• 제목/요약/키워드: vanadium

검색결과 648건 처리시간 0.021초

모노리스 $NH_3-SCR$ 반응기 내에서의 $NH_3$ 흡.탈착 특성에 대한 연구 (A Study of $NH_3$ Adsorption/Desorption Characteristics in the Monolithic $NH_3-SCR$ Reactor)

  • 왕태중;백승욱;정명근;여권구
    • 한국자동차공학회논문집
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    • 제14권3호
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    • pp.125-132
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    • 2006
  • Transient kinetics of $NH_3$ adsorption/desorption and of SCR(selective catalytic reduction) of NO with $NH_3$ were studied over vanadium based catalysts, such as $V_2O_5/TiO_2$ and $V_2O_5-WO_3/TiO_2$. In the present catalytic reaction process, NO adsorption is neglected while $NH_3$ is strongly chemisorbed on the catalytic surface. Accordingly, it is ruled out the possibility of a reaction between strongly adsorbed $NH_3$ and NO species in line with the hypothesis of an Eley-Rideal mechanism. The present kinetic model assumes; (1) non-activated $NH_3$ adsorption, (2) Temkin-type $NH_3$ coverage dependence of the desorption energy, (3) non-linear dependence of the SCR reaction rate on the $NH_3$ surface coverage. Thus, the surface heterogeneity for adsorption/desorption of $NH_3$ is taken into account in this model. The present study extends the pure chemical kinetic model based on a powdered-phase catalytic system to the chemico-physical one applicable to a realistic monolith reactor.

$Fe_{1+x}V_{2-x}O_4$ Spinel의 부성저항특성 (Negative Resistance Characteristics of $Fe_{1+x}V_{2-x}O_4$ Spinels)

  • 이길식;손병기;이종덕
    • 대한전자공학회논문지
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    • 제14권3호
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    • pp.25-31
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    • 1977
  • Fe O 와 V O 를 적당한 mole비로 혼합하여 H -CO 분위기 중 1,100℃에서 10시간씩 5∼6회 반복소성하여 Fe V O Spinel을 제조하였다. 제조된 시편의 온도에 대한 저항률을 측정하고 이로부터 활성화에너지를 구해서 시편의 도전기구를 고찰하고, x, 주위온도, 시편의 두께 및 인가전압 상승률에 대한 I-V 특성곡선을 얻어서 부성저항 발생기구의 해명을 시도하였다. Fe V -O spinel의 도전은 주로 B자리의 Fe 와 F 사이의 전자 hopping에 기인되며, 부성저항은 filament형의 통전로에 기인되는 열적현상이라 생각된다.

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암모니아를 환원제로 이용한 NOx 저감 촉매 기술 (Catalytic Technology for NOx Abatement using Ammonia)

  • 박순희;이관영;조성준
    • 청정기술
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    • 제22권4호
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    • pp.211-224
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    • 2016
  • 가솔린 자동차의 내연기관 배기가스 처리를 위한 촉매로 삼원촉매가 널리 사용되고 있다. 반면 디젤 자동차의 배출 오염 물질 처리를 위해서는 다양한 기술들이 연구개발되고 있다. 디젤 자동차의 특징인 희박연소 조건에서 발생하는 질소산화물의 저감과 제거를 위해 티타니아에 담지된 바나듐 촉매가 상용화되어 있다. 바나듐 촉매를 이용한 질소산화물 저감기술은 암모니아를 환원제로 이용함으로써 대형 디젤 차량에 효과적으로 적용할 수 있다. 최근 활발하게 연구개발이 이루어지고 있는 구리가 이온 교환된 제올라이트 촉매는 초고연비 자동차 개발의 필수 기술로 인식되고 있다. 본 총설에서는 디젤 엔진의 배기가스 중 질소산화물을 효과적으로 제거하기 위한 후처리 기술 중 하나인 암모니아를 이용한 선택적 촉매 환원 반응의 촉매로 사용되는 구리가 이온 교환된 제올라이트 촉매와 관련한 최근 연구개발 동향을 소개하고자 한다.

DMF 수용매에서 벤질알코올에 의한 바나듐(V)의 환원반응속도와 메카니즘 (Rates and Mechanism of the Reduction of Vanadium(V) by Benzyl Alcohol in Aqueous Dimethylformamide)

  • 김창수;이우식
    • 대한화학회지
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    • 제32권3호
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    • pp.179-185
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    • 1988
  • 과염소산이 존재하는 디메틸포름아미드 수용액에서 벤질알코올과 VO_2\;^+$를 반응시키면 $VO^{2+}$와 벤즈알데히드를 생성한다. 이때 생성물인 $VO^{2+}$와 벤즈알데히드는 적외선 분광광도법과 기체크로마토그래피법으로 확인하였다. 벤질알코올에 의한 VO_2\;^+$의 환원반응에 대한 속도론적 연구는 분광광도법으로 행하였다. 이 반응에 대한 실험속도식은 다음과 같이 나타낼 수 있으며 속도결정단계는 $VO^{2+}$$C_6H_5CHOH$의 생성과정이다. $-d[VO_2\;^+]/dt=2\{\\{k_O+k_H[HClO_4]\}\[VO_2\;^+][C_6H_5CH_2OH]$이 반응의 활성화파라미터는 ${\Delta}H^{\neq}=13.32{\pm}1.73\;kcalmol^{-1}$ 이고 ${\Delta}S^{\neq}$$-31.02{\pm}0.09\;calmol^{-1}K^{-1}$이다.

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Electrochemical Performance of AlF3-Coated LiV3O8 for Aqueous Rechargeable Lithium Ion Batteries

  • Tron, Artur;Kang, Hyunchul;Kim, Jinho;Mun, Junyoung
    • Journal of Electrochemical Science and Technology
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    • 제9권1호
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    • pp.60-68
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    • 2018
  • In aqueous rechargeable lithium ion batteries, $LiV_3O_8$ exhibits obviously enhanced electrochemical performance after $AlF_3$ surface modification owing to improved surface stability to fragile aqueous electrolyte. The cycle life of $LiV_3O_8$ is significantly enhanced by the presence of an $AlF_3$ coating at an optimal content of 1 wt.%. The results of powder X-ray diffraction, energy dispersive X-ray spectroscopy, X-ray photoelectron spectroscopy, inductively coupled plasma-optical emission spectrometry, and galvanostatic charge-discharge measurements confirm that the electrochemical improvement can be attributed mainly to the presence of $AlF_3$ on the surface of $LiV_3O_8$. Furthermore, the $AlF_3$ coating significantly reduces vanadium ion dissolution and surface failure by stabilizing the surface of the $LiV_3O_8$ in an aqueous electrolyte solution. The results suggest that the $AlF_3$ coating can prevent the formation of unfavorable side reaction components and facilitate lithium ion diffusion, leading to reduced surface resistance and improved surface stability compared to bare $LiV_3O_8$ and affording enhanced electrochemical performance in aqueous electrolyte solutions.

Effect of Substituting B2O3 for P2O5 in Conductive Vanadate Glass

  • Choi, Suyeon;Kim, Jonghwan;Jung, Jaeyeop;Park, Hyeonjoon;Ryu, Bongki
    • 한국세라믹학회지
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    • 제52권2호
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    • pp.140-145
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    • 2015
  • In this study, we verified the relationship among the electrical conductivity, chemical durability, and structure of conductive vanadate glass in which $BO_3$ and $BO_4$ and $V^{4+}$ and $V^{5+}$ coexist simultaneously. We prepared samples of vanadium borophosphate glass with various compositions, given by $50V_2O_5-xB_2O_3-(50-x)P_2O_5$(x = 0 ~ 20 mol%) and $70V_2O_5-xB_2O_3-(70-x)P_2O_5$(x = 0 ~ 10 mol%), and analyzed the electrical conductivity, chemical durability, FT-IR spectroscopy, thermal properties, density, and molar volume. Substituting $B_2O_3$ for $P_2O_5$ was found to improve the electrical conductivity, chemical durability, and thermal properties. From these results, we can draw the following conclusions. First, the electrons shift from the electron rich $V^{4+}$ to the electron deficient $BO_3$ as the $B_2O_3$ content increases. Second, the improvement in chemical durability and thermal properties is attributed to an increase in cross-linked structures by changing from a $BO_3$ structure to a $BO_4$ structure.

바나듐 및 크롬을 포함하는 다 성분 Boride 코팅의 생성 및 특성 평가 (Formation of Multi-Component Boride Coatings Containing V and/or Cr and Evaluation of Their Properties)

  • 이의열;윤상혁;김종하
    • 한국표면공학회지
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    • 제49권2호
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    • pp.211-217
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    • 2016
  • Boride coating applied on steam turbine parts of power plants has provided good particle erosion resistance under temperature of $550^{\circ}C$, but it isn't able to protect the parts effectively any more in ultra super critical (USC) steam turbine which is being operated up to temperature of $650^{\circ}C$. To ensure stable durability for USC steam turbine parts, an alternative coating replacing boride coating should be developed. In this study, multi-component boride coatings containing elements such as chromium (Cr) and vanadium (V) were formed on base metal (B50A365B) using thermochemical treatment method called by pack cementation. The thermochemical treatments involve consecutive diffusion of boron(B) and Cr or/and V using pack powders containing diffusion element sources, activators and diluents. The top layer of Cr-boride coating is primarily consisted of $Cr_2B_3$ and $Cr_5B_3$, while that of V-boride coating is mostly consisted of $VB_2$ and $V_2B_3$. The (Cr,V)-boride coating is consisted of $Cr_2B_3$, $Cr_5B_3$ and $V_2B_3$ mostly. The top surfaces of 3 multi-component boride coatings show hardness of $3200-3400H_v$, which is much higher than that of boride, about $1600-2000H_v$. In 5 wt.% NaCl solution immersion tests, the multi-component boride coatings show much better corrosion resistance than boride coating.

V2O5 기반의 금속 산화물 투명 광전소자 (V2O5 Embedded All Transparent Metal Oxide Photoelectric Device)

  • 김상윤;최유림;이경남;김준동
    • 전기학회논문지
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    • 제67권6호
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    • pp.789-793
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    • 2018
  • All transparent metal oxide photoelectric device based on $V_2O_5$ was fabricated with structure of $V_2O_5/ZnO/ITO$ by magnetron sputtering system. $V_2O_5$ was deposited by reactive sputtering system with 4 inch vanadium target (purity 99.99%). In order to achieve p-n junction, p-type $V_2O_5$ was deposited onto the n-type ZnO layer. The ITO (indium tin oxide) was applied as the electron transporting layer for effective collection of the photo-induced electrons. Electrical and optical properties were analyzed. The Mott-Schottky analysis was applied to investigate the energy band diagram through the metal oxide layers. The $V_2O_5/ZnO/ITO$ photoelectric device has a rectifying ratio of 99.25 and photoresponse ratios of 1.6, 4.88 and 2.68 under different wavelength light illumination of 455 nm, 560 nm and 740 nm. Superior optical properties were realized with the high transmittance of average 70 % for visible light range. Transparent $V_2O_5$ layer absorbs the short wavelength light efficiently while passing the visible light. This research may provide a route for all-transparent photoelectric devices based on the adoption of the emerging p-type $V_2O_5$ metal oxide layer.

해수(海水)로부터 희유금속(稀有金屬) 회수(回收) 연구동향(硏究動向) (R&D Trends of Rare Metals Recovery from Seawater)

  • 김종헌;노경란;김상우;최성배;길상철
    • 자원리싸이클링
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    • 제22권6호
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    • pp.73-80
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    • 2013
  • 해양광물자원은 크게 해저면에 부존되어 있는 해저광물자원과 해수 중에 녹아 있는 해수광물자원으로 대별된다. 해수에는 막대한 양의 유용광물이 녹아 있어 회수기술 개발이 완료되면 상업화 가능성이 큰 것으로 알려져 있다. 21세기에 들어 육상금속자원의 저품위화 및 매장량 고갈에 따라 자원 보유국들이 자원을 무기화 하는 경향이 심화되고 있다. 따라서 대부분의 금속자원을 수입에 의존하는 우리나라는 삼면이 바다인 지리적 특성을 살려 해수로부터 희유금속 회수기술 개발에 적극적으로 나설 필요가 있다. 본 연구에서 해수로부터 희유금속 회수관련 논문분석 결과, 미국이 495편의 논문을 게재하여 양적 질적으로 가장 우수한 것으로 나타났다. 연구기관별로 보면 Chinese Acad. Sci.가 152편의 논문을 게재하여 양적으로 많은 연구가 이루어졌으며, 31편의 논문을 게재한 Univ. Oxford는 질적으로 가장 우수한 것으로 나타났다.

The Characterization of V Based Self-Forming Barriers on Low-k Samples with or Without UV Curing Treatment

  • 박재형;한동석;강유진;신소라;박종완
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.214.2-214.2
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    • 2013
  • Device performance for the 45 and 32 nm node CMOS technology requires the integration of ultralow-k materials. To lower the dielectric constant for PECVD and spin-on materials, partial replacement of the solid network with air (k=1.01) appears to be more intuitive and direct option. This can be achieved introducting of second "labile" phase during depositoin that is removed during a subsequent UV curing and annealing step. Besides, with shrinking line dimensions the resistivity of barrier films cannot meet the International Technology Roadmap for Semiconductors (ITRS) requirements. To solve this issue self-forming diffusion barriers have drawn attention for great potential technique in meeting all ITRS requirments. In this present work, we report a Cu-V alloy as a materials for the self-forming barrier process. And we investigated diffusion barrier properties of self-formed layer on low-k dielectrics with or without UV curing treatment. Cu alloy films were directly deposited onto low-k dielectrics by co-sputtering, followed by annealing at various temperatures. X-ray diffraction revealed Cu (111), Cu (200) and Cu (220) peaks for both of Cu alloys. The self-formed layers were investigated by transmission electron microscopy. In order to compare barrier properties between V-based interlayer on low-k dielectric with UV curing and interlayer on low-k dielectric without UV curing, thermal stability was measured with various heat treatment temperature. X-ray photoelectron spectroscopy analysis showed that chemical compositions of self-formed layer. The compositions of the V based self-formed barriers after annealing were strongly dominated by the O concentration in the dielectric layers.

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