Hot Wall Epitaxy (HWE) 법에 의한 $CuInTe_2$ 단결정 박막 성장과 가전자대 갈라짐에 대한 광전류연구

Growth and Characterization of $CuInTe_2$ Single Crystal Thin Films by Hot Wall Epitaxy

  • 홍광준 (조선대학교 물리학과) ;
  • 박창선 (조선대학교 신금속소재공학부)
  • 발행 : 2003.11.13

초록

The stochiometric mixture of evaporating materials for the $CuInTe_2$ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, $CuInTe_2$ mixed crystal was deposited on throughly etched GaAs(100) by the Hot Wall Epitaxy(HWE) system. The source and substrate temperature were $610^{\circ}C\;and\;450^{\circ}C$ respectively, and the growth rate of the single crystal thin films was about $0.5{\mu}m/h$. The crystalline structure of single crystal thin films was investigated by the double crystal X-ray diffraction(DCXD). From the photocurrent spectra, we have found that values of spin orbit coupling ${\Delta}So$ and crystal field splitting ${\Delta}Cr$ ware $0.283{\underline{3}}eV\;and\;0.120{\underline{0}}eV$, respectively.

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