한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2000년도 하계학술대회 논문집
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- Pages.612-615
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- 2000
산화막 식각에 적용된 E-ICP효과와 형상단면비교
Oxide etching characteristics and Etched Profiles by the Enhanced Inductive Coupled Plasma
초록
The etch rate of