution needed for process monitoring. The enhanced capabilities of a dual-column on one chamber system are quickly becoming realized by the nano industry for performing a wide range of application.

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