• 제목/요약/키워드: top-emitting organic light-emitting diode

검색결과 44건 처리시간 0.023초

표면처리에 의한 유기발광소자(OLED)용 Ag 전극의 Nano-size 효과 연구 (Nano-size Study of Surface-modified Ag Anode for OLEDs)

  • 김주영;김수인;이규영;김형근;전재혁;정윤종;김무찬;이종림;이창우
    • 한국진공학회지
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    • 제21권1호
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    • pp.12-16
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    • 2012
  • Top-Emitting OLED (Organic Light-Emitting Diode) 디스플레이에서는 반사율이 가장 높은 Ag (silver) 박막이 쓰이고 있지만, 소자에서 요구되는 일함수(work function)가 상대적으로 낮기 때문에 전극과 유기물간에 에너지 장벽이 발생하여 발광효율을 낮추는 요인이 되고 있다. 본 논문에서는 Ag 전극의 일함수를 높이기 위한 연구를 진행하였으며, 박막 형태의 Ag 전극에 대하여 nanotribology 접근법으로 연구를 실행하였다. Ag는 rf magnetron sputter를 이용해 glass 위에 증착한 후 furnace에서 $300^{\circ}C$, 30분간 대기 중에서 열처리하였고, 또 다른 시료는 표면에 산소 상압플라즈마로 처리 시간(30, 60, 90, 120s)을 각기 다르게 하여 시료를 제조하였다. Ag 전극을 nanoindentation을 통해 국부 영역에 대한 물리적 특성의 변화를 측정하였고, Kelvin probe force microscopy을 이용해 시료 표면의 포텐셜을 측정했다. 그 결과 열처리한 시료의 포텐셜값은 가장 크게 증가하였지만 균일도가 낮아졌다. 120s 플라즈마 처리한 시료는 불완전한 산화막의 생성으로 인해 탄성계수 및 경도값과 박막의 Weibull modulus를 극히 낮게 만들었지만, 60s, 90s 플라즈마 처리는 시료의 균일도를 높이고 또한 포텐셜을 증가시켜 T-OLED 성능 개선에 좋은 영향을 미치게 될 것이다.

The triple layer anode for flexible top emission organic lightemitting devices

  • Chung, Sung-Mook;Hwang, Chi-Sun;Lee, Jeong-Ik;KoPark, Sang-Hee;Yang, Yong-Suk;Do, Lee-Mi;Chu, Hye-Yong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.698-701
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    • 2007
  • A top emission organic light emitting diode comprising of a triple anode on polycarbonate $film/TNATA/NPB/Alq_3:C545T/cathodes$ has been fabricated. The triple layer structure of Cr/Al/Cr allowed for fabrication of a crack-free anode and provided better higher work function than ITO anode.The anode showed compatibility with flexible plastic substrate and no crack was formed during bending test while ITO anode showed crack.

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Development of a 14.1 inch Full Color AMOLED Display with Top Emission Structure

  • Jung, J.H.;Goh, J.C.;Choi, B.R.;Chai, C.C.;Kim, H.;Lee, S.P.;Sung, U.C.;Ko, C.S.;Kim, N.D.;Chung, K.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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    • pp.793-796
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    • 2005
  • A structure and a design of device were developed to fabricate large-scale active matrix organic light-emitting diode (AMOLED) display with good color purity and high aperture ratio. With these technologies, we developed a full color 14.1 inch WXGA AMOLED display. For the integration of OLED on an active matrix a-Si TFT backplane, an efficient top emission OLED is essential since the TFT circuitry covers a large position of the pixel aperture. These technologies will enable up the OLED applications to larger size displays such as desktop monitors and TVs.

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OLED 증착을 위한 선형증발원 히터 위치선정 (Selection of Heater Location in Linear Source for OLED Vapor Deposition)

  • 주영철;한충환;엄태준;이상욱;김국원;권계시
    • 제어로봇시스템학회논문지
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    • 제14권6호
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    • pp.515-518
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    • 2008
  • Organic light emitting diode(OLED) is one of the most promising type of future flat panel display. A linear source is used to deposite organic vapor to a large size OLED substrate. An electric heater which is attached on the side of linear source heats the organic powder for the sublimation. The nozzle of heater, which is attached at the top of the linear source has an optimal temperature. An numerical analysis has been performed to find optimal heater position for the optimal nozzle temperature. A commercial CFD program, FLUENT, is used on the analysis. Two-dimensional and three-dimensional analysis have been performed. The analysis showed that the heater should be attached at the outer side of crucible wall rather than inner side of housing, which was original design. Eighteen milimeter from the top of the linear source was suggested as the optimal position of heater. Improving thermal performance of linear source not only helps the uniformity of organic vapor deposition on the substrate but also increase productibity of vapor deposition process.

유기전자소자 적용을 위한 저온 공정용 배리어 박막 연구 (Low-Temperature Processed Thin Film Barrier Films for Applications in Organic Electronics)

  • 김준모;안명찬;장영찬;배형우;이원호;이동구
    • 센서학회지
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    • 제28권6호
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    • pp.402-406
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    • 2019
  • Recently, semiconducting organic materials have been spotlighted as next-generation electronic materials based on their tunable electrical and optical properties, low-cost process, and flexibility. However, typical organic semiconductor materials are vulnerable to moisture and oxygen. Therefore, an encapsulation layer is essential for application of electronic devices. In this study, SiNx thin films deposited at process temperatures below 150 ℃ by plasma-enhanced chemical vapor deposition (PECVD) were characterized for application as an encapsulation layer on organic devices. A single structured SiNx thin film was optimized as an organic light-emitting diode (OLED) encapsulation layer at process temperature of 80 ℃. The optimized SiNx film exhibited excellent water vapor transmission rate (WVTR) of less than 5 × 10-5 g/㎡·day and transmittance of over 87.3% on the visible region with thickness of 1 ㎛. Application of the SiNx thin film on the top-emitting OLED showed that the PECVD process did not degrade the electrical properties of the device, and the OLED with SiNx exhibited improved operating lifetime

AZO를 이용한 OLED용 저저항 픽셀전극의 제작 (Fabrication of low resistance pixel electrode employing AZO for OLED)

  • 김종연;한진우;김종환;강희진;한정민;강동훈;오용철;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.318-319
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    • 2006
  • 기존에 사용되고 있는 ITO(Indium-Tin-Oxide)의 저항보다 낮은 저항을 가지는 AZO(ZnO-Ag-ZnO) 전극을 Top emission 방식의 OLED(organic light emitting diode)에 적용하여 발광 소자를 제작하였다. AZO박막은 기존의 ITO박막이 수십 ${\Omega}$을 나타내던 것과 비교하여 $8{\Omega}$으로 매우 낮은 저항을 나타내었다. 투과율은 84%로 기존의 ITO박막과 유사한 성능을 나타내었다.

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Numerical Modeling for GaN Deposition by MOCVD: Effects of the Gas Inlet

  • Yang, Wonkyun;Joo, Junghoon
    • Applied Science and Convergence Technology
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    • 제23권3호
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    • pp.139-144
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    • 2014
  • GaN deposition equipment and processes for the fabrication of white LEDs (Light Emitting Diode) using MOCVD (Metal Organic Chemical Vapor Deposition) were numerically modeled to analyze the effects of a reactive gas introduction strategy. The source gases, TMGa and $NH_3$, were injected from a shower head at the top of the chamber; the carrier gases, $H_2$ or $N_2$, were introduced using two types of injection structures: vertical and horizontal. Wafers sat on the holder at a radial distance between 100 mm and 150 mm. The non-uniformity of the deposition rates for vertical and horizontal injection were 4.3% and 3.1%, respectively. In the case of using $H_2$ as a carrier gas instead of $N_2$, the uniform deposition zone was increased by 20%.

UV 처리에 의한 T-OLED용 산화전극에 적합한 Ag 박막연구: Nano-Mechanics 특성 분석을 중심으로 (The Study of Ag Thin Film of Suitable Anode for T-OLED: Focused on Nanotribology Methode)

  • 이규영;김수인;김주영;권구은;강용욱;손지원;전진웅;김민철;이창우
    • 한국진공학회지
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    • 제21권6호
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    • pp.328-332
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    • 2012
  • Ag (silver)의 일함수는 T-OLED (Top Emission Organic Light Emitting Diode)의 전극소자로 사용하기에는 다소 낮다는 단점이 있다(~4.3 eV). 이러한 단점을 해결하기 위한 대안으로 Ag 박막의 표면을 플라즈마, UV, 열처리를 통하여 일함수를 높이는 연구가 진행되어 왔다(~5.0 eV). 하지만 현재의 대부분 연구는 후 처리된 박막의 일함수에 초점을 맞춰 연구가 진행되어, 박막의 mechanical property에 대한 연구는 매우 부족하며 이는 T-OLED의 효율과 수명 등의 연구에 매우 중요하다. 본 논문에서는 Ag와 $AgO_x$ 박막의 mechanical property에 초점을 맞춰 분석을 실시하였다. Ag는 유리기판 위에 rf-magnetron sputter를 이용하여 100 W의 power에서 150 nm 두께로 증착되었다. 증착된 박막은 UV 램프를 이용하여 다양한 시간동안 UV 처리되었다(0~9분). 본 논문에서는 처리된 박막의 면저항을 측정하고 nano indenter, Scanning Probe Microscopy의 Atomic Force Microscopy mode를 이용하여 mechanical property를 분석하였다. 실험 결과 UV 처리 시간이 3분을 넘어가는 시편과 3분 이내의 시편은 면저항값 및 경도 값에 큰 차이가 있었다. 이러한 결과는 Ag 박막의 후처리에 따른 Ag 물질의 산화 및 결합상태에 따라 박막 내에 존재하는 stress의 영향으로 예상되어진다.

방사광 가속기의 광전자 분광법을 이용한 전면 발광 유기발광 다이오드에서의 열중착 산화구리와 유기물 사이의 계면 dipole 에너지 및 정공 주입 효율에 대한 연구

  • 김성준;홍기현;김기수;이일환;이종람
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 춘계학술회의 초록집
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    • pp.8-10
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    • 2010
  • We report the enhancement of hole injection using thermally evaporated $CuO_x$ layer between Ag anode and 4,4'-Bis[N-(1-naphthyl)-N-phenylamino]biphenyl ($\alpha$-NPD) in top-emitting organic light-emitting diode (TEOLED). The operation voltage at the current density of $1mA/cm^2$ of TEOLEDs decreased from 6.2 V to 5.0 V as the $CuO_x$ layer inserted between Ag and $\alpha$-NPD. $\alpha$-NPD was deposited in situ on Ag/$CuO_x$ and Ag anodes, and their interface dipole energies were quantitatively determined using synchrotron radiation photoemission spectroscopy. The dipole energy of Ag/$CuO_x$ was lower by 0.05 eV even though Ag/$CuO_x$ had a higher work function. The work function of Ag/$CuO_x$ is higher by 0.53 eV than that of Ag, resulting in a decrease of the turn-on voltage via reduction of hole injection barrier.

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A Protective Layer on the Active Layer of Al-Zn-Sn-O Thin-Film Transistors for Transparent AMOLEDs

  • Cho, Doo-Hee;KoPark, Sang-Hee;Yang, Shin-Hyuk;Byun, Chun-Won;Cho, Kyoung-Ik;Ryu, Min-Ki;Chung, Sung-Mook;Cheong, Woo-Seok;Yoon, Sung-Min;Hwang, Chi-Sun
    • Journal of Information Display
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    • 제10권4호
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    • pp.137-142
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    • 2009
  • Transparent top-gate Al-Zn-Sn-O (AZTO) thin-film transistors (TFTs) with an $Al_2O_3$ protective layer (PL) on an active layer were studied, and a transparent 2.5-inch QCIF+AMOLED (active-matrix organic light-emitting diode) display panel was fabricated using an AZTO TFT backplane. The AZTO active layers were deposited via RF magnetron sputtering at room temperature, and the PL was deposited via two different atomic-layer deposition (ALD) processes. The mobility and subthreshold slope were superior in the TFTs annealed in vacuum and with oxygen plasma PLs compared to the TFTs annealed in $O_2$ and with water vapor PLs, but the bias stability of the TFTs annealed in $O_2$ and with water vapor PLs was excellent.