• 제목/요약/키워드: vapor treatment

검색결과 438건 처리시간 0.036초

Antimicrobial Edible Film Developed from Defatted Corn Germ Meal Fermented by Bacillus subtilis

  • Kim Hyung-Wook;Roh I-Woo;Kim Kyung-Mi;Jang In-Suk;Ha Sang-Do;Song Kyung-Bin;Park Sang-Kyu;Lee Won-Young;Youn Kwang-Sup;Bae Dong-Ho
    • Journal of Microbiology and Biotechnology
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    • 제16권4호
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    • pp.597-604
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    • 2006
  • In order to extend the shelf-life of packaged or coated foods, an antibacterial edible film containing 1.8% of BLS was developed from the defatted corn germ meal, which had been fermented with Bacillus subtilis under the optimum condition of pH 7.0-7.5 and $33^{\circ}C$ for 33 h. Water vapor permeability of the fermented film $(88.3mg/cm^2\;h)$ was higher than those of the normal corn germ films $(75.8mg/cm^2\;h)$. Protein solubility of the fermented film was also higher than ordinary corn germ film at the pH range of 3-10. The fermented corn germ film had higher tensile strength and lower % elongation (elongation rate) than the ordinary corn germ film. The antimicrobial activity of the film was more than 50% of the maximum activity after film production with heat treatment at $90^{\circ}C$ and pH adjustment to 9. When the corn germ protein film with bacteriocin-like substance was applied on the mashed sausage media containing E. coli, the bacterial growth inhibition was higher than the ordinary corn protein film.

Diamond Crystal Growth Behavior by Hot Filament Chemical Vapor Deposition According to Pretreatment Conditions

  • Song, Chang Weon;You, Mi Young;Lee, Damin;Mun, Hyoung Seok;Kim, Seohan;Song, Pung Keun
    • 한국표면공학회지
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    • 제53권5호
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    • pp.241-248
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    • 2020
  • The change of the deposition behavior of diamond through a pretreatment process of the base metal prior to diamond deposition using HFCVD was investigated. To improve the specific surface area of the base material, sanding was performed using sandblasting first, and chemical etching treatment was performed to further improve the uniform specific surface area. Chemical etching was performed by immersing the base material in HCl solutions with various etching time. Thereafter, seeding was performed by immersing the sanded and etched base material in a diamond seeding solution. Diamond deposition according to all pretreatment conditions was performed under the same conditions. Methane was used as the carbon source and hydrogen was used as the reaction gas. The most optimal conditions were found by analyzing the improvement of the specific surface area and uniformity, and the optimal diamond seeding solution concentration and immersion time were also obtained for the diamond particle seeding method. As a result, the sandblasted base material was immersed in 20% HCl for 60 minutes at 100 ℃ and chemically etched, and then immersed in a diamond seeding solution of 5 g/L and seeded using ultrasonic waves for 30 minutes. It was possible to obtain optimized economical diamond film growth rates.

Evidences of in Situ Remediation from Long Term Monitoring Data at a TCE-contaminated Site, Wonju, Korea

  • Lee, Seong-Sun;Kim, Hun-Mi;Lee, Seung Hyun;Yang, Jae-Ha;Koh, Youn Eun;Lee, Kang-Kun
    • 한국지하수토양환경학회지:지하수토양환경
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    • 제18권6호
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    • pp.8-17
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    • 2013
  • The contamination of chlorinated ethenes at an industrial complex, Wonju, Korea, was examined based on sixteen rounds of groundwater quality data collected from 2009 to 2013. Remediation technologies such as soil vapor extraction, soil flushing, biostimulation, and pumping-and-treatment have been applied to eliminate the contaminant sources of trichloroethylene (TCE) and to prevent the migration of TCE plume from remediation target zones. At each remediation target zone, temporal monitoring data before and after the application of remediation techniques showed that the aqueous concentrations of TCE plume present at and around the main source areas decreased significantly as a result of remediation technologies. However, the TCE concentration of the plumes at the downstream area remained unchanged in response to the remediation action, but it showed a great fluctuation according to seasonal recharge variation during the monitoring period. Therefore, variations in the contaminant flux across three transects were analyzed. Prior to the remediation action, the concentration and mass discharges of TCE at the transects were affected by seasonal recharge variation and residual DNAPLs sources. After the remediation, the effect of remediation took place clearly at the transects. By tracing a time-series of plume evolution, a greater variation in the TCE concentrations was detected at the plumes near the source zones compared to the relatively stable plumes in the downstream. The difference in the temporal profiles of TCE concentrations between the plumes in the source zone and those in the downstream could have resulted from remedial actions taken at the source zones. This study demonstrates that long term monitoring data are useful in assessing the effectiveness of remediation practices.

Fabrication of Flexible Graphene Transparent Conducting Film by Self-Assembled Monolayers on Polyethylene Terephthalate

  • 고용훈;정대성;조주미;;차명준;전승한;정우성;박종윤
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.282-282
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    • 2013
  • 그래핀(Graphene)은 열 전도도가 높고 전자 이동도(200 000 cm2V-1s-1)가 우수한 전기적 특성을 가지고 있어 차세대 전자재료로써 유망한 후보로 간주되어 왔다. 최근에는 아크 방출(Arc discharge method), 화학적 기상 증착법(Chemical vapor deposition; CVD), 이온-조사법(Ion-irradiation) 등을 이용한 이종원자(Hetero atom)도핑과 화학적 처리를 이용한 기능화(Functionalization)등의 방법으로 그래핀의 전도도를 향상시킬 수 있었다. 그러나 이러한 방법들은 기판의 표면을 거칠게 하며, 그래핀에 많은 결함들이 발생한다는 단점이 있다. 이러한 단점을 극복하기 위해 자가 조립 단층막법(Self-Assembled Monolayers; SAMs)을 이용하여 기판을 기능화한 후 그 위에 그래핀을 전사하면, 자가 조립 단층막의 기능기에 따라 그래핀의 일함수를 조절 가능하고 운반자 농도나 도핑 유형을 변화시켜 소자의 전기적 특성을 최적화 할 수 있다 [1-3]. 본 연구에서는 PET(polyethylene terephthalate) 기판에 SAMs를 이용하여 유연하고 투명한 그래핀 전극을 제작하였다. 자외선 오존처리 (UV ozone treatment)를 이용하여 PET 기판 표면 위에 하이드록실 기(Hydroxyl group; -OH)를 기능화 화였고 이를 접촉각 측정(Contact angle measurement)을 통해 확인하였다. 또한 3-Aminopropyltriethoxysilane(APTES)와 톨루엔 (toluene)을 이용하여 PET 기판 표면 위의 하이드록실 기 위에 아민 기(Amine group; -NH2)를 기능화 하였고 이를 X-선 광전자 분광법(X-ray photoelectron spectroscopy: XPS)으로 분석하였다. 이렇게 만들어진 PET기판 표면 위에 화학적 기상 증착법을 이용하여 합성한 대면적의 균일한 그래핀을 전사하였다. NH2그룹에 의해 그래핀에 도핑 효과가 나타난 것을 라만 분광법(Raman spectroscopy)과 전류-전압 특성곡선(I-V characteristic curve)을 이용하여 확인하였다. 본 연구 결과는 유연하고 투명한 기판 위에 안정적이면서 패턴이 가능하기 때문에 그래핀을 기반으로 하는 반도체 소자에 적용 가능할 것이라 예상된다.

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잔류 용매 제거를 위한 (+)-dihydromyricetin의 에탄올 전처리 건조 (Ethanol-pretreated Drying of (+)-dihydromyricetin for Removal of Residual Solvents)

  • 이희건;김진현
    • Korean Chemical Engineering Research
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    • 제60권2호
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    • pp.237-242
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    • 2022
  • 본 연구에서는 정제된(+)-dihydromyricetin로부터 잔류 용매를 효과적으로 제거할 수 있는 건조 방법을 개발하였다. 에탄올 전 처리를 통한 회전 증발(rotary evaporation)에 의해 잔류 아세톤 농도를 ICH 규정치(5,000 ppm) 이하로 효율적으로 제거하였다. 또한 잔류 에탄올 역시 물 첨가를 통한 회전 증발로 ICH 규정치(5,000 ppm)를 충족시켰으며 잔류 수분 함량은 4% 이내였다. 모든 건조 온도(35, 45, 55 ℃)에서 잔류 용매는 건조 초기에 급격히 제거되었으며 건조 효율은 건조 온도가 높을수록 증가하였다. 건조 메커니즘 조사 결과, 에탄올 전 처리에 의한 잔류 용매 제거는 아세톤-에탄올 혼합물의 높은 증기압과 아세톤-에탄올 간의 수소 결합과 연관됨을 알 수 있었다.

ZnO가 첨가된 TeO2 나노와이어의 합성 및 저농도(50 ppm) 이산화질소 가스 센싱 특성 (Synthesis and Low-concentration (50 ppm) NO2 Sensing Properties of Bare and ZnO (n) Decorated TeO2 (p) Nanowires)

  • 유동재;신가윤;엄완식;강석우;김은비;김형민;김현우
    • 한국재료학회지
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    • 제32권10호
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    • pp.435-441
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    • 2022
  • We report the synthesis and gas sensing properties of bare and ZnO decorated TeO2 nanowires (NWs). A catalyst assisted-vapor-liquid-solid (VLS) growth method was used to synthesize TeO2 NWs and ZnO decoration was performed using an Au-catalyst assisted-VLS growth method followed by a subsequent heat treatment. Structural and morphological analyses using X-ray diffraction (XRD) and scanning/transmission electron microscopies, respectively, demonstrated the formation of bare and ZnO decorated TeO2 NWs with desired phase and morphology. NO2 gas sensing studies were performed at different temperatures ranging from 50 to 400 ℃ towards 50 ppm NO2 gas. The results obtained showed that both sensors had their best optimal sensing temperature at 350 ℃, while ZnO decorated TeO2 NWs sensor showed much better sensitivity towards NO2 relative to a bare TeO2 NWs gas sensor. The reason for the enhanced sensing performance of the ZnO decorated TeO2 NWs sensor was attributed to the formation of ZnO (n)/ TeO2 (p) heterojunctions and the high intrinsic gas sensing properties of ZnO.

초음파 검사에 의한 수중의 2,4-Dichlorophenol 분해처리 (Treatment of decomposition of Aqueous 2,4-Dichlorophenol Solution by Ultrasonic Irradiation)

  • 손종렬;문경환;김영환;우완기
    • 환경위생공학
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    • 제14권3호
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    • pp.54-62
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    • 1999
  • 2,4-Dichlorophenol was known pollutants caused by the endocrine disruptor into the refractory substances of environment and this is difficult to be degradable by conventional methods. Therefore, a considerable interest has been devoted to developing new process where 2,4-Dichlorophenol can easily decomposed. In this study, the series of ultrasonic irradiation for removal of 2,4-Dichlorophenol has been selected as a model reaction in the batch reactor system in order to obtain the basic data investigate the influence of various experimental parameters such as concentration, pH, reaction temperature, acoustic intensity. The products obtained form the ultrasonic irradiation were analysed by GC/MS and HPLC. The formation of $H_2O_2$, a well-known the strong oxidant was found proportionally to increase with irradiation time. The intermediates of ultrasonic irradiation of 2,4-Dichlorophenol were identified as HCl, catechol, hydroquinone, o,p-benzoquinone, muconic acid, and maleic acid. The final products of this was $CO_2$ and $H_2O$. As the decomposition of 2,4-Dichlorophenol proceeds by the ultrasonic irradiation, the pH of 2,4-Dichlorophenol containing aqueous solution increases slowly, The decomposition of 2,4-Dichlorophenol was found to be occured fast in the basic medium. In general, the rate of reaction is proportional to the reaction temperature obeying the Arrhenius' law. However, in the ultrasonic irradiation, this suggests as the reaction temperature increase the decomposition rate of the reactant decreases. This result meant that the increase of reaction temperature due to the increase of vapor pressure of water accelerated the decrease of acoustic intensity which was can be proportional to the decomposition rae of these compounds. It was found that more than 80% of phenol solution was removed within hours in all reaction conditions. The reaction order in the degradation of the 2,4-Dichlorophenol compounds was verified as the Pseude-first order. From the fore-mentioned results, it can be concluded that the refractory organic compounds caused by endocrine disruptor as 2,4-dichlorophenol could be removed by the ultrasonic irradiation with radicals, such as $H{\;}{\cdot}{\;}and{\;}OH{\;}{\cdot}$ radical causing the high increase of pressure and temperature. Finally, it apeared that the technology using ultrasonic irradiation can be applied to the treatment of refractory substances caused by endocrine disruptor which are difficult to be decomposed by the conventional methods.

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APCVD법에 위해 제조된 $\alpha$-$Fa_{2}O_{3}/SnO_{2}$계 박막의 가연성 가스 감지 특성 평가 (Characterization to flammable gas $\alpha$-$Fa_{2}O_{3}/SnO_{2}$ system thin film fabricated by APCVD)

  • 심성은;이세훈;최성철
    • 한국결정성장학회지
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    • 제10권2호
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    • pp.105-110
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    • 2000
  • APCVD(Atrmos phere Pressure Vapor Deposition)법으로 $\alpha$-$Fa_{2}O_{3}/SnO_{2}$계 박막 가스센서 소자를 제조하여 열처리(Heat treatment)하였으며, 가연성 가스($CH_4$, $H_2$, LPG)에 대하여 감지 특성(Sensitivity)을 측정하였다. 감지특성 향상을 위해 소자를 $400^{\circ}C$, $450^{\circ}C$, $500^{\circ}C$, $550^{\circ}C$, $600^{\circ}C$에서 각각 2시간동안 열처리하였으며 $500^{\circ}C$에서 2시간 동안 열처리하였을 때 가장 우수한 감응도를 조사하였다. 특히 $H_2$에 대하여 가장 민감한 반응을 보였다. 최적의 작동온도를 찾기 위해 $100^{\circ}C$~$300^{\circ}C$으로 변화하며 가스 감응도를 조사하였다. 제작된 소자는 작동온도 $175^{\circ}C$, 측정 범위 500ppm ~ 10,000ppm에서 $H_2$일 경우 감지도가 62%~76%를 가졌으며, $CH_2$의 경우 16%~58%, LPG의 경우 8%~37%이였다. 또한 열처리한 것과 안한 것의 감응도의 차이는 약 10%이었다. LPG 1,000ppm에서의 장기안정성은 감응도 30%의 값으로 수렴하였다.

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표면처리에 따른 Hastelloy X 합금의 고온물성 (High temperature properties of surface-modified Hastelloy X alloy)

  • 조현;이병우
    • 한국결정성장학회지
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    • 제22권4호
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    • pp.183-189
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    • 2012
  • 고온 열수송용 재료로 이용되는 Hastelloy X의 표면처리에 따른 고온물성 개선에 대한 연구를 수행하였다. Hastelloy X 기판 상에 각각 PVD법인 Arc discharge 및 Sputtering을 이용하여 TiAlN 및 $Al_2O_3$ 박막을 표면 코팅(overlay coating) 하였고, 분위기 분말을 이용하여 Al을 금속표면을 통해 확산시키는 방법인 Pack cementation법을 이용한 Al 확산코팅(diffusion coating: aluminiding)법을 이용한 표면처리를 수행하였다. 이들 표면처리가 Ni-Cr계 합금의 고온열처리에서 생성되는 두꺼운 불균질 산화물($Cr_2O_3$)형성 억제에 미치는 효과와 조성 및 표면미세구조가 물성에 미치는 영향에 대해 알아보기 위해, 표면처리 된 Hastelloy X 샘플들을 공기 및 헬륨가스 분위기에서 $1000^{\circ}C$로 열처리 하였으며, 열처리된 전후 시편들에 대해 상형성, 미세구조 및 고온 물성 변화를 측정하였다. 이러한 실험결과를 통하여 표면코팅법에 의한 TiAlN 및 $Al_2O_3$ 박막에 비해 Al 확산코팅한 경우 두꺼운 불균질 산화물($Cr_2O_3$)형성이 억제되어 보다 균질한 미세구조와 높은 내마모성 등 높은 고온 안정성을 보여주는 것을 확인할 수 있었다.

침엽수재(針葉樹材)의 수분확산(水分擴散)모델을 이용(利用)한 소나무판재(板材)와 평소각재(平小角材)의 열기건조(熱氣乾燥) 시간(時間)과 함수율(含水率) 추정(推定)에 관(關)한 연구(硏究) (Studies on Predicting the Kiln Drying Time and Moisture Content of Board and Dimension Lumber of Pinus densiflora using an Internal Moisture Diffusion Model of Softwood)

  • 이상봉;정희석
    • Journal of the Korean Wood Science and Technology
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    • 제17권3호
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    • pp.67-81
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    • 1989
  • This experiment was carried out to know the mothod of changing the step of moisture content schedule with time in conventional kiln drying. For the purpose of this object. we made drying model by applying the moisture diffusion model by J.FSiau(1984) to average moisture content equation by J.Crank(1956) derived it from Fick's second law. And to verify this method of drying model. 2.5cm-thick boards and 5.0cm-thick dimension lumbers of Pinus densiflora were kiln-dried with the schedule of T11-C3 and T10-C4, respectively. And then the drying rates were investigated and compared with those calculated from drying model. The results obtained were as follows 1. Average drying rate and total drying time of board to dry to 6.5% moisture content were 0.64%/hr and 109hr., and those of dimension lumber to dry to 8.3% moisture content were 0.4%/hr. and 162hr., respectively. 2. The moisture content of shell and core decreased by equalizing treatment and increased by conditioning treatment both on board and dimension lumber. But the moisture gradient was lower after conditioning than after equalizing. 3. As the drying was proceeded, the transverse bound water diffusion coefficient all but linearly decreased, the water vapor diffusion coefficient abruptly curvilinearly increased, while the transverse diffusion coefficient curvilinearly decreased both on board and dimension lumber. But each of diffusion coefficients on board was larger than that on dimension lumber. 4. Compared to experimential drying rate of board. theoretical drying rate was larger at 30.0%-21.8% moisture content range and was similiar at 21.8%-5.4% moisture content. And in case of dimension lumber, the drying rate was similiar at 30.0%-16.1% moisture content range but theoretical drying rate was much lower at 16.1%-8.3% moisture content range. 5. The possibility of adapting this drying model to changing the moisture content schedule step with time was in the range of 21.8%-5.4% moisture content on board. And in the case of dimension lumber that was in the range of 30.0%-16.1% moisture content.

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