• 제목/요약/키워드: vacuum chamber

검색결과 648건 처리시간 0.027초

Understanding Ion Pump Emissions : Classification, Source Identification and Elimination of Emissions from Ion Pumps

  • Wynohrad, Tony
    • Applied Science and Convergence Technology
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    • 제23권6호
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    • pp.340-344
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    • 2014
  • Ion pumps continue to be a staple in ultra-high vacuum (UHV) applications. Since their adoption as a primary UHV pump in the 1960's, it has been known that a variety of particles can emanate from within the ion pump and cause undesirable effects on current measurements and optics components. Historically the solution has been baffling and shielding which results in longer conductance paths to the ion pump. Those solutions can work, but require a larger pump and more vacuum plumbing to compensate for conductance losses. The first step was to fully understand the nature of the particles and their charges. Once those were characterized options for emissions reduction were evaluated. It was determined that an efficient design of shielding near the source of the particle generation site was the most cost effective solution. With a slight modification to the chamber of a small ion pump, internal shielding was developed that reduced the emissions by a factor of up to 1000 times.

Fabrication and Installation of the MPK-EPU Vacuum System

  • 홍만수;권혁채;한홍식;김창균;하태균;김재영;박종도
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.148.1-148.1
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    • 2014
  • 포항가속기연구소는 Dipole Magnet, Wiggler, Undulator 등 다양한 광원에서 발생되는 강한 방사광을 여러 연구에 이용하고 있다. Max-Planck POSTECH 분원용 타원편광 Undulator (이하, MPK-EPU)는 carbon의 흡수선을 포함하는 250 eV에서 시작하여, 1,500 eV~3,000 eV 에너지 영역의 방사광을 발생시켜 자성물질을 비롯한 다양한 이방성 물질의 연구를 수행하는데 활용할 예정이다. 현재, MPK-EPU용 진공용기의 기계가공, 화학세척, 용접 및 최종 초고진공 진공 달성을 위한 탈기체처리, NEG 활성화 작업등을 마무리하고 PLS-II 저장링 6A 구간에 설치 완료하였다. 이 논문에서는 MPK-EPU용 진공시스템의 제작 및 설치작업에 대한 전반적인 사항과 진공작업 및 그 결과를 발표하고자 한다.

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스테인레스 강의 진공특성에 대한 화학세척의 효과 (Effect of Chemical Cleaning on Vacuum Properties of a Stainless Steel Surface)

  • 유선일;이성수;정진욱;정석민
    • 한국진공학회지
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    • 제1권1호
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    • pp.1-10
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    • 1992
  • Three chemical precleaning methods-degreasing, electropolishing and acidic etching-suitable for stainless steel vacuum chamber have been studied and compared. The techniques used in evaluating and comparing the three treatments include Auger analysis and the measurement of the outgassing rate. The obtained outgassing rates (N2 equivalent) are 1.1 $\times$ 10-10torr l/s cm2 and 3.9 $\times$ 10-11torr l/s cm2 for degreasing electropolishing, and etching method, respectively, after 48 hours from the initial pumpdown at room temperature. A simple model is introduced to analyze the pumpdown curve. Some surface parameters, such as surface coverage, mean residence time, and desorption energy, are calculated from corresponding equations derived from this model.

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예냉처리가 풋옥수수의 냉각속도 및 호흡량 변화에 미치는 영향 (Effect of Precooling on Removal of Field Heat and Respiration Rate of Vegetable Corn(Zes Mays L.))

  • 손영구;김성열
    • 한국식품저장유통학회지
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    • 제3권1호
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    • pp.55-60
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    • 1996
  • To obtain the basic data on precooling effects for establishment the suitable postharvest handling technique or method of keeping high quality of vegetalble corn, the sweet, supersweet and waxy corn, (Danok #2, Cocktail #86 and Chalok #1), being mainly consumed as vegetables in Korea, were precooled with ice or vacuum cooling method immediately after harvest. The vacuum cooling was the most effective for the field heat removal of vegetable corn. It took only 30 min. at 4 to 5 torr of cold chamber pressure of vacuum precooler to lower the corn temperature from 30 to 2$^{\circ}C$. The ice cooling was also thought to be a useful precooling method with relatively short cooling time of 6 hrs. The vegetable corn treated with vacuum or ice cooling showed low and stable respiration rates of 25.5 to 43.5 CO2 mg/kg/hr. when stored at 0∼2$^{\circ}C$ while the samples stored at room temperature (20∼25$^{\circ}C$) without precooling were as high as 64.1 to 245 CO, mg/kg/hr.

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미소체적을 갖는 평판표시소자용 패널내부의 잔류가스 분석 (Residual gas analysis of small cavity for emissive flat panel display)

  • 조영래;오재열;최정옥;김봉철;이병교;이진호;조경익
    • 한국진공학회지
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    • 제10권1호
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    • pp.9-15
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    • 2001
  • 질량분석기가 장착된 초고진공챔버를 사용하여 미소체적을 갖는 평판표시소자용 패널내부에 존재하는 잔류가스의 전체압력과 분압을 성공적으로 측정하였다. 패널내부의 전체압력은 $10^{-6}$Torr범위로 측정되었으며, 전체압력의 증가에 크게 기여하는 가스분압은 아르곤, 메탄 및 헬륨 분압들이었다. 패널의 진공패키징을 위한 배기공정시 가열온도는 고진공패키징에 있어서 매우 중요하며, 가열배기 온도가 높을수록 전체압력과 메탄분압은 감소하였다.

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KSTAR 제1벽 세정을 위한 방전세정 시스템 설계 (Design of the discharge cleaning system for KSTAR vacuum vessel)

  • 정승호;인상렬
    • 한국진공학회지
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    • 제16권5호
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    • pp.383-387
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    • 2007
  • 본 논문에서는 KSTAR 토카막 진공용기의 세정을 위한 방전세정 시스템의 설계에 대해 기술하였다. 먼저 방전세정효율에 영향을 주는 매개변수들에 대해 논의하였으며. 실제 설계에서 직류방전 보다 낮은 압력에서 방전이 시작되고 유지되며 따라서 세정효율이 높은 RG 방전(RF-assisted DC glow discharge) 방법을 채택하였다. 그리고 방전세정의 균일성을 위해 두 개의 방전 전극을 진공용기의 진단포트(A,I-port)에 설치하였다. 설계된 방전세정 시스템은 KSTAR 진공용기 내벽 세정뿐만 아니라 제1벽의 연료재순환(fuel recycling)이나 보론화 처리(boronization)등의 연구에도 응용될 수 있다.

수분무에 의한 아이스 슬러리 생성에 관한 연구 (A study on ice-slurry production by water spray)

  • 김병선;이윤표;윤성영;이진호
    • 설비공학논문집
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    • 제9권2호
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    • pp.134-143
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    • 1997
  • A theoretical and experimental study has been performed to investigate the characteristics of ice-slurry product. By diffusion-controlled model, the possibility of ice slurry has been theoretically anticipated. The water vapor evaporated from the surface of droplets is extracted continuously from the chamber by a vacuum pump. The droplet diameter was measured by silion immersed method. The ice slurry has been obtained by spraying droplets of ethylene-glycol aqueous solution in the chamber where pressure is maintained under the triple point of water. The droplet of which the diameter is $300{\mu}m$, and the initial temperature is $20^{\circ}C$, was changed into ice particle within the chamber of which the height is 1.33m.

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진공 이젝터-디퓨져 시스템내의 비정상 유동 과정에 관한 연구 (A Study on the Transient Flow Process in a Vacuum Ejector-Diffuser System)

  • ;김희동
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2009년도 춘계학술대회 논문집
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    • pp.299-302
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    • 2009
  • The objective of the present study is to analyze the transient flow through theejector system with the help of a computational fluid dynamics (CFD) method. An attempt is made to investigate the interesting and conflicting phenomenon of the infinite entrainment into the primary stream without an infinite mass supply from the secondary chamber. The results obtained show that the one and only condition in which an infinite mass entrainment can be possible in such types of ejectors is the generation of a re-circulation zone near the primary nozzle exit. The flow in the secondary chamber attains a state of dynamic equilibrium of pressures at the onset of the recirculation zone. A steady flow in the ejector system is valid only after this point.

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A Study on Ice Slurry Production by Water Spray

  • Kim, Byeong-Sun;Lee, Yoon-Pyo;Yoon, Seong-Young;Lee, Jin-Ho
    • International Journal of Air-Conditioning and Refrigeration
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    • 제6권
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    • pp.45-55
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    • 1998
  • A theoretical and experimental study is performed to investigate the characteristics of ice slurry product. By diffusion-controlled evaporation model the possibility of ice slurry is theoretically anticipated. The water vapor evaporated from the surface of droplets is extracted continuously from the chamber by a vacuum pump. The droplet diameter is measured by silicon immersion method. The ice slurry is obtained by spraying droplets of ethylene glycol aqueous solution in the chamber where pressure is maintained under the triple point of water. The droplet with the diameter of 300 $\mu\textrm{m}$and the initial temperature of 2$0^{\circ}C$ was changed into ice particle within the chamber of 1.33m in height.

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RF 헬리콘 플라즈마를 이용한 회학기상 증착기의 제작 (Construction of CVD by using RF Helicon Plasma)

  • 신재균;현준원;박상규
    • 한국전기전자재료학회논문지
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    • 제11권8호
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    • pp.607-612
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    • 1998
  • RF HPCVD(Helicon Plasma Chemical Vapor Deposition) has been successfully constructed for diamond thin films. The system consists of plasma generation tube, deposition chamber, pumping lines for gas system. A mixture of $CH_4 and H_2$is used for reaction. Two thermocouples, a quartz tube surrounded by a RF antenna and a magnet, and a high temperature heater were set up in the deposition chamber. The process for the thin film diamond deposition has been carried put in a high vacuum system at a substrate temperature of $800^{\circ}C$, and pressure of 5 mtorr. It is also demonstrated. that the RF HPCVD system has advantages for controlling deposition parameters easily.

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