한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지

PECVD 장치를 사용하여 증착된 a-C:H 박막을 이용한 네마틱 액정의 틸트 발생

Generation of Tilt in the nematic liquid crystal using a-C:H Thin Films Deposited Using PECVD Method

  • 박창준 (연세대학교 전기전자공학과) ;
  • 황정연 (연세대학교 전기전자공학과) ;
  • 서대식 (연세대학교 전기전자공학과) ;
  • 안한진 (연세대학교 금속공학과) ;
  • 김경찬 (연세대학교 금속공학과) ;
  • 백홍구 (연세대학교 금속공학과)
  • 발행 : 2003.11.13
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초록

The nematic liquid crystal (NLC) aligning capabilities using a-C:H thin film deposited at the three kinds of rf bias condition were investigated. A high pretilt angle of about $11^{\circ}$ by the ion beam alignment method was observed on the a-C:H thin film (polymer-like carbon) deposited at 1W rf bias condition, and the low pretilt angle of the NLC was observed on the a-C:H thin film(diamond-like carbon) deposited at rf 30W and 60W bias condition. Consequently, the high NLC pretilt angle and the good aligning capabilities of LC alignment by the IB alignment method on the a-C:H thin film deposited at 1W rf bisa condition can be achieved.

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