• Title/Summary/Keyword: ultra-violet

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Pattern Dyeing of Cationized Cotton Fabrics by Ultra Violet Rays Irradiation (자외선조사에 의한 Cation화 면직물의 문양염색)

  • Kim, In Hui;Lee, In Seok;Nam, Seong U
    • Textile Coloration and Finishing
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    • v.14 no.2
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    • pp.77-77
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    • 2002
  • Cotton fabrics dipped in cationic agent(3-chloro-2-hydroxypropyl trimethyl ammonium chloride) were irradiated with deep Ultra Violet Rays(UV), in the region of UV-C using the low pressure mercury lamp. The chemical changes of cationized cotton fabric surfaces were investigated by FT-IR analysis. The dyeabilities of the irradiated portions were investigated by dyeing with acid dyes. Deep UV(UV-C) irradiation broke O-H bonds in cotton fiber and oxidized the fibers. The dyeability of the UV irradiated portion were different from that of the portion not irradiated. Various pattern were gained from one bath dig dyeing by pattern mask. The tensile strengths of cotton fabrics were decreased in the UV irradiated portion. Washing fastness of cotton dyeings were good about 3∼4 grade and light fastness were fair about 2∼3 grade.

Pattern Dyeing of Cationized Cotton Fabrics by Ultra Violet Rays Irradiation (자외선조사에 의한 Cation화 면직물의 문양염색)

  • 김인회;이인석;남성우
    • Textile Coloration and Finishing
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    • v.14 no.2
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    • pp.1-8
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    • 2002
  • Cotton fabrics dipped in cationic agent(3-chloro-2-hydroxypropyl trimethyl ammonium chloride) were irradiated with deep Ultra Violet Rays(UV), in the region of UV-C using the low pressure mercury lamp. The chemical changes of cationized cotton fabric surfaces were investigated by FT-IR analysis. The dyeabilities of the irradiated portions were investigated by dyeing with acid dyes. Deep UV(UV-C) irradiation broke O-H bonds in cotton fiber and oxidized the fibers. The dyeability of the UV irradiated portion were different from that of the portion not irradiated. Various pattern were gained from one bath dig dyeing by pattern mask. The tensile strengths of cotton fabrics were decreased in the UV irradiated portion. Washing fastness of cotton dyeings were good about 3∼4 grade and light fastness were fair about 2∼3 grade.

Fabrication of Moth-Eye Pattern on a Lens Using Nano Imprint Lithography and PVA Template (나노임프린트 리소그래피와 유연 PVA 템플릿을 이용한 렌즈 표면 moth-eye 패턴 형성에 관한 연구)

  • Bae, B.J.;Hong, S.H.;Kwak, S.U.;Lee, H.
    • Journal of the Korean institute of surface engineering
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    • v.42 no.2
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    • pp.59-62
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    • 2009
  • Antireflection pattern, moth-eye structure, was fabricated on lens using Ultra Violet nanoimprint lithography and flexible template. Ni template with conical shaped structure was used as a master template to molding. The flexible poly vinyl alcohol template was fabricated by molding. This poly vinyl alcohol template was used as an imprint template of imprint at lens. Using Ultra Violet nanoimprint lithography and poly vinyl alcohol template, polymer based moth-eye structure was formed on lens and its transmittance was increased up to 94% from 92% at 550 nm wavelength.

근 지구 우주환경이 위성에 미치는 영향

  • Lee, Chang-Ho;Han, Dong-In
    • Aerospace Engineering and Technology
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    • v.3 no.1
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    • pp.86-96
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    • 2004
  • Space environment has various hazard effects on satellite. These effects can not be experienced in earth ambient condition. In terrestrial space, plasma or atomic oxygen could erode satellite surface. Also ultra violet or particle radiation may damage surface materials or electronic parts which constitute satellite. So, in designing satellite, the natural environment of operational orbit should be investigated and appropriate mitigation should be prepared.

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EUVL Mask Defect Isolation and Repair using Focused Ion Beam (Focused Ion Beam을 이용한 EUVL Mask Defect Isolation 및 Repair)

  • 김석구;백운규;박재근
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.2
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    • pp.5-9
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    • 2004
  • Microcircuit fabrication requires precise control of impurities in tiny regions of the silicon. These regions must be interconnected to create components and VLSI circuits. The patterns to define such regions are created by lithographic processes. In order to image features smaller than 70 nm, it is necessary to employ non-optical technology (or next generation lithography: NGL). One such NGL is extreme ultra-violet lithography (EUVL). EUVL transmits the pattern on the wafer surface after reflecting ultra-violet through mask pattern. If particles exist on the blank mask, it can't transmit the accurate pattern on the wafer and decrease the reflectivity. It is important to care the blank mask. We removed the particles on the wafer using focused ion beam (FIB). During removal, FIB beam caused damage the multi layer mask and it decreased the reflectivity. The relationship between particle removal and reflectivity is examined: i) transmission electron microscope (TEM) observation after particle removal, ii) reflectivity simulation. It is found that the image mode of FIB is more effective for particle removal than spot and bar mode.

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Electrical and Optical Properties in Transparent Conducting Oxides: Effect of Ultra Violet Irradiation

  • So, Byung-Soo;Hwang, Jin-Ha
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.1 s.18
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    • pp.65-69
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    • 2007
  • A design of experiments was applied in order to investigate the effect of processing variables in UV irradiation on the electrical/optical properties in indium-zinc oxide thin films, The processing variables, equivalently input variables are listed as UV irradiation time, oxygen flow rate, and chamber pressure. The statistical significance of Ultra Violet (UV) treatment was confirmed using a paired-t test. The full factorial $2^3$ design was employed to determine significant main and interaction effects in UV irradiation process. The chamber pressure and the interaction between UV irradiation time and $O_2$ flow rate were found to be statistically significant at the significance level of 0.1. Furthermore, the optimized approach was proposed in achieving the improved conductivity after UV irradiation.

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An overview of new oxidation methods for polyacrylonitrile-based carbon fibers

  • Shin, Hye Kyoung;Park, Mira;Kim, Hak-Yong;Park, Soo-Jin
    • Carbon letters
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    • v.16 no.1
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    • pp.11-18
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    • 2015
  • The process of oxidizing polyacrylonitrile (PAN)-based carbon fibers converts them into an infusible and non-flammable state prior to carbonization. This represents one of the most important stages in determining the mechanical properties of the final carbon fibers, but the most commonly used methods, such as thermal treatment ($200^{\circ}C$ to $300^{\circ}C$), tend to waste a great deal of process time, money, and energy. There is therefore a need to develop more advanced oxidation methods for PAN precursor fibers. In this review, we assess the viability of electron beam, gamma-ray, ultra-violet, and plasma treatments with a view to advancing these areas of research and their industrial application.

Experimental Study on the Irradiation and Surface Sterilization Effect of Ultra Violet Ray in Air Conditioning System (공조시스템에서 UV Ray의 조사 및 표면살균성능에 관한 실험적 연구)

  • 홍진관
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.16 no.3
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    • pp.250-257
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    • 2004
  • Recently, the use of UVC lamps inside building air-conditioning system has been increasing in both medical and nonmedical buildings for the control of environmental microorganisms. In the present study, irradiance performance test of UVC lamp was carried out and surface sterilization effect of UV ray was investigated by using UV ray irradiation experimental chamber and pilot system. Experimental results show that the effective irradiance of UVC lamp is strongly dependent on air velocity and temperature with exception of relative huminity in air-conditioning system. An individual microbiological kill effectiveness experiment also shows that the fractional kill of two microbiological samples such as E. Coli and Legionella is roughly the same as the estimated fractional kill in the case of chamber test and pilot system test.