• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.202-202
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• 2011

Diagnostics of plasma density is a key factor for monitoring plasma processing. Various probes are invented to measure plasma density and cut-off probe is a one of the most promising diagnostics tool for measuring plasma density. However, at the low density or high pressure the cut-off probe cannot clearly resolve the cut-off peak. Several reasons make this problem: Cut-off likes peaks caused by cavity resonances and weaken transmission spectrum signal at high pressure. Recently, You et al., have researched mechanism of cut-off probe and we improve the cut-off reliability and sensitivity base on that research. Modified cut-off antenna is adapted and bias cut-off probe method is tried. These experiment results have good agreement with the previous study and show good measurement characteristics.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.499-499
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• 2012

This study was evaluated on etcher of capacitive coupled plasmas with OES (Optical Emission Spectroscopy) and impedance by VI probe that are widely used for process control and monitoring at semiconductor industry. The experiment was operated at conventional Ar and C4F8 plasma with variable change such as pressure and addition of gas (Atmospheric Leak: N2 and O2), RF, pressure, that are highly possible to impact wafer yield during wafer process, in order to observe OES and VI Probe signals. The sensitivity change on OES and Impedance by Vi probe was analyzed by statistical method to determine healthy of process. The main goal of this study is to understand unwanted tool performance to eventually improve productive capability. It is important for process engineers to actively adjust tool parameter before any serious problem occurs.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.474-474
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• 2011

Graphene is considered as a potential candidate for the key material in the ideal 2D nanoelectronics. Recently, it is reported that graphene has an interesting sensitivity to molecular adsorption on it. Such properties are believed to be enhanced by the existence of disorders and ripples inside graphene as well as by the interaction with the substrate underneath. Here, we report the effect of introducing structural disorders to the graphene on its electrical properties such as conductance, transconductance, low frequency noise, which can be successfully described by a simple model of the continuum percolation. In addition, the response of the graphene device to gaseous molecular adsorption was systematically investigated and the results were discussed along with the change in Raman spectra.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.83.1-83.1
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• 2013

반도체 미세화, Glass 대면적화에 따른 산포관리 및 불량방지 필요(공정이격관리), 설비 데이터만으로는 Sensitivity가 낮아 공정 관리 어려움에 따른 대안 필요, 향후 추가 센서에 대한 접목이 용이한 SW Frame 필요, 양산적용을 위한 설비 및 FAB Host의 자동화 연계 개발 필요, 이종데이터의 통합를 통한 최적의 진단 및 관리가 필요합니다(SCM:툴박스). 즉, 기존의 장비 Parameter가 아닌 실제 공정시 Chamber로부터 얻을 수 있는 물리, 전기, 화학적인 데이터를 적합한 이종(異種) 센서를 직접 부착하여 이들 데이터를 통합 관리 분석 및 실시간 Monitoring을 통한 공정 진단 및 실시간 진단을 실행하는 솔루션입니다. 실 공정 시 적용이 유리한 OES 데이터를 주요 인자로 이외의 기타 데이터를 추가로 통합하여 특화된 분석환경과 공정 모니터링을 통하여 TAT (Turn Around Time)를 줄이고, MTBC (Mean Time Between Clean)를 늘림으로써 궁극적으로 칩메이커의 제품의 가격 경쟁력을 확보 할 수 있는 기능이며, 설비사 입장에서는 자사설비의 지능형 시스템을 위한 제반 기술이기도 합니다.

• Applied Science and Convergence Technology
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• v.23 no.6
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• pp.328-339
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• 2014

In this article, plasma monitoring tools and mulivariate analysis techniques were reviewed. Optical emission spectroscopy was reviewed for a chemical composition analysis tool and RF V-I probe for a physical analysis tool for plasma monitoring. Multivariate analysis techniques are discussed to the sensitivity improvement. Principal component analysis (PCA) is one of the widely adopted multivariate analysis techniques and its application to end-point detection of plasma etching process is discussed.

• Journal of the Korean Ceramic Society
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• v.32 no.12
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• pp.1369-1376
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• 1995

The WO3 thin-film NOx sensor which is of practical use and includes the heater and the temperature sensor was fabricated. The WO3 thin films as a gas-sensing layer was deposited at ambient temperature in a high-vacuum resistance heated evaporator. The highest sensitivity of the WO3 thin-film sensor to NOx was obtained under the condition of the annealing temperature of 50$0^{\circ}C$ and the operating temperature of 30$0^{\circ}C$. The gas sensing characteristics of this sensor was excellent, i.e. high sensitivity (Rgas/Rair in 3 ppm NO2=53) and fast response time (4 seconds).

• Journal of Sensor Science and Technology
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• v.5 no.5
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• pp.39-46
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• 1996

The Pd or Pt-doped $WO_{3}$ thin-film NOx sensor was fabricated. The $WO_{3}$-based thin films as a gas-sensing layer were deposited at ambient temperature in a high-vacuum resistance heated evaporator and annealed at $500^{\circ}C$. The gas sensitivity ($R_{gas}/R_{air}$) to 5 ppm $NO_{2}$ measured at the operating temperature of $300^{\circ}C$ was 50 (highest sensitivity) for the 0.5 wt.% $Pt-WO_{3}$ sensor.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.374-374
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• 2012

Nowadays, Active Matrix Organic Light-Emitting Diodes (AM-OLEDs) are the superior display device due to their vivid full color, perfect video capability, light weight, low driving power, and potential flexibility. One of the advantages of AM-OLED over Liquid Crystal Display (LCD) lies in its flexibility. The potential flexibility of AM-OLED is not fully explored due to its sensitivity to moisture and oxygen which are readily present in atmosphere, and there are no flexible encapsulation layers available to protect these. Therefore, we come up with a new concept of Inorganic-Organic hybrid thin film as the encapsulation layer. Our Inorganic layer is Al2O3 and Organic layer is F-Alucone. We deposited these layers in vacuum state using Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) techniques. We found the results are comparable to commercial requirement of 10-6 g/m2 day for Water Vapor Transmission Rate (WVTR). Using ALD and MLD, we can control the exact thin film thickness and fabricate more dense films than chemical or physical vapor deposition methods. Moreover, this hybrid encapsulation layer potentially has both the flexibility of organic layers and superior protection properties of inorganic layer.

• Proceedings of the KIEE Conference
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• 2006.07c
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• pp.1635-1636
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• 2006

In this paper, a non-vacuum packaged single crystalline silicon MEMS gyroscope is designed, fabricated and tested. To reduce air damping of the gyroscope structure for non-vacuum packaging, air damping model is used and damping is minimized by analysis. The inner and outer spring length is optimized by ANSYS simulation for rigid body motion. The gyroscope is fabricated by SiOG(Silicon On Glass) process. The performance of the gyroscope is measured to evaluate the characteristic of the gyroscope. The sensitivity, non-linearity, noise density and the bias stability are measured to 9.7693 mV/deg/s, 04265 %, 2.3 mdeg/s/rtHz and 16.1014 deg/s, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.128.2-128.2
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• 2013

Crucially, effective catalysts must be capable of efficiently catalyzing the protonation of adsorbed CO to adsorbed CHO or COH. One of the strategies is alloying with metals with higher oxygen affinity and Au-Zn alloy is one of the best candidates. At first, we made Au-Zn alloy using vacuum evaporating method. Zn was deposited on the Au(211) surface and the amount was estimated by X-ray photoelectron spectroscopy (XPS) using the relative sensitivity of Au 4f and Zn 3d. We investigated CO adsorption on a clean Au(211) and Au-Zn alloy using temperature-programmed desorption (TPD) and XPS. From the TPD results, we can conclude that the presence of the particular step sites at the Au(211) surface imparts stronger CO bonding and Zn atoms are sitting on the step sites at the Au(211) when Zn is deposited. The XPS results show the oxygen atoms of CO bond Zn atoms on Au-Zn surface. It should be an evidence that alloying Zn atoms that has high oxygen affinity into an electrocatalyst may allow CHO* to bind to the surface through both the carbon and oxygen atoms.