Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.07a
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- Pages.75-79
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- 2003
High Density Inductive Coupled Plasma Etching of InP in $BCl_3$ -based chemistries
$BCl_3$ 기반의 혼합 가스들을 이용한 InP 고밀도 유도결합 플라즈마 식각
- Cho, Guan-Sik (In-je University) ;
- Lim, Wan-Tae (In-je University) ;
- Baek, In-Kyoo (In-je University) ;
- Lee, Je-Won (In-je University) ;
- Jeon, Min-Hyun (In-je University)
- Published : 2003.07.10
Abstract
We studied InP etch results in high density planar inductively coupled