Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2002.11a
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- Pages.75-75
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- 2002
Characterization of hafnium oxide/SiON stacked gate dielectrics by atomic layer deposition technique
ALD로 증착시킨 $HfO_2$ /SiON 게이트 유전물질의 특성
Abstract
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