한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2000년도 하계학술대회 논문집
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- Pages.608-611
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- 2000
대면적 플라즈마 소스에의 E-ICP 적용과 그 효과 비교
Comparison of E-ICP Effect for Large Area Plasma Source
초록
Large area plasma source becomes important as the substrate size increases. In this work, four inductively coupled plasma(ICP) unit sources are distributed 2