• Title/Summary/Keyword: well diffusion

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Adsorption Characteristics of Nickel, Zinc and Cadmium Ions using Alginate Bead (Alginate Bead를 이용한 니켈, 아연, 카드뮴의 흡착특성에 관한 연구)

  • Jung, Heung-Joe
    • Journal of Integrative Natural Science
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    • v.4 no.2
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    • pp.130-136
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    • 2011
  • This study investigated the adsorption characteristics of nickel, zinc and cadmium ions from the aqueous solution onto the alginate bead. Adsorption equilibrium capacities of the heavy metal ions increased with increasing initial pH of the solution. The adsorption equilibrium isotherm of the heavy metal ions was well represented by Langmuir equation. The magnitude of adsorption capacity of the heavy metal ions onto alginate bead was the order of cadmium > zinc > nickel. Kinetic parameters were measured in a batch adsorber to analyze the adsorption rates of the heavy metal ions. The internal diffusion coefficient of the heavy metal ions in the intraparticle were determined by comparing the experimental concentration curves with those predicted from the surface diffusion model (SDM) and pore diffusion model (PDM). The internal diffusion of the heavy metal ions in the intraparticles was explained by PDM.

EFFECTS OF SPUTTERED NON-PRECIOUS METALLIC THIN FILMS ON THE CHEMICAL BONING BETWEEN DENTAL ALLOY AND PORCELAIN (비귀금속 박막이 치과용합금과 치과용도재와의 화학적결합에 미치는 영향)

  • Cho Sung-Am
    • The Journal of Korean Academy of Prosthodontics
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    • v.30 no.4
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    • pp.481-492
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    • 1992
  • Author measured the bonding strength between Dental Porcelain and Nonprecious Dental Alloy and analyzed diffusion Phenomena at the interfaceby by Auger electron spectroscopy and also Electron spectroscopy for Chemical Analysis. The each specimen was sputtered with Al, Cr, In and Sn. 1. Ni whic is the main element of the matris of dental nonprecious alloy diffuse more than the other element and the Ni diffusion rate of each specimen was well coordinated with the bonding strength of each. 2. The Sn thin film suppress the diffusion rate of Ni of matrix into the Dental Porcelain than the In or Cr thin films. 3. The Al thin film suppress the diffusion rate of Ni than the Sn thin film. 4. The main coponent of dental porcelain : Al, Si, Mo diffused into the matrix of alloy. It means that the each element of dental alloy and dental porelain diffused into the each other part.

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Kinetic Analysis of Diffusion Aluminide Coating (확산 알루미나이드 코팅의 속도론적 해석)

  • 손희식;김문일
    • Journal of the Korean institute of surface engineering
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    • v.28 no.3
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    • pp.152-163
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    • 1995
  • A theoretical model which combines gaseous transport and solid state diffusion with the multi-component equilibrium at the gas/pack and gas/coating interfaces was used to study the kinetics of diffusion aluminide coating. The diffusion aluminide coatings were applied by pack cementation with Ni substrate under argon atmosphere in the high activity and the low activity pack containing $NH_4CL$ or $AlF_3$ activator. On the basis of the process conditions, the suggested model allows the surface composition, the growth rate of coating layers and the aluminium concentration profiles in coatings to be calculated. In the case of $NH_4$Cl activator, careful consideration was required in the analysis, because activator contains nitrogen and hydrogen as well as halogen element to activate the pack. A good agreement is obtained between the theoretical predictions and the experimental results.

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Fundamental Study on the Production of TiFe Hydrogen Alloy by the Reduction-Diffusion Process (환원확산법에 의한 TiFe 수소 흡장합금의 제조에 관한 기초적 연구)

  • 권호영;일본명;일본명
    • Journal of the Korean Society of Safety
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    • v.8 no.2
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    • pp.3-9
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    • 1993
  • For comparison, we used Ca and Mg as reducers to produce TiFe hydrogen stroage alloy from Fe and TiO$_2$by the Reduction-Diffusion process. The results obtained were as follow. \circled1 Ca was found to be effective both for reduction and diffusion processes. Moreover, Ca oxide was easily removed in an NH$_4$Cl solution after the reaction. \circled2 In the case of using Ca as a reducer, the Reduction-Diffusion process is considered to take place in the foiling three steps. First, TiO$_2$is reduced to Ti by Ca over 100$0^{\circ}C$. Second, the atomic Ti drifts in the Ca melt and meets Fe particles. Finally, the atomic Ti diffuses in to the Fe particles. \circled3 In the case of using Mg as a reducer, We found that the reduction reaction of TiO$_2$went well. But the reduced Ti scarcely diffused into Fe particles. This was probably because no Mg melt was formed due to the high vapor pressure of Mg.

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Global Diffusion of Online Social Network Services : A Cross-Country Study (온라인 소셜 네트워크 서비스의 글로벌 확산에 관한 연구)

  • Son, In-Soo;Oh, Jin-Hee;Lee, Dong-Won
    • Journal of Information Technology Services
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    • v.11 no.1
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    • pp.305-323
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    • 2012
  • This study examines online social media diffusion across different countries that will help to provide a picture of current global online social network services (SNSs). Analyzing country-level data drawn from 78 nations, we find that non-technological factors such as culture and language as well as technological factors including Internet penetration rate and smartphone adoption rate have significant effects on online social media diffusion. These findings, derived from a broad range of different countries, not only provide theoretical insights into understanding critical factors that enable successful global expansion of online social media services but also help practitioners plan their marketing strategies more effectively in a global context.

Tracer Concentration Contours in Grain Lattice and Grain Boundary Diffusion

  • Kim, Yong-Soo;Donald R. Olander
    • Nuclear Engineering and Technology
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    • v.29 no.1
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    • pp.7-14
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    • 1997
  • Grain boundary diffusion plays a significant role in fission gas release, which is one of the crucial processes dominating nuclear fuel performance. Gaseous fission produce such as Xe and Kr generated during nuclear fission have to diffuse in the grain lattice and the boundary inside fuel pellets before they reach the open spaces in a fuel rod. These processes can be studied by 'tracer diffusion' techniques, by which grain boundary diffusivity can be estimated and directly used for low burn-up fission gas release analysis. However, only a few models accounting for the both processes are available and mostly handle them numerically due to mathematical complexity. Also the numerical solution has limitations in a practical use. In this paper, an approximate analytical solution in case of stationary grain boundary in a polycrystalline solid is developed for the tracer diffusion techniques. This closed-form solution is compared to available exact and numerical solutions and it turns out that it makes computation not only greatly easier but also more accurate than previous models. It can be applied to theoretical modelings for low bum-up fission gas release phenomena and experimental analyses as well, especially for PIE (post irradiation examination).

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MULTISCALE MODELLING FOR THE FISSION GAS BEHAVIOUR IN THE TRANSURANUS CODE

  • Van Uffelen, P.;Pastore, G.;Di Marcello, V.;Luzzi, L.
    • Nuclear Engineering and Technology
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    • v.43 no.6
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    • pp.477-488
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    • 2011
  • A formulation is proposed for modelling the process of intra-granular diffusion of fission gas during irradiation of $UO_2$ under both normal operating conditions and power transients. The concept represents a simple extension of the formulation of Speight, including an estimation of the contribution of bubble motion to fission gas diffusion. The resulting equation is formally identical to the diffusion equation adopted in most models that are based on the formulation of Speight, therefore retaining the advantages in terms of simplicity of the mathematical-numerical treatment and allowing application in integral fuel performance codes. The development of the new model proposed here relies on results obtained by means of molecular dynamics simulations as well as finite element computations. The formulation is proposed for incorporation in the TRANSURANUS fuel performance code.

Finite Element Method (FEM) Study on Space Charge Effects in Organic Light Emitting Diodes (OLED)

  • Kim, Kwang-Sik;Hwang, Young-Wook;Won, Tae-Young
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.12 no.4
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    • pp.467-472
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    • 2012
  • In this paper, we present a finite element method (FEM) study on the space charge effects in organic light emitting diodes. The physical model covers all the key physical processes in OLEDs, namely charge injection, transport and recombination, exciton diffusion, transfer and decay as well as light coupling, and thin-film-optics. The exciton model includes generation, diffusion, and energy transfer as well as annihilation. We assumed that the light emission originates from oscillation which thus is embodied as exciton in a stack of multilayer. We discuss the accumulation of charges at internal interfaces and their signature in the transient response as well as the electric field distribution. We also report our investigation on the influence of the insertion of the emission layer (EML) in the bilayer structure.

Selectrive Liquid Phase Epitaxy of GaAs` Kinetics and MOrphology (비소화칼륨의 선택적 액상 에피층 성장;성장기구 및 형태)

  • Kim, Sang Bae;Kwon, Young Se
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.23 no.6
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    • pp.820-832
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    • 1986
  • In contrast to conventional liquid phase epitaxy of GaAs, surface kinetics limited growth is predominant in selective liquid phase epitaxy. For the stripe openings in the high-index crystal-lographic directions, the well-known facet formations and the decompositions into the low index planes or smooth circular surfaces are observed depending on the growth kinetics. For the low index direction stripe, surface kinetics limited growth is evident. By a numerical calcualtion we show that these phenomena are due to the enhanced masstransport by two dimensional diffusion and growth rate anisotropy which is found to be very stdrong with cusped minima for some singular planes in the solution growth as well as in vapor phase epitaxy. Morphological stability is briefly treated in terms of diffusion and its implications on device application are stated. Tese phenomena may be common to III-V compound semiconductors as well as GaAs.

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The Prediction of Solvent Mutual Diffusion Coefficient Using Vrentas-Duda's Self Diffusion Theory (Vrentas-Duda의 자기확산이론을 이용한 용매의 상호확산계수 예측)

  • 김종수;이광래;김기창
    • Membrane Journal
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    • v.10 no.1
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    • pp.19-29
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    • 2000
  • To estimatc mutual diffusion coefficient for the analysis of mass transfer phenomena in polymer/solvent system, two models are proposed and the equations are derived. The estimates of mutual diffusion coefficients are obtained by two models suggested in this work and compared with and experimental data and Vrentas-Duda's. Vrentas-Duda's self diffusion coefficient was used for the mutual diffusion coefficient. Derivative of chemical potential on solvent was derived and used using original UNIFAC-FV and modified UNIFAC-FV. However, Vrentas-Duda's equation for mutual diffusion coefficient contains Flory-Huggins parameter x. For the derivative of chemical potential term, Vrentas-Duda assumed that parameter x was constant and independent of temperatures and concentrations The assumption is one of shortcoming in vrentas-Duda's mutual diffusion coefficient. New methods proposed in this work do not have such assumptions and simplifications. For the solvent of cyclohexane, n-pentane, and n-hexane in PIB(polyisolbutylene) and PMS-BR (poly(p-methylstyrene-co-isobutylene), new methods well correlate the experimental data at various temperatures and concentrations, and predicted the experimental data much better than Vrentas-Duda's for the PIB/toluene system. It is shown that new methods are excellent tools for correlating mutual diffusion coefficient data in polymer/solvent system over wide ranges of temperature and concentration without any assumptions or simplifications.

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