Thermodynamic consideration to atomic layer deposition of $Ti_{0.83}Al_{0.17}N$ thin films from $AlCl_3$ and $TiCl_4$ Precursors

$AlCl_3$$TiCl_4$ 전구체로부터 형성된 $Ti_{0.83}Al_{0.17}N$ 원자층 증착 박막의 열역학적인 고려

  • Lee, Yong-Ju (Korea Advanced Institute of Science and Technology (KAIST)) ;
  • Kang, Sang-Won (Korea Advanced Institute of Science and Technology (KAIST))
  • Published : 2002.11.01