• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.34-38
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• 1999

In this study, molybdenum thin films were etched with the various Cl$_2$/(Cl$_2$+SF$_{6}$) gas mixing ratio in an magnetically enhanced reactive ion etching(MERIE) by the etching parameter such as rf power of 185 watts, chamber pressure of 40 mTorr and B-field of 80 gauss. The etch rate was 150 nm/min under Cl$_2$/(Cl$_2$+SF$_{6}$) gas mixing ratio of 0.25. At this time, the selectivity of Mo to SiO$_2$, photoresist were respectively 0.94, 0.50. The surface reaction of the etched Mo thin films was investigated with X - ray photoelectron spectroscopy (XPS).PS).

• 한국환경과학회지
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• 제16권12호
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• pp.1431-1437
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• 2007

Cobalt titanates($CoTiO_x$), such as $CoTiO_3$ and $Co_2TiO_4$, have been synthesized via a solid-state reaction and characterized using X-ray diffraction(XRD) and X-ray photoelectron spectroscopic(XPS) measurement techniques, prior to being used for continuous wet trichloroethylene(TCE) oxidation at $36^{\circ}C$, to support our earlier chemical structure model for Co species in 5 wt% $CoO_x/TiO_2$(fresh) and(spent) catalysts. Each XRD pattern for the synthesized $CoTiO_3$ and $Co_2TiO_4$ was very close to those obtained from the respective standard XRD data files. The two $CoTiO_x$ samples gave Co 2p XPS spectra consisting of very strong main peaks for Co $2p_{3/2}$ and $2p_{1/2}$ with corresponding satellite structures at higher binding energies. The Co $2p_{3/2}$ main structure appeared at 781.3 eV for the $CoTiO_3$, and it was indicated at 781.1 eV with the $Co_2TiO_4$. Not only could these binding energy values be very similar to that exhibited for the 5 wt% $CoO_x/TiO_2$(fresh), but the spin-orbit splitting(${\Delta}E$) had also no noticeable difference between the cobalt titanates and a sample of the fresh catalyst. Neither of all the $CoTiO_x$ samples were active for the wet TCE oxidation, as expected, but a sample of pure $Co_3O_4$ had a good activity for this reaction. The earlier proposed model for the surface $CoO_x$ species existing with the fresh and spent catalysts is very consistent with the XPS characterization and activity measurements for the cobalt titanates.

• 세라미스트
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• 제10권5호
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• pp.74-85
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• 2007

• 한국진공학회:학술대회논문집
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• 한국진공학회 2005년도 제29회 학술발표회 초록집
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• pp.62-62
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• 2005

• 한국전기화학회:학술대회논문집
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• 한국전기화학회 1999년도 제2회 총회 및 춘계학술발표회
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• pp.14-14
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• 1999

• 한국세라믹학회지
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• 제27권1호
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• pp.136-146
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• 1990

Whiskers of SiC were grown from the mixture of silica and graphite powders by Acheson method(direct heating method). The structrua, morphological and chemical characterizations have been performed by X-ray diffractometer(XRD), transmission electron microscopy(TEM), optical microscopy(OM), scanning electron microscopy(SEM), X-ray photoelectron spectroscopy(XPS) and energy dispersive spectrometer(EDS). The growth mechanism of SiC whiskers is also discussed.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.437-437
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• 2014

Various oxide particles are synthesized in an ambient condition using an electron beam irradiation system. The formation of oxide particles is confirmed by FT-IR spectra results and the X-ray photoelectron spectrum. It is also shown that the morphology and size of oxide particles are significantly influenced by the type and flowrate of dilution gas. The energy dispersive X-ray (EDX) analysis also confirms that various oxide particles are synthesized.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.87-88
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• 2012

Metal oxide nanostructures have been applied to various fields such as energy, catalysts and electronics. We have freely designed one and two-dimensional (1 and 2-D) metal (transition metals and lanthanides) oxide nanostructures, characterized them using various techniques including scanning electron microscopy, transmission electron microscopy, X-ray diffraction crystallography, thermogravimetric analysis, FT-IR, UV-visible-NIR absorption, Raman, photoluminescence, X-ray photoelectron spectroscopy, and temperature-programmed thermal desorption (reaction) mass spectrometry. In addition, Ag- and Au-doped metal oxides will be discussed in this talk.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.388-388
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• 2010

Molybdenum oxide thin films were deposited on p-type Si(100) by an RF magnetron sputtering method. The physical and chemical properties of these films were studied with X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) techniques. The thickness of molybdenum oxide thin films was measured by spectroscopic ellipsometer (SE) and the thickness was about 200 nm. As the oxygen gas pressure increased, the thickness was decreased, the phases of the thin films were changed, and the amount of metallic Mo decreased but the contents of $Mo^{6+}$ species increases.

• 한국재료학회지
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• 제7권6호
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• pp.484-491
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• 1997

본 연구에서는 비파괴적 분석 기법인 각분해 X-선 광전자 분광기(Angle-Resolved X-ray Photoelectron Spectros-copy)를 이용하여 GaAs 표면 자연 산화막의 깊이에 따른 화학적 결합 상태 및 조성 분석을 수행하였다. GaAs의 벽개면 및 Ar이온으로 식각된 면을 기준시료로 하여 각 원자의 광전자 강도(intensity)를 보정해주는 인자인 ASF(atomic sensitivity factor)의 최적값을 구하였다. 이륙각에 따라 발생되어지는 각 원소의 피이크 분해와 정확한 ASF의 보정을 통한 각 원소의 실험적인 결과를 이용하여 깊이 방향으로의 조성 분포 모델을 세웠으며, 이론적인 강도와의 상호비교로부터 표면 오염층의 구조는 표면으로부터 탄소층, Ga-oxide와 As-oxide로 이루어진 oxides층, As-As결합의 elemental As층 및 GaAs기판의 순으로 존재함을 알 수 있었다. 또한 GaAs 표면에 존재하는 오염층은 35.8$\pm$3.3 $\AA$이었다. 또한 위 결과로부터 분석깊이 영역에서 원자수의 비로써 정의되는 의미로서의 실질조성을 구하였는데 단지 특정 이륙각에 따라 일반적인 ASF로 보정된 표면조성 결과는 표면 상태를 명확히 표현해주지 못함을 확인할 수 있었다.