Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2000.04a
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- Pages.125-128
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- 2000
Effect of post-annealing treatment on the properties of ZnO thin films grown by PLD
PLD로 증착한 ZnO 박막의 후열처리 효과 연구
- Published : 2000.04.22
Abstract
ZnO thin films on silicon substrates have been deposited by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of 355 nm. In order to investigate the effect of oxygen post-annealing treatment on the property of ZnO thin films, deposited film has been annealed at the substrate temperature of