• 제목/요약/키워드: vacuum deposition polymerization

검색결과 20건 처리시간 0.031초

Fabrication of Hybrid Films Using Titanium Chloride and 2,4-hexadiyne-1,6-diol by Molecular Layer Deposition

  • 윤관혁;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.418-418
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    • 2012
  • We fabricated a new type of hybrid film using molecular layer deposition (MLD). The MLD is a gas phase process analogous to atomic layer deposition (ALD) and also relies on a saturated surface reaction sequentially which results in the formation of a monolayer in each sequence. In the MLD process, polydiacetylene (PDA) layers were grown by repeated sequential surface reactions of titanium tetrachloride and 2,4-hexadiyne-1,6-diol with ultraviolet (UV) polymerization under a substrate temperature of $100^{\circ}C$. Ellipsometry analysis showed a self-limiting surface reaction process and linear growth of the hybrid films. Polymerization of the hybrid films was confirmed by infrared (IR) spectroscopy and UV-Vis spectroscopy. Composition of the films was confirmed by IR spectroscopy and X-ray photoelectron (XP) spectroscopy. The titanium oxide cross-linked polydiacetylene (TiOPDA) hybrid films exhibited good thermal and mechanical stabilities.

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VDP(Vapor Deposition Polymerization) 방법을 이용한 유기 게이트 절연막의 대한 연구 (Study on the Organic Gate Insulators Using VDP Method)

  • 표상우;심재훈;김정수;김영관
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.185-190
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    • 2003
  • In this paper, it was demonstrated that the organic thin film transistors were fabricated by the organic gate insulators with vapor deposition polymerization (VDP) processing. In order to form polyimide as a gate insulator, vapor deposition polymerization process was also introduced instead of spin-coating process, where polyimide film was co-deposited by high-vacuum thermal evaporation from 4,4'-oxydiphthalic anhydride (ODPA) and 4,4'-oxydianiline (ODA) and 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride (6FDA) and ODA, and cured at $150^{\circ}C$ for 1hr. Electrical output characteristics in our organic thin film transistors using the staggered-inverted top-contact structure obtained to the saturated slop in the saturation region and the subthreshold non-linearity in the triode region. Field effect mobility, threshold voltage, and on-off current ratio in $0.45\;{\mu}m$ thick gate dielectric layer were about $0.17\;cm^2/Vs$, -7 V, and $10^6\;A/A$, respectively. Details on the explanation of compared to organic thin-film transistors (OTFTS) electrical characteristics of ODPA-ODA and 6FDA-ODA as gate insulators by fabricated thermal co-deposition method.

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Vapor Deposition Polymerization(VDP)을 이용한 페시베이션이 유기박막트렌지스터에 주는 영향 (Effects of Organic Passivation Layers by Vapor Deposition Polymerization(VDP) for Organic Thin-Film Transistors(OTFTs))

  • 박일흥;형건우;최학범;김재혁;김우영;김영관
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.114-115
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    • 2007
  • In this paper, it was demonstrated that organic thin-film transistors (OTFTs) were fabricated with the organic passivation layer by vapor deposition polymerization (VDP) processing, In order to form polymeric film as an passivation layer, VDP process was also introduced instead of spin-coating process, where polymeric film was co-deposited by high-vacuum thermal evaporation from 6FDA and ODA followed by curing, Field effect mobility, threshold voltage, and on-off current ratio with 450-nm-thick organic passivation layer were about $0.21\;cm^2/Vs$, IV, and $1\;{\times}\;10^5$, respectively.

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진공증착중합법을 이용한 6FDA/4-4'DDE 폴리이미드 박막의 제조와 전기적 특성 (Electrical Properties and Preparation of 6FDA/4-4'DDE Polyimide Thin films by Bapor Deposition Polymerization method)

  • 이붕주;김형권;이덕출
    • 한국진공학회지
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    • 제7권3호
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    • pp.229-236
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    • 1998
  • 본 논문에서는 건식중합법에 속하는 진공증착 중합법을 이용하여 내열 절연성 박막 을 제작하고 열경화 온도에 따른 박막의 물성과 전기적 특성에 대해 연구하였다. hexafluoroisopropyliden-2,2-bis[phthalicanhydride](6FDA)와 4,4'-diamino diphenyl ether (DDE) 단량체를 화학량론적으로 최적의 온도인 $214^{\circ}C$, $137^{\circ}C$부분에서 같은 증발율을 보일 때 폴리이미드를 형성하였다. 진공증착 중합된 박막은 열경화에 의해 이미드특성 피이크가 증가되며, 폴리아믹산의 형태에서 폴리이미드 형태로 축중합되어짐을 알 수 있었다. 열경화 온도가 증가함에 따라 박막의 두께는 감소되고 굴절율은 증가된다. 열경화 온도가 $300^{\circ}C$인 경우 최적임을 알았고, 이 온도에서 열경화 시킨 폴리이미드의 전기적 특성에서 100Hz~ 200kHz주파수에서는 3.7의 비유전율을 나타내었고, 유전정접은 0.008의 낮은 값을 보였다. 또한, 30~에서 약1.05$\times$1015$\Omega$cm의 저항율을 보였다.

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플라즈마 중합법에 의한 스티렌 박막의 분자 구조 및 분자량 제어에 관한 연구 (A Study on the molecular structure and molecular weight control of styrene films by plasma polymerization)

  • 김종택;최충양;박종관;박응춘;이덕출
    • 한국진공학회지
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    • 제6권3호
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    • pp.213-219
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    • 1997
  • 본 연구에서는 내전극 정전결합 유동가스형 반응장치를 이용하여 플라즈마 중합 스 티렌 박막을 제작하고 적외선분광스펙트럼, 열분해가tm크로마토그래피, 시차주사열량계 및 겔투과성 크로마토그래피의 분석을 통하여 중합조건이 분자구조 및 분자량 분포에 미치는 영향을 조사하였다. 위의 결과로부터 개시 모노머의 화학적 특성과는 다른 고도로 가교된 박막이 생성되었으며, 방전압력, 방전전력 및 가스의 유량 등의 중합조건 조절에 의해 분자 구조, 가교도, 분자량 분포 등의 제어가 가능함이 판명되었다. 따라서 내전극 정전결합 유동 가스형 반응장치에 의해 수행된 플라즈마중합법은 중합조건의 조절에 의해 센서의 감지막, 광도전성 소자 및 포토 레지스트 등에 응용가능한 기능성 유기박막의 제작에 좋은 특성을 나타내는 것을 알 수 있었다.

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Wettability control in C-SiOx film formed by plasma polymerization of HMDSO/$O_2$ mixture

  • Kim, Seong-Jin;Lee, Kwang-Ryeol;Moon, Myoung-Woon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.328-328
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    • 2011
  • Wetting phenomena have been heavily studied for industrial and academic researches especially tuning the wettability between hydrophilicity and hydrophobicity. Wicking through the surface texture is shown on superhydrophilic surface while rolling (or dewetting) on the patterns of superhydrophobic surface. These wetting phenomena are known to be affected by surface wettability determined with physical surface patterns as well as chemical composition of surface layer. In this research, we introduce a method to control the wettability of a thin C-SiOx film from hydrophobic to hydrophilic using a mixture gas of HMDSO/$O_2$ by plasma polymerization with rf-CVD (radio frequency-Chemical Vapor Deposition). Wettability was finely controlled by changing the ratio of HMDSO/$O_2$. Hydrophilicity increased as the ratio decreased, while hydrophobicity was enhanced by the ratio. Moreover, fine control from superhydrophilicity to superhydrophobicity was achieved by C-SiOx coating on the Si wafer with prepatterns of submicron-sized pillar array formed by $CF_4$ plasma etching.

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The Characteristics of Plasma Polymerized Carbon Hardmask Film Prepared by Plasma Deposition Systems with the Variation of Temperature

  • Yang, J.;Ban, W.;Kim, S.;Kim, J.;Park, K.;Hur, G.;Jung, D.;Lee, J.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.381.1-381.1
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    • 2014
  • In this study, we investigated the deposition behavior and the etch resistivity of plasma polymerized carbon hardmask (ppCHM) film with the variation of process temperature. The etch resistivity of deposited ppCHM film was analyzed by thickness measurement before and after direct contact reactive ion etching process. The physical and chemical properties of films were characterized on the Fourier transform infrared (FT-IR) spectroscope, Raman spectroscope, stress gauge, and ellipsometry. The deposition behavior of ppCHM process with the variation of temperature was correlated refractive index (n), extinction coefficient (k), intrinsic stress (MPa), and deposition rate (A/s) with the hydrocarbon concentration, graphite (G) and disordered (D) peak by analyzing the Raman and FT-IR spectrum. From this experiment we knew an optimal deposition condition for structure of carbon hardmask with the higher etch selectivity to oxide. It was shown the density of ppCHM film had 1.6~1.9 g/cm3 and its refractive index was 1.8~1.9 at process temperature, $300{\sim}600^{\circ}C$. The etch selectivity of ppCHM film was shown about 1:4~1:8 to undoped siliconoxide (USG) film (etch rate, 1300 A/min).

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Fabrication of Conducting Polymer Thin Films Using Molecular Layer Deposition

  • 한규석;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.289-289
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    • 2011
  • The conducting polymer thin films were deposited using the gas phase method which known as molecular layer deposition (MLD). Terephthalaldehyde (TPA) and p-phenylenediamine (PD) were used as monomers to deposit conducting polymer. Self-terminating nature of TPA and PD reaction were demonstrated by growth rate saturation versus precursors dosing time. Infrared spectroscopic and X-ray photoelectron spectroscopy were employed to determine the chemical composition and state of conducting polymer thin films. Layer by layer growth and polymerization of thin films can be showed by shifting of absorption edge using UV-VIS spectroscopy. This conducting polymer fabricated by using MLD method gives the opportunity to develop new hybrid materials by combining inorganic materials in nanoscale.

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아세틸렌기가 치환된 플루오렌 증착박막의 열 및 자외선 경화 (Thermal and UV Curing of Vacuum Deposited Film of Acetylene Substituted Fluorenes)

  • 정상현;김정수;강영구;이창진
    • 폴리머
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    • 제25권3호
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    • pp.327-333
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    • 2001
  • 아세틸렌기가 치환된 fluorene 유도체 2-ethynylfluorene과 2,7-diethynylfluorene을 합성하였고 이를 진공 증착하여 박막을 제조하였다. 심중결합이 치환된 fluorene 유도체들은 자외선 및 열에 의해 경화가 가능하였다. DSC 측정 결과 2-ethynylfluorene은 $231^{\circ}C$에서 그리고 2,7-diethynylfluorene은 198$198^{\circ}C$에서 경화가 일어나는 것이 관측되었다. 경화된 poly(2-ethynylfluorene) 및 poly(2,7-diethynylfluorene)의 분해는 380 및 385$^{\circ}C$에서 일어나기 시작하였으며 T$T_g$는 관측되지 않았다. 경화된 박막의 광발광 특성은 단량체와 매우 유사하나, 발광 효율은 3에서 10배 정도 감소하였다.

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Formation of hydrophilic polymer films by DC-plasma of monomer and reactive gases

  • Kim, Ki-Hwan;Park, Sung-Chang;doo-Jin choi;Jung, Hyung-Jin;Koh, Seok-Keun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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    • pp.161-161
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    • 1999
  • In the field of material science, the interests and efforts to modify the surface of materials in agreement with the need of usage have been extensively increasing. he modification to improve the wettability of surface is very important is terms of adhesion, printing, etc. It is very difficult to modify metal surface into hydrophilic one. therefore, surfactant coating has been generally used in many cases. However, surfactant has disadvantages such as environmental problem, soluble in water. in this study, hydrophilic polymer films as alternative of surfactant were deposited on metal substrate by DC plasma polymerization. Hydrophilic polymer films deposited by DC plasma show many merits such as good wettability, stone adhesion to substrate, high resistance to most chemicals. Monomer gas and reactive gas were used as source plasma polymerization. Plasma polymerized films were fabricated with process parameters of deposition time, ratio of gas mixture, current, pressure, etc. Effects of these variables on wettability of plasma polymer films will be discussed. With XPS and FT-IR analyses of plasma polymeric films, the relation between wettability and chemical state of polymer films by DC plasma was investigated.

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