• 한국재료학회지
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• 제9권5호
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• pp.446-451
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• 1999

고분자 Polyrnethylrnethacryla te (PMMA) 의 표연에 친수성올 가지게 하기 위하여 600 eV에서 1000 e V의 이온범 과 반웅성 분위기 기체플 이용하는 이용 보조 반웅 (ion assisted reaction) 법으로 개질 하였다. 아르곤 이옴범만율 조사한 시료의 접촉각은 $68^{\circ} to $35^{\circ}$ 까지 접촉각이 낮아졌으며, 산소기체 분위기로 풀어 넣어주며 아르곤 이온빔으로 처리된 시료는 19。까지 정 촉각이 강소하였다. 산소 아온만으로 처리한 경우는 산소 분위기에서 아르곤 이온으로 조사한 경우와 비슷한 접촉각 변화를 냐타내며, 산소 분위기에서 산소이옹올 이용하여 시료를 처리한 경우 $68^{\circ}$이던 표면 접촉각이 $1\times10^{17} ions/cm^2$의 이온 에너지 조사 후에 $14^{\circ}$까지 강소하였다. 표면에너지는 아르곤 이온만으로 조사된 경우에 비하여 산소 분위기에서 조사한 경우와 산소 이온올 이용하여 조사한 경우에서 증가하였으며 산소 분위기에서 산소 이온으로 조사된 경우가 초기 46 dyne/cm 에서 72 dyne/cm로 증가하였으며 표면에너지의 증가는 dispersion force의 증가보다는 polar force의 증가에 의한 것으로 보인다. 이온빔으로 처리된 시료의 정 촉각 강소와 표변에너지의 증가는 x-ray photoelectron spectroscopy (XPS) 의 spectra 결과로부터 PMMA의 표면에 C-O 결합의 증가로 인한 친수성 작용기가 표면에 형성되었기 때문이라고 생각된다. 이온법 조사 후 대기 중에 보관된 시료의 접촉각은 시간이 경과함에 따라 증가하지만, 물 속에 보관된 시료의 경우는 이온빔 처리된 후의 접촉각올 그대로 유지하였다. 또한 표면에너지의 경우도 대기 중에 보관된 시료의 경우는 시간의 경과함에 따라 polar force의 강소에 의해 표면에너지는 감소하였으나, 물 속에 보관된 경우는 표면에너지에 큰 변화가 없었다. 이로부터 접촉각과 표면에너지의 시간에 따른 변화도 이온빔 조사에 의해 형성된 친 수성기에 크게 의존함을 알 수 있다.

• Korean Chemical Engineering Research
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• 제43권6호
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• pp.756-760
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• 2005

본 연구에서는 카본블랙을 $N_2$-플라즈마 처리하여 표면 관능기를 변화시킨 후 백금을 담지시켜 전기화학적 활성을 향상시키는 방법에 대하여 고찰하였다. $N_2$-플라즈마 처리된 카본블랙의 표면특성은 FT-IR, XPS 그리고 산-염기도 측정법 등으로 분석하였으며, 전기화학적 특성을 알아보기 위하여 순환전류전압곡선(CV)를 측정하였다. FT-IR과 산-염기도 결과에 의하면 카본블랙을 300 W의 일정한 세기로 $N_2$-플라즈마 처리함으로써, 카본블랙 표면에 생성된 자유라디칼에 의해 새로운 염기성 관능기가 형성되어 처리시간이 증가할수록 염기도가 증가함을 알 수 있었다. C-N, C=N, $-NH_3{^+}$, -NH 그리고 =NH 등과 같은 새로운 염기성 관능기에 의해 염기도 값이 증가하였으나, 일정 반응시간 이후에는 카본블랙 표면에 도입한 약한 결합을 이루는 관능기가 파괴되어 새로운 관능기를 형성하지 못하고 아무런 영향을 미치지 못하는 것으로 판단된다. 결과적으로, 백금/카본블랙 촉매의 전기화학적 활성은 300 W의 세기로 처리하였을 때 최적의 표면처리 시간은 30초이다.

• Journal of Periodontal and Implant Science
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• 제32권3호
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• pp.615-630
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• 2002

Various long-term studies have shown that titanium implants as abutments for different types of prostheses have become a predictable adjunct in the treatment of partially or fully edentulous patients. The continuous exposure of dental implants to the oral cavity with all its possible contaminants creates a problem. A lack of attachment, together with or caused by bacterial insult, may lead to peri-implantitis and eventual implant failure. Removal of plaque and calculus deposits from dental titanium implants with procedures and instruments originally made for cleaning natural teeth or roots may cause major alterations of the delicate titanium oxide layer. Therefore, the ultimate goal of a cleaning procedure should be to remove the contaminants and restore the elemental composition of the surface oxide without changing the surface topography and harming the surrounding tissues. Among many chemical and mechanical procedure, air-powder abrasive have been known to be most effective for cleaning and detoxification of implant surface. Most of published studies show that the dental laser may be useful in the treatment of pen-implantitis. $CO_2$ laser and Soft Diode laser were reported to kill bacteria of implant surface. The purpose of this study was to obtain clinical guide by application these laser to implant surface by means of Non-contact Surface profilometer and X-ray photoelectron spectroscopy(XPS) with respect to surface roughness and atomic composition. Experimental rough pure titanium cylinder models were fabricated. All of them was air-powder abraded for 1 minute and they were named control group. And then, the $CO_2$ laser treatment under dry, hydrogen peroxide and wet condition or the Soft Diode laser treatment under Toluidine blue O solution condition was performed on the each of the control models. The results were as follows: 1. Mean Surface roughness(Ra) of all experimental group was decreased than that of control group. But it wasn't statistically significant. 2. XPS analysis showed that in the all experimental group, titanium level were decreased, when compared with control group. 3. XPS analysis showed that the level of oxygen in the experimental group 1, 3($CO_2$ laser treatment under dry and wet condition) and 4(Soft Diode laser was used under toluidine blue O solution) were decreased, when compared with control group. 4. XPS analysis showed that the atomic composition of experimental group 2($CO_2$ laser treatment under hydrogen peroxide) was to be closest to that of control group than the other experimental group. From the result of this study, this may be concluded. Following air-powder abrasive treatment, the $CO_2$ laser in safe d-pulse mode and the Soft Diode laser used with photosensitizer would not change rough titanium surface roughness. Especially, $CO_2$ laser treatment under hydrogen peroxide gave the best results from elemental points of view, and can be used safely to treat peri-implantitis.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.347-347
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• 2012

Nickel Oxide (NiO) is a transition metal oxide of the rock salt structure that has a wide band gap of 3.5 eV. It has a variety of specialized applications due to its excellent chemical stability, optical, electrical and magnetic properties. In this study, we concentrated on the application of NiO thin film for transparent conducting oxide. The energy band structure, electronic and optical properties of Nickel Oxide (NiO) thin films grown on Si by using electron beam evaporation were investigated by X-Ray Photoelectron Spectroscopy (XPS), Reflection Electron Energy Loss Spectroscopy (REELS), and UV-Spectrometer. The band gap of NiO thin films determined by REELS spectra was 3.53 eV for the primary energies of 1.5 keV. The valence-band offset (VBO) of NiO thin films investigated by XPS was 3.88 eV and the conduction-band offset (CBO) was 1.59 eV. The UV-spectra analysis showed that the optical transmittance of the NiO thin film was 84% in the visible light region within an error of ${\pm}1%$ and the optical band gap for indirect band gap was 3.53 eV which is well agreement with estimated by REELS. The dielectric function was determined using the REELS spectra in conjunction with the Quantitative Analysis of Electron Energy Loss Spectra (QUEELS)-${\varepsilon}({\kappa},{\omega})$-REELS software. The Energy Loss Function (ELF) appeared at 4.8, 8.2, 22.5, 38.6, and 67.0 eV. The results are in good agreement with the previous study [1]. The transmission coefficient of NiO thin films calculated by QUEELS-REELS was 85% in the visible region, we confirmed that the optical transmittance values obtained with UV-Spectrometer is the same as that of estimated from QUEELS-${\varepsilon}({\kappa},{\omega})$-REELS within uncertainty. The inelastic mean free path (IMFP) estimated from QUEELS-${\varepsilon}({\kappa},{\omega})$-REELS is consistent with the IMFP values determined by the Tanuma-Powell Penn (TPP2M) formula [2]. Our results showed that the IMFP of NiO thin films was increased with increasing primary energies. The quantitative analysis of REELS provides us with a straightforward way to determine the electronic and optical properties of transparent thin film materials.

• 한국재료학회지
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• 제22권8호
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• pp.439-444
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• 2012

To compare the photocatalytic performances of titania for purification of waste water according to applied voltages and doping, $TiO_2$ films were prepared in a 1.0 M $H_2SO_4$ solution containing $NH_4F$ at different anodic voltages. Chemical bonding states of F-N-codoped $TiO_2$ were analyzed using surface X-ray photoelectron spectroscopy (XPS). The photocatalytic activity of the co-doped $TiO_2$ films was analyzed by the degradation of aniline blue solution. Nanotubes were formed with thicknesses of 200-300 nm for the films anodized at 30 V, but porous morphology was generated with pores of 1-2 ${\mu}m$ for the $TiO_2$ anodized at 180 V. The phenomenon of spark discharge was initiated at about 98 V due to the breakdown of the oxide films in both solutions. XPS analysis revealed the spectra of F1s at 684.3 eV and N1s at 399.8 eV for the $TiO_2$ anodized in the $H_2SO_4-NH_4F$ solution at 180 V, suggesting the incorporation of F and N species during anodization. Dye removal rates for the pure $TiO_2$ anodized at 30 V and 180 V were found to be 14.0% and 38.9%, respectively, in the photocatalytic degradation test of the aniline blue solution for 200 min irradiation; the rates for the F-N-codoped $TiO_2$ anodized at 30 V and 180 V were found to be 21.2% and 65.6%, respectively. From the results of diffuse reflectance absorption spectroscopy (DRS), it was found that the absorption edge of the F-N-codoped $TiO_2$ films shifted toward the visible light region up to 412 nm, indicating that the photocatalytic activity of $TiO_2$ is improved by appropriate doping of F and N by the addition of $NH_4F$.

• 보존과학회지
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• 제33권5호
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• pp.381-390
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• 2017

철제유물의 안정화처리는 탈염을 중점으로 하고 있으나, 부식인자 제거여부의 불확실성과 일부 유물의 제한적 적용 등으로 재부식과 같은 문제점이 지적되고 있다. 이를 보완하기 위한 부식억제제의 연구는 일부 보고된 바 있으며, 이 연구는 부식억제를 위한 수처리제 3종에 대한 연구결과이다. 부식억제제 피막이 형성된 시편의 표면관찰 결과 인산염이 주성분인 1종 2호의 시편은 표면의 녹층이 제거되었고, 재부식 시편의 중량 감소율 평균은 1종 2호의 경우 0.58%, 2종 2호의 경우 0.03%, 3종 2호의 경우 0.07%이며, 부식인자인 $Cl^-$ 이온의 변화량은 1종 2호는 28.60 ppm, 2종 2호는 -4.08 ppm, 3종 2호는 -1.94 ppm이었다. 수처리제의 피막에 대하여 XPS로 표면상태를 분석한 결과, 3종 2호보다 2종 2호에서 소지금속인 Fe가 낮게 검출되어 다소 우수한 피막을 유지하였고, Si함량에서도 규산염 기반의 2종 2호에서 상대적으로 함량이 높아 피막 형성이 우수하다고 판단된다. 인산염을 주성분으로 한 1종 2호는 표면의 녹층을 제거하여 금속유물 보존처리약품으로 부적합하고, 규산염을 주성분을 한 2종 2호와 3종 2호의 수처리제는 부식억제 효과가 우수하다고 평가된다. 부식억제제는 철제유물의 출토 당시에 긴급하게 사용할 수 있는 약품으로도 활용이 가능할 것이다.

• 한국전기전자재료학회논문지
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• 제29권8호
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• pp.489-493
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• 2016

In this study, the effect of vanadium oxide ($V_2O_5$) content and pre-sintering atmosphere on sealing property of glass frit that consisted of $V_2O_5-BaO-ZnO-P_2O_5-TeO_2-CuO-Fe_2O_3-SeO_2$ was investigated by XPS (X-ray photoelectron spectroscopy). The content of V2O5 was changed to 15, 30, and 45 mol%, and the pre-sintering was carried out in air and $N_2$ condition, respectively. XPS analysis conducted before and after laser irradiation with identical sample. Before laser treatment, glass frits that were pre-sintered at air condition showed both $V^{4+}$ and $V^{5+}$, but the valence state was changed to $V^{5+}$ after laser irradiation when the glass frits contained 30 and 45 mol% $V_2O_5$; this change led to non-adhesive property. On the other hand, glass frits that were pre-sintered at $N_2$ condition exhibited only $V^{4+}$ and it showed fine adhesion irrespective of the $V_2O_5$ content. As a result, the existence of $V^{4+}$ seems to be a major factor for controlling the adhesive property of glass frit for laser sealing.

• 폴리머
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• 제35권2호
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• pp.157-160
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• 2011

본 연구에서는 전자빔을 이용하여 poly(dimethyl siloxane)(PDMS)을 개질하였으며 그 특성 변화를 분석하였다. PDMS 시트를 기존의 열경화법을 통해 제조한 후 20에서 200 kGy의 흡수선량P로 전자빔을 조사하였고, 조사된 시트들의 특성을 팽윤도 및 접촉각 측정, 만능시험분석기(UTM), 열중랑분석기(TGA), X선 광전자 분광기(XPS)들을 이용해 분석하였다. 팽윤도 측정, UTM 및 TGA 결과, 전자빔 조사에 의해 PDMS 시트의 가교 밀도가 증가함에 따라 조사된 PDMS 시트의 팽윤도는 순수한 것에 비해 최대 24%까지 감소하였고 압축강도와 열분해온도는 순수한 것에 대비 각각 최대 2.5 MPa와 $10^{\circ}C$까지 증가함을 확인하였다. 또한, 접촉각 측정과 XPS 분석 결과를 토대로 전자빔 조사에 의한 산화 반응에 의하여 PDMS 표면에 친수성 관능기들이 형성되기 때문에 PDMS 표면의 젖음성은 순수한 것에 비해 최대 24%까지 향상됨을 확인하였다.

• 폴리머
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• 제36권5호
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• pp.612-616
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• 2012

본 연구는 표면처리에 따른 탄소나노튜브의 표면특성변화가 탄소섬유 강화 복합재료의 기계적 물성에 미치는 영향에 대하여 살펴보았다. 표면처리된 탄소나노튜브의 표면특성은 산-염기도 측정, FTIR, 그리고 XPS를 통하여 알아보았다. 복합재료의 기계적 계면특성은 층간전단강도(interlaminar shear strength; ILSS)와 임계응력세기인자(critical stress intensity factor; $K_{IC}$)를 통하여 고찰하였다. 실험결과 산-염기 상호반응에 의한 각각의 표면처리된 탄소나노튜브의 표면특성의 변화를 가져오며, 산처리한 MWNTs/탄소섬유/에폭시 복합재료의 경우 미처리 MWNTs, 염기 처리 MWNTs와 비교하여 우수한 기계적 물성을 보였다. 이는 산성을 가지는 MWNTs와 염기성의 에폭시 수지가 산-염기 및 수소결합에 의한 계면 결합력의 향상 때문이라 판단된다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.68.1-68.1
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• 2012

The best part of graphene is - charge-carriers in it are mass less particles which move in near relativistic speeds. Comparing to other materials, electrons in graphene travel much faster - at speeds of $10^8cm/s$. A graphene sheet is pure enough to ensure that electrons can travel a fair distance before colliding. Electronic devices few nanometers long that would be able to transmit charge at breath taking speeds for a fraction of power compared to present day CMOS transistors. Many researches try to check a possibility to make it a perfect replacement for silicon based devices. Graphene has shown high potential to be used as interconnects in the field of high frequency electrical devices. With all those advantages of graphene, we demonstrate characteristics of electrical and optical properties of graphene such as the effect of graphene geometry on the microwave properties using the measurements of S-parameter in range of 500 MHz - 40 GHz at room temperature condition. We confirm that impedance and resistance decrease with increasing the number of graphene layer and w/L ratio. This result shows proper geometry of graphene to be used as high frequency interconnects. This study also presents the optical properties of graphene oxide (GO), which were deposited in different substrate, or influenced by oxygen plasma, were confirmed using different characterization techniques. 4-6 layers of the polycrystalline GO layers, which were confirmed by High resolution transmission electron microscopy (HRTEM) and electron diffraction analysis, were shown short range order of crystallization by the substrate as well as interlayer effect with an increase in interplanar spacing, which can be attributed to the presence of oxygen functional groups on its layers. X-ray photoelectron Spectroscopy (XPS) and Raman spectroscopy confirms the presence of the $sp^2$ and $sp^3$ hybridization due to the disordered crystal structures of the carbon atoms results from oxidation, and Fourier Transform Infrared spectroscopy (FTIR) and XPS analysis shows the changes in oxygen functional groups with nature of substrate. Moreover, the photoluminescent (PL) peak emission wavelength varies with substrate and the broad energy level distribution produces excitation dependent PL emission in a broad wavelength ranging from 400 to 650 nm. The structural and optical properties of oxygen plasma treated GO films for possible optoelectronic applications were also investigated using various characterization techniques. HRTEM and electron diffraction analysis confirmed that the oxygen plasma treatment results short range order crystallization in GO films with an increase in interplanar spacing, which can be attributed to the presence of oxygen functional groups. In addition, Electron energy loss spectroscopy (EELS) and Raman spectroscopy confirms the presence of the $sp^2$ and $sp^3$ hybridization due to the disordered crystal structures of the carbon atoms results from oxidation and XPS analysis shows that epoxy pairs convert to more stable C=O and O-C=O groups with oxygen plasma treatment. The broad energy level distribution resulting from the broad size distribution of the $sp^2$ clusters produces excitation dependent PL emission in a broad wavelength range from 400 to 650 nm. Our results suggest that substrate influenced, or oxygen treatment GO has higher potential for future optoelectronic devices by its various optical properties and visible PL emission.