• 제목/요약/키워드: ultraviolet ray

검색결과 323건 처리시간 0.023초

원자외선 영상/분광 측정기 광학설계 (OPTICAL DESIGN OF THE FAR ULTRAVIOLET IMAGING SPECTROGRAPH)

  • 유광선;선광일;민경욱
    • Journal of Astronomy and Space Sciences
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    • 제15권2호
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    • pp.359-371
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    • 1998
  • 본 연구에서는 원자외선 영역($900~1750AA$)에서 오로라, 주/DIRKS 대기 광 관측 및 천문학적 관측을 동시에 수행하기 위한 FUVS(Far Ultraviolet Spectrograph)를 설계하고, 그 성능을 평가하였다. FUVS의 설계는 에돌이발(grating)의 광학적 특성과 비구면 광학을 충분히 고려하여 이루어졌으며, 분해능 계산을 위해 ray-trace 방법과 파면수차 계산에 의한 방법을 사용하여 설계의 검증을 시도하였다. 두 가지 방법에 의한 결과가 오차범위 안에서 일치하여 분석 방법에 큰 문제점이 없다는 것을 간접적으로 확인할 수 있었고, 전 영역에 걸쳐 대략 $2~5AA$의 분해능을 얻었다. 또한, FUVS의 수행 임무 중 가장 검출이 힘들 것으로 생각되는 고온의 성간 플라즈마에서 방출되는 선 방출의 검출 가능성을 타진하기 위하여 FUVS의 최소 검출가능 플럭스(MDF)를 계산하였다. 이 계산을 위하여 지금까지 알려진 반사물질, MCP 등의 특성을 충분히 고려하였으며, 선의 세기에 따라 하루에서 일주일에 걸친 관측을 통해 고온의 성간 플라즈마에서 방출되는 선 방출을 검출할 수 있다는 결론을 얻었다.

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고춧가루의 HACCP 시스템 적용을 위한 미생물학적 위해 분석 (Microbiological Hazard Analysis for HACCP System Application to Red Pepper Powder)

  • 박성빈;권상철
    • 한국산학기술학회논문지
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    • 제16권4호
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    • pp.2602-2608
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    • 2015
  • 본 연구는 고춧가루의 HACCP(Hazard Analysis Critical Control Point) 시스템 적용에 필요한 미생물학적 위해 요소분석을 위한 목적으로 2014년 1월 10일~2014년 6월 13일까지 충주시 동량면 소재에 있는 용금농산에서 수행하였다. 고춧가루 제품의 모든 공정 단계들을 파악하여 공정흐름도를 작성하였고 미생물학적 위해를 제어할 수 있는 자외선살균공정에서 살균 시간을 변화시키면서 미생물의 변화를 시험한 결과 자외선 등 $20W{\times}12EA$, 살균 시간은 $63{\pm}3$초를 한계기준으로 결정하였다. 자외선살균 후에는 위해 미생물 검사 결과는 안전하나 제조환경과 작업자의 미생물 검사 결과 주기적인 세척 및 소독을 실시하여 미생물학적 위해를 감소시키고 작업자 위생교육 등을 통하여 개인위생을 준수해야 할 것으로 판단된다.

Visible-light photo-reduction of reduced graphene oxide by lanthanoid ion

  • Kim, Jinok;Yoo, Gwangwe;Park, Jin-Hong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.290.1-290.1
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    • 2016
  • Grapehen, a single atomic layer of graphite, has been in the spotlight and researched in vaious fields, because its fine mechanical, electrical properties, flexibility and transparence. Synthesis methods for large-area graphene such as chemical vaper deposition (CVD) and mechanical, chemical exfoliation have been reported. In particular, chemical exfoliation method receive attention due to low cost process. Chemical exfoliation method require reduction of graphene oxide in the process of exfoliation such as chemical reduction by strong reductant, thermal reduction on high temperature, and optical reduction via ultraviolet light exposure. Among these reduction methods, optical reduction is free from damage by strong reductant and high temperature. However, optical reduction is economically infeasible because the high cost of short-wavelength ultraviolet light sorce. In this paper, we make graphene-oxide and lanthanoid ion mixture aqueous solution which has highly optical absorbency in selective wevelength region. Sequentially, we synthesize reduced graphene oxide (RGO) using the solution and visible laser beam. Concretely, graphene oxide is made by modified hummer's method and mix with 1 ml each ultraviolet ray absorbent Gd3+ ion, Green laser absorbent Tb3+ ion, Red laser absorbent Eu3+ ion. After that, we revivify graphene oxide by laser exposure of 300 ~ 800 nm layser 1mW/cm2 +. We demonstrate reproducibility and repeatability of RGO through FT-IR, UV-VIS, Low temperature PL, SEM, XPS and electrical measurement.

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한국산(韓國産) 옻칠도막(漆塗膜)에 관한 주사전자현미경적(走査電子顯微鏡的) 고찰(考察) (A Scanning Electron Microscopic Study on Korean Rhus Lacquer Coats)

  • 이필우;김현중
    • Journal of the Korean Wood Science and Technology
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    • 제15권3호
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    • pp.24-33
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    • 1987
  • This study was executed to investigate scanning electron microscopic characteristics of Korean Rhus lacquer coats. With the unrefined coat, distilled water, sodium hydroxide, acetic acid, ethyl alcohol, cold-check test, and accelerated weathering were performed after refining treatment. These treated lacquer coats were discussed through observation by scanning electron microscope and the obtained results were summarized as follows: 1. Compared with unrefined coat, the refined coat of Korean Rhus lacquer showed more even surface with regular distribution of dispression. 2. Korean Rhus lacquer coat heated at $120^{\circ}C$ for 3 hours revealed no observable difference irrespective of refining and unrefining. 3. Korean Rhus lacquer coat treated by distilled water, sodium hydroxide, acetic acid. ethyl alcohol, cold-check test. and ultraviolet radiation showed significant characteristics compared with untreated coat. Especially. large deformation and checkings were observed by cold-check test and ultraviolet radiation respectively. 4. The Korean Rhus lacquer coat radiated by ultraviolet ray showed 0.11 duller and 1.41 brighter than non-radiated coat through color difference calculator.

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자외선 차단 직물에 환한 연구 (A Study on the Ultraviolet(UV)-Cut Fiber)

  • 최인려
    • 복식문화연구
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    • 제11권6호
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    • pp.967-971
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    • 2003
  • As the concerns over health increased in 1990's, research and development on the health material were also activated. The development of UV-cut textile became the hot issue, because the damage of W irradiation due to ozone depletion has become widely known. UV-cut effect is determined by the material, the color, the organization and the density of UV-cut fibers. UV-cut effect is very different according to the fibers. Polyester is known to have a better effect. Even in the same textile material, staple fiber has more effect than filament fiber. Different colors have different offsets. Although textiles have the same color, the effects can be different according to the depth of color. PET, PET/cotton blend, nylon and cotton fabrics were ultraviolet cutting finished with padding method using several absorbers. These UV-cut effect can be improved through the processing. Safety of UV-cut textile for the body must be considered future, Until now the figure of the UV-cut effects has been emphasized. There has been no experiment on the human body, although the textiles are directly on the human body. Futhermore there os no safety standard of UV-cut textiles. Therefore every effort will be made to set the standard UV-cut processing is established. The need of UV-cut products will be known to the consumers.

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Comparison of Effects of Ultraviolet and $^{60}$ Co Gamma Ray Irradiation on Nylon 6 Mono-filaments

  • Ohtsuka, Mika;Suzuki, Yoshino;Sakai, Tetsuya;Netravali, Anil N.
    • Fibers and Polymers
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    • 제5권3호
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    • pp.225-229
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    • 2004
  • The effect of UV and $^60{Co}$ gamma radiations on the physical and mechanical properties of nylon 6 mono-filaments with different draw ratios has been studied. Specimens were exposed to either up to 25 Mrad of gamma or up to 168 hrs of intense UV irradiation. The results show that nylon mono-filaments exposed to gamma rays, with much higher quantum energy than UV, undergo a larger extent of molecular chain scission. Higher irradiation dose also results in the production of insoluble, macroscopic three-dimensional cross-linked network structure. The amorphous regions with a lower density of cohesive energy (lower molecular orientation) show a higher extent of cross linking reaction whereas amorphous regions with a higher density of cohesive energy (higher orientation) show higher extent of chain scission reaction, irrespective of UV ray or gamma ray irradiation.

옥외용 고분자 절연재료의 자외선 열화특성 연구 (A Study on the Ultraviolet Aging characteristics of Outdoor Polymeric Insulating Materials)

  • 김영성;이상진;박완기;정순욱
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 D
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    • pp.1404-1406
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    • 1998
  • The outdoor polymeric insulating materials such as silicone rubber, ethylene propylene diene monomer(EPDM), ethylene vinyl acetate(EVA) and epoxy are aged by various natural environment with the long-term performance in outdoor. In this paper, the effects of UV-ray on surface of silicone rubber were investigated by using the weather-Ometer. The accelerated aging stresses were simulated by UV radiation. high temperature and humidity as well as water spray. These the aging characteristics were examined through contact angle measurements, tracking resistance test, FT-IR and SEM/EDS analysis. the experimental results showed that tracking resistance decreases with increase in the UV-ray irradiation period. But the surface of silicone rubber kept hydrophobicity. It is found that the inorganic filler such as $Al(OH)_3$ improves tracking resistance and the $TiO_2$ is very effective in preventing degradation of silicone rubber surface from UV-ray.

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$Gd_2$O_3:EU^{3+}$ 형광체 박막의 결정성에 따른 발광특성 연구 (Optical properties of epitaxial $Gd_2$O_3:EU^{3+}$luminescent thin films depending on crystallinity)

  • 장문형;최윤기;정권범;황보상우;장홍규;노명근;조만호;손기선;김창해
    • 한국진공학회지
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    • 제12권4호
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    • pp.275-280
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    • 2003
  • Si(III) 표면위에 Gd$_2O_3:Eu^{3+}$ 결정성 형광체 박막을 이온화 집단체 증착방법으로 증착하여 이온선을 주입, 결정을 파괴한 후에 열처리를 통하여 결정구조를 변화시켰다. 초기 생장시의 결정성은 고에너지 전자회절 (RHEED)을 통해 확인하고, X선 회절과 적외선 분광법을 이용하여 시료의 결정구조의 변화를 관측하였다. Near Edge X-ray Absorption Fine Structure (NEXAFS)를 통해 전자구조의 변화를 확인하였다. 이러한 변화들이 발광 특성에 미치는 영향을 Photoluminescence (PL), Cathodoluminescence (CL), 그리고 Vacuum Ultraviolet (VUV) spectrum으로 알아보았다. 본 연구는 결정구조에 의해 변화된 전자구조가 형광체 박막의 발광특성에 미치는 영향을 보고한다.

초음파분무법으로 제조한 ZnO/MgO막의 특성 (The properties of ZnO/MgO films prepared by ultrasonic spray pyrolysis)

  • 최무희;마대영
    • 센서학회지
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    • 제14권5호
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    • pp.362-367
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    • 2005
  • ZnO films were deposited on MgO substrates (ZnO/MgO) by ultrasonic spray pyrolysis. Substrate temperature varied from $250^{\circ}C$ to $350^{\circ}C$. The crystallographic properties and surface morphologies of the ZnO/MgO films were studied by X-ray diffraction and scanning electron microscopy. The properties of photoluminescence (PL) for the films were investigated by dependence of PL spectra on the substrate temperature and the annealing temperature. The ZnO/MgO films prepared at $350^{\circ}C$ showed the strongest Ultraviolet light emission peak at 18 K and 300 K among the films in this study. The annealing process increases the visible light emission, which is due to the increased oxygen vacancies.

반도체 공정용 리소그래피 기술의 최근 동향 (Recent Trends of Lithographic Technology)

  • 정태진;유종준
    • 전자통신동향분석
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    • 제13권5호통권53호
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    • pp.38-52
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    • 1998
  • Phase-shifting masks (PSM), optical proximity correction (OPC), off-axis illumination (OAI), annular illumination (AI)의 리소그래피 분해능 향상 기법과 deep ultraviolet photoresist의 개발 및 리소그래피의 최근 기술 동향을 요약 소개한다. DUV 리소그래피의 대안으로 관심을 끌고 있는 scattering with angular limitation projection electron-beam lithography (SCALPEL), extreme ultraviolet lithography (EUVL), X-ray lithography (XRL), ion projection lithography (IPL) 등의 새로운 리소그래피 기술들의 기본 원리와 최근 기술 동향도 소개하였다. 리소그래피는 반도체 공정에 있어서 가장 중요한 부분을 차지하기 때문에 리소그래피의 최근 기술 동향을 검토해 봄으로써 국내 리소그래피 장비 산업의 기술 개발을 위한 방향 설정에 도움이 될 것으로 생각한다.