Plasma Etching Characteristics of Sapphire Substrate using $BCl_3$ -based Inductively Coupled Plasma
($BCl_3$ 계열 유도결합 플라즈마를 이용한 사파이어 기판의 식각 특성)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2008.11a
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- pp.363-363
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- 2008