• Current Optics and Photonics
• /
• v.1 no.2
• /
• pp.101-106
• /
• 2017

Optical structures of a tapered ultra-thin light guide film (LGF) were optimized by optical simulation for increasing coupling efficiency between light sources and the LGF. A serration pattern on the entrance side surface could provide a comparable coupling efficiency to that of the conventional LGF where a linear, asymmetric prism array was formed on the taper surface. Several micro-patterns were applied to the top and/or bottom surface of the LGF for achieving better luminance property, and it was found that an optimized micro-pyramid pattern exhibited the highest average luminance together with satisfactory luminance uniformity.

• Journal of the Korean Ceramic Society
• /
• v.32 no.3
• /
• pp.371-377
• /
• 1995

Silicon oxide films were grown on single-crystal silicon substrates at low temperatures (25~205$^{\circ}C$) in a low pressure electron cyclotron resonance (ECR) oxygen plasma. The growth rate of the silicon oxide film increased as the temperature increased or the pressure decreased. Also, the thickness of the silicon oxide film increased at negative bias voltage, but not changed at positive bias voltage. The growth law of the silicon oxide film was approximated to the parabolic form. Capacitance-voltage (C-V) and current density-electric field (J-E) characteristics were studied using Al/SiO2/p-Si MOS structures. For a 10.2 nm thick silicon oxide film, the leakage current density at the electric field of 1 MVcm-1 was less than 1.0$\times$10-8Acm-2 and the breakdown field was higher than 10 MVcm-1. The flat band voltage of Al/SiO2/p-Si MOS capacitor was varied in the range of -2~-3 V and the effective dielectric constant was 3.85. These results indicate that high quality oxide films with properties that are similar to those of thermal oxide film can be fastly grown at low temperature using the ECR oxygen plasma.

• ETRI Journal
• /
• v.19 no.2
• /
• pp.71-81
• /
• 1997

We report on the room-temperature-growth of highly uniform and ultrathin Ag films on Sb-terminated Si(111) surfaces, as evidenced from a scanning tunneling microscopy (STM) study in an UHV system. With predeposition of one monolayer (ML) of Sb, uniform growth of Ag islands was observed at room temperature. The Sb layer suppresses the surface diffusion of Ag atoms on Si surface and increases the Ag island density, and then the increased island density is believed to cause coalescence of Ag islands before the beginning of multilayer growth in higher coverages, resulting in the growth of atomically flat and uniform islands on the Sb surfactant layer.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2006.02a
• /
• pp.72-72
• /
• 2006

• Journal of the Korean institute of surface engineering
• /
• v.49 no.1
• /
• pp.20-25
• /
• 2016

Femtosecond laser ablation of ultrathin polymer films on quartz glass using laser pulses of 100 fs and centered at ${\lambda}=400nm$ wavelength has been investigated for nanometer precision thin film patterning. Single-shot ablation craters on films of various thicknesses have been examined by atomic force microscopy, and beam spot diameters and ablation threshold fluences have been determined by square diameter-regression technique. The ablation thresholds of polymer film are about 1.5 times smaller than that of quartz substrate, which results in patterning crater arrays without damaging the substrate. In particular, at a $1/e^2$ laser spot diameter of $0.86{\mu}m$, the smallest craters of 150-nm diameter are fabricated on 15-nm thick film. The ablation thresholds are not influenced by the film thickness, but diameters of the ablated crater are bigger on thicker films than on thinner films. The ablation efficiency is also influenced by the laser beam spot size, following a $w_{0q}{^{-0.45}}$ dependence.

• Proceedings of the KIEE Conference
• /
• 1994.11a
• /
• pp.225-227
• /
• 1994

The second-order nonlinear optical effect, especially the second harmonic generation, in Langmuir-Blodgett(LB) films have get much attention over the past few years. For second harmonic generation(SHG) of the ultrathin organic films, the multilayer structure of the film should have the noncentrosymmetric arrangements of molecules. The Langmuir-Blodgett technique can result in the production of thin films of precisely controlled dimensions and structure. In this paper, n-octadecyl 4-(4'-nitrophenylazo)-1-naphthyl ether, ONNE(azohenzene derivative), was synthesized and the optical properties of ONNE was studied. Nonccntrosymmctric Z-type LB films of ONNE were prepared and SHG intensity of the film were measured. The structural characteristics of floating monolayer(L film) and LB film of ONNE were discussed with $\pi$-A isotherm. UV-visible absorption spectroscopy and spectroscopic ellipsometry. The polarized UV-visible absorption spectroscopy and SHO intensity suggest the molecular orientation in LB film.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.02a
• /
• pp.355-355
• /
• 2010

The epitaxial growth of MgO film on Fe(001) has been investigated by scanning tunneling microscopy (STM). After confirming the clean Fe(001)-c($2{\times}2$) substrate by STM, Mg was deposited at room temperature (RT) under $O_2$ partial pressure of $10^{-7}\;Torr$. The MgO was grown as clusters, not as an epilayer even after postannealing at $400^{\circ}C$, as shown in Figure (a). On the contrary, when Mg was deposited on Fe(001)-c($2{\times}2$) at RT and post-oxidized through exposing $O_2$ at partial pressure $10^{-7}\;Torr$, the thin-layered film with some clusters was formed. Extended-annealing at $400^{\circ}C$ reduced the cluster density, and finally the single and epitaxial MgO-c($2{\times}2$) film was formed on Fe(001)-c($2{\times}2$) as shown in Figure (b). This ultrathin MgO film formed on Fe is expected to be applied to many technological applications, such as catalysis, microelectronics, and magnetic devices.

• Korea-Australia Rheology Journal
• /
• v.15 no.1
• /
• pp.1-7
• /
• 2003

A new method is introduced to build up organic/organic multilayer films composed of cationic poly(allylamine hydrochloride) (PAH) and negatively charged poly (sodium 4-styrenesulfonate) (PSS) using the spinning process. The adsorption process is governed by both the viscous force induced by fast solvent elimination and the electrostatic interaction between oppositely charged species. On the other hand, the centrifugal and air shear forces applied by the spinning process significantly enhances desorption of weakly bound polyelectrolyte chains and also induce the planarization of the adsorbed polyelectrolyte layer. The film thickness per bilayer adsorbed by the conventional dipping process and the spinning process was found to be about 4 ${\AA}$ and 24 ${\AA}$, respectively. The surface of the multilayer films prepared with the spinning process is quite homogeneous and smooth. Also, a new approach to create multilayer ultrathin films with well-defined micropatterns in a short process time is Introduced. To achieve such micropatterns with high line resolution in organic multilayer films, microfluidic channels were combined with the convective self-assembly process employing both hydrogen bonding and electrostatic intermolecular interactions. The channels were initially filled with polymer solution by capillary pressure and the residual solution was then removed by the .spinning process.

• Proceedings of the KIEE Conference
• /
• 1992.07b
• /
• pp.829-831
• /
• 1992

Ultrathin metal-oxide-semiconductor(MOS) gate dielectrics have been fabricated by conventional thermal oxidation in $N_2O$ ambient. Compared to oxides grown in $O_2$, $N_2O$ oxides exhibit significantly low flatband voltage and small shift in flatband voltage. $N_2O$ oxidation induces a slight decrease in mobile ionic charge density($N_m$), fixed charge density($N_f$) and surface state charge density($N_{ss}$). This study establishes that $N_2O$ oxides may have a great impact on future MOS ULSI technology in which ultrathin gate dielectrics are required.

• Journal of the Korean Ceramic Society
• /
• v.47 no.1
• /
• pp.61-65
• /
• 2010

Ultrathin atomic layer deposition (ALD) coatings were found to enhance the performance of lithium-ion batteries (LIBs). Previous studies have demonstrated that $LiCoO_2$ cathode powders coated with metal oxides with thicknesses of $\sim100-1000{\AA}$ grown using wet chemical techniques improved LIB performance. In this study, $LiCoO_2$ powders were coated with conformal $Al_2O_3$ ALD films with thicknesses of only $\sim3-4{\AA}$ established using 2 ALD cycles. The coated $LiCoO_2$ powders exhibited a capacity retention of 89% after 120 charge-discharge cycles in the 3.3~4.5 V (vs. $Li/Li^+$) range. In contrast, the bare $LiCoO_2$ powders displayed only a 45% capacity retention. This dramatic improvement may result from the ultrathin $Al_2O_3$ ALD film acting to minimize Co dissolution or to reduce surface electrolyte reactions.