• Asian Journal of Atmospheric Environment
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• v.7 no.1
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• pp.8-16
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• 2013

The fog water chemistry and deposition in northern Japan were investigated by fog water and throughfall measurements in 2010. Fog water was sampled weekly by an active-string fog sampler at Lake Mashu from May to November. Throughfall measurements were conducted using rain gauges under three deciduous trees along the somma of the lake from August to October. The mean fog deposition rate (flux) was calculated using throughfall data to estimate the total fog water deposition amount for the entire sampling period. $NH_4{^+}$ and $SO{_4}^{2-}$ were the most abundant cation and anion, respectively, in the fog water samples. A mean pH of 5.08 in the fog water, which is higher than those in rural areas in Japan, was observed. The [$NH_4{^+}$]/[$SO{_4}^{2-}$] equivalent ratio in fog water was larger than 1.0 throughout the study period, indicating that $NH_3$ gas was the primary neutralizing agent for fog water acidity. The mean rate and total amount of fog water deposition were estimated as 0.15 mm $h^{-1}$ and 164 mm, respectively. The amounts of nitrogen and sulfate deposition via fog water deposition were corresponded to those reported values of the annual deposition amounts via rainfall.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.9
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• pp.796-800
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• 2000

Bi$_2$Sr$_2$Ca$_{n}$Cu$_{n+1}$ O$_{y}$(n$\geq$0; BSCCO) thin film is fabricated via two different processes using an ion beam sputtering method i.e. co-deposition and layer-by-layer deposition. A single phase of Bi2212 can be fabricated via the co-deposition process. While it cannot be obtained by the layer-by-layer process. Ultra-low growth rate in our ion beam sputtering system brings out the difference in Bi element adsorption between the two processes and results in only 30% adsorption against total incident Bi amount by layer-by-layer deposition, in contrast to enough Bi adsorption by co-deposition.on.n.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.230-234
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• 2000

Bi$_2$Sr$_2$Ca$_{n}$Cu$_{n+1}$ O$_{y}$(n$\geq$0; BSCCO)thin film is fabricated via two different processes using an ion beam sputtering method i.e. co-deposition and layer-by-layer deposition. A single phase of Bi2212 can be fabricated via the co-deposition process. While it cannot be obtained by the layer-by-layer process. Ultra-law growth rate in our ion beam sputtering system brings out the difference in Bi element adsorption between the two processes and results in only 30% adsorption against total incident Bi amount by layer-by-layer deposition, in contrast to enough Bi adsorption by co-deposition.on.n.

• Journal of Korean Society for Atmospheric Environment
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• v.22 no.E1
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• pp.35-43
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• 2006

Ambient particle size distributions of PCBs and their dry deposition fluxes were measured at a site in Seoul to quantify dry deposition fluxes of PCBs and size characteristics of PCBs in the air, and to estimate ambient concentrations of gaseous PCBs and dry deposition fluxes. The dry deposition plate was used to measure dry deposition fluxes of particulate mass and PCBs and a cascade impactor and rotary impactor were used to measure ambient particle size distributions for small ($D_p<9{\mu}m$) and large ($D_p>9{\mu}m$) particles, respectively. Six sample sets were collected from April to July 1999. The fluxes of particulate total PCBs (the sum of 43 congeners) ranged from 160 to $607ng\;m^{-2}day^{-1}$. The size distribution of total PCBs was bimodal with two peaks in small particle size ($D_p{\sim}0.6\;and\;6{\mu}m$, respectively) and, thus, mass concentration being dominant in small particles. The mean particulate PCBs concentration was $6.9{\mu}g$ PCBs/g. The concentrations of PCB homologues in the gas phase were estimated based on the particle/gas partition coefficient ($K_p$) with the measured values of particulate PCBs in this study and they were comparable to those observed in other previous studies. Dry deposition fluxes were estimated by calculating dry deposition velocities.

• Journal of the Korean institute of surface engineering
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• v.26 no.1
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• pp.3-9
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• 1993

Chemical vapor deposited tungsten films were formed in a cold wall reactor at pressures higher (10~120torr) than those conventionally employed (<1torr). SiH4, in addition to H2, was used as the reduction gas. The effects of pressure and reaction temperature on the deposition rate and morphology of the films were ex-amined under the above conditions. No encroachment or silicon consumption was observed in the tungsten de-posited specimens. A high deposition rate of tungsten and a good step coverage of the deposited films were ob-tained at 40~80 torr and at a temperature range of $360~380^{\circ}C$. The surface roughness and the resistivity of the deposited film increased with pressure. The deposition rate of tungsten increased with the total pressure in the reaction chamber when the pressure was below 40 torr, whereas it decreased when the total pressure ex-ceedeed 40 torr. The deposition rate also showed a maximum value at $360^{\circ}C$ regardless of the gas pressure in the chamber. The results suggest that the deposition mechanism varies with pressure and temperature, the surface reac-tion determines the overall reaction rate and (2) at higher pressures(>40 torr) or temperatures(>36$0^{\circ}C$), the rate is controlled by the dtransportation rate of reactive gas molecules. It was shown from XRD analysis that WSi2 and metastable $\beta$-W were also formed in addition to W by reactions between WF6 and SiH4.

• Journal of Environmental Health Sciences
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• v.31 no.5 s.86
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• pp.387-397
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• 2005

In oder to understand the deposition possibility of water-soluble inorganic ions in the atmospheric fine particulates for the human respiratory tract, the mass size distribution of ion species was measured using an Anderson sampler in the Iksan during fall, 2004. Samples were analyzed for major water-soluble ions using Dionex DX-100 ion chromatograph. The size distribution of water-soluble inorganic ions in the atmospheric particulates appeared bimodal distribution, which were divided around $1-2{\mu}m$ into two groups. Mass site distribution of total ion in the coarse mode was found to be almost similar level during the sampling period, but fluctuations of mass size distribution in the fine mode were observed. Considering the mass size distribution of total ion concentrations for the respiratory deposition region, it was found that about 77.1% of total tons could be deposited in the alveolar region, and which dominated the daily variation of total ion concentrations. The concentration of total ions, which could be deposited in both the head region and the tracheobronchial region, was $3.95{\mu}g/m^3$, whereas that in the alveolar rerion was $13.28{\mu}g/m^3$. Dominant ions which could be deposited in the alveolar region were ${NO_3}{^-},\;{SO_4}^{2-}\;and\;{NH_4{^+}$, accounting for about 40%, 27% and 22% of the total ions, respectively. Although $K^+$ was approximately 3% of total ions, it was shown that most of this could be deposited in the alveolar region due to its high fraction of small size distribution originated from anthropogenic source of biomass burning. The presence of these ions in the fine mode may be of public health significance as they are very biologically harmful to health and have a high probability of being deposited in human lung tissue.

• Journal of Environmental Science International
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• v.12 no.4
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• pp.393-397
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• 2003

It has been researched the relationship between deposition velocity and factors which could affect the deposition phenomena and deposition velocity also has been estimated fer several land-use types. The typical deposition velocities are complex functions of surface types, atmospheric stabilities, friction velocities, air pollutants and so on. The canopy resistance is major contribution to the model's total resistance for O₃. Canopy wetness is also an important factor to calculate deposition velocity. We considered the canopy wetness as canopy water content(CWC) in our Model. But, it is not easy to observe CWC over each land-use types. In this study, we use CWC observed by EMEFS(CANADA Environment Service, 1988) to examine the influence of CWC in estimation of 03 dry deposition velocity(V/sub d/) in summertime. The value of O₃ V/sub d/ range 0.2 ∼ 0.7 cm s/sup -1/ on dry surface and 0.01 ∼ 0.35 cm s/sup -1/ on wet surface in daytime.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.10a
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• pp.40-44
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• 2000

$Bi_2Sr_2Ca_nCu_{n+1}O_y$($n{\geq}0$; BSCCO)thin film is fabricated via two different processes using an ion beam sputtering method i.e. co-deposition and layer-by-layer deposition. A single phase of Bi2212 can be fabricated via the co-deposition process. While it cannot be obtained by the layer-by-layer process. Ultra-low growth rate in our ion beam sputtering system brings out the difference in Bi element adsorption between the two processes and results in only 30% adsorption against total incident Bi amount by layer-by-layer deposition, in contrast to enough Bi adsorption by co-deposition.

• Journal of Environmental Health Sciences
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• v.39 no.1
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• pp.56-70
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• 2013

Objectives: This paper aims to investigate the seasonal deposition characteristics of water-soluble ion species by comparing the deposition amount of two samples taken according to different sampling methods of deposition for ambient aerosol such as gases and particulate matters. Methods: Deposition samples were collected using two deposition gauges in the downtown area of Iksan City over approximately two weeks of each season in 2004. The type of deposition gauges consisted of two different sampling methods known as dry gauge and a wet gauge. The dry gauge was empty and used a dry PE bottle with an inlet diameter of 9.6 cm. Before the beginning of each deposition sampling, a volume of 30-50 ml distilled ionized water was added to the wet gauge to wet the bottom during the sampling period. Deposition samples were measured twice per day and analyzed for inorganic water-soluble ion species using ion chromatography. Results: The daily deposition amounts of all measured ions in the dry gauge and the wet gauge showed a significant increase when precipitation occurred, having no difference of deposition amount between in the wet gauge and in the dry gauge. By excluding two samples from rainy days during the sampling period, the mean daily deposition of all ions in dry gauge and wet gauge were $6.58mg/m^2/day$ and $18.16mg/m^2/day$, respectively. The mean deposition amounts of each ion species were higher in the wet gauge than in the dry gauge because of the surface difference of the sampling gauge, especially for $NH_4{^+}$ and ${SO_4}^{2-}$. The mean deposition amounts of $NH_4{^+}$ and ${SO_4}^{2-}$ in the wet gauge were found to be about 15.4 times and 5.2 times higher than that in dry gauge, with a pronounced difference between spring and summer, while the remaining ion species were 1.1-2.0 times higher in the wet gauge than in the dry gauge. Dominant species in the dry gauge were $Ca^{2+}$ and $NO_3{^-}$, accounting for 36.4% and 18.1% of the total ion deposition, whereas those in the wet gauge were $NH_4{^+}$ and ${SO_4}^{2-}$, accounting for 32.5% and 25.0% of the total ion deposition, respectively. Conclusion: The seasonal differences in deposition amounts of water-soluble ion species in ambient aerosol depending on the two types of different sampling methods were identified. This suggests that the removal of ambient aerosol is strongly influenced by the weather conditions of each season as well as the condition of earth's surface, such as dry ground and water.

• Proceedings of the Korean Ceranic Society Conference
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• 1986.12a
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• pp.211-225
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• 1986

Silicon carbide coating has been studied using a graphite substrate, a mixture of tetramethylsilane and hydrogen or argon at deposition temperature (T) of 950 to $1200^{\circ}C$ total pressure of 20 to 50 torr and carrier gas flow rate of 0 to 901/h. Deposition kinetic study has shown that a transition, from a surface reaction limited process to a diffusion limited one, takes place near $1100^{\circ}C$. Deposition rate depends directly upon the experimental parameters. The influence of the main process parameters is also discussed to relate the physiochemical properties of the coating to the deposition conditions.