Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2011.02a
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- Pages.328-328
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- 2011
Wettability control in C-SiOx film formed by plasma polymerization of HMDSO/$O_2$ mixture
- Kim, Seong-Jin (Korea Institute of Science and Technology) ;
- Lee, Kwang-Ryeol (Korea Institute of Science and Technology) ;
- Moon, Myoung-Woon (Korea Institute of Science and Technology)
- Published : 2011.02.09
Abstract
Wetting phenomena have been heavily studied for industrial and academic researches especially tuning the wettability between hydrophilicity and hydrophobicity. Wicking through the surface texture is shown on superhydrophilic surface while rolling (or dewetting) on the patterns of superhydrophobic surface. These wetting phenomena are known to be affected by surface wettability determined with physical surface patterns as well as chemical composition of surface layer. In this research, we introduce a method to control the wettability of a thin C-SiOx film from hydrophobic to hydrophilic using a mixture gas of HMDSO/