• Microbiology and Biotechnology Letters
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• v.51 no.3
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• pp.280-288
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• 2023

In strawberry farming, most parts of strawberry stems but the fruit have been dumped. Therefore, this study attempted to investigate the antioxidant and anti-inflammatory effects of strawberry stems which are thrown away after farming. For this, strawberry stem extracts were obtained, using hot water and 70% ethanol. First, total polyphenol contents of the hot water and ethanol extract were checked (265.4 ± 0.12 mg TAE/100 g, 503.88 ± 0.2 mg TAE/100 g). For analysis of antioxidant activities, electron donating ability (EDA) and 2,2'-azinobis (3-ethylbenzothiazoline-6-sulfonic acid) (ABTS) radical scavenging activity were measured. Both extracts increased in a dose-dependent fashion, and similar effects with vitamin C (control group) were confirmed. In terms of cell viability of the hot water and ethanol extracts of strawberry stems, 'RAW 264.7' was 99% or higher at 500 ㎍/ml. In addition, cell experiments were conducted at 50, 100 and 500 ㎍/ml where cell viability is above 99%. In terms of inhibition of the inflammatory mediator 'nitric oxide (NO)', the hot water and ethanol extracts of strawberry stems were 37.9% and 38.8% respectively, confirming the inhibition of NO production. To check anti-inflammatory activities, protein and mRNA expressions of 'iNOS' and 'COX-2' were measured, using RAW 264.7. Compared to the LPS group, the protein expression of the inflammatory mediators was inhibited in the hot water and ethanol extract-treated groups. The above results confirmed that the hot water and ethanol extracts of strawberry stems are valuable as natural substances with antioxidant and anti-inflammatory activities.

• 대한공업교육학회지
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• v.39 no.2
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• pp.1-18
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• 2014

This study took existing invention intellectual property related textbooks being utilized in secondary vocational education, analyzed the formation status of 'key learning elements' reflection ratio and drew optimum key learning elements formation ratio by invention intellectual property education content required in secondary vocational education in the future. For this, the study task was set up as 'what kind and how much of invention intellectual property key learning elements are in the invention intellectual property textbook education content now and what is the desirable ratio of each key learning elements in the future'. To resolve this task, 3 specialists analyzed the invention intellectual property education content reflection status and optimum reflection ratio by invention intellectual property education content required in the future is suggested by Delphi survey. The results of this study are as following. First, the result of analysis on invention intellectual property key learning elements included in the invention patent recognition books being utilized in secondary vocational education was that the books included all key learning elements; however, some textbooks have the trend of concentrating in D area (problem-solving activities). Second, the result of analysis on the reflection ratio by invention intellectual property education content area in the invention patent recognition books being utilized in secondary vocational education was that there was the trend in most textbooks that they concentrate in intellectual property creation area; while some textbooks deal with intellectual property protection area and intellectual property utilization area. Regarding by achievement type, knowledge area was main in all textbooks. Meanwhile, function area is dealt in invention patent basic, invention and problem-solving and design textbooks. Attitude area is not dealt or is dealt insufficiently in most textbooks. Third, the optimum reflection ratio of invention intellectual property education key learning elements required in secondary vocational education in the future as obtained by specialists' delphi survey was that it is necessary to decrease D (problem-solving activities) 17.7% area, E(invention fusion knowledge) 2.9% area, K(patent application) 6.9% and L(patent information investigation) area 9.6%. Regarding the optimum reflection ratio of invention intellectual property education content, it is suggested that the invention literacy area 3.1%, intellectual property creation area 4.5% and intellectual property protection area 10.6% would be decreased; while intellectual property utilization area 17.7% would be increased. Regarding optimum reflection ratio of achievement type, it is suggested that knowledge area 52% would be decreased; while function area 32.3% and attitude area 19.6% would be increased.

• Microbiology and Biotechnology Letters
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• v.40 no.3
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• pp.220-225
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• 2012

In order to investigate the ethanol fermentation properties of alcohol yeasts a laboratorial strain (CEN.PK2-1D) and two industrial alcohol yeasts (JHS100 and JHS200) of Saccharomyces cerevisiae were cultured in a pure YP medium with 300 g/L glucose and cassava hydrolysate. Spot assay and cell viability tests showed that both the JHS100 and JHS200 strains exhibited higher ethanol tolerance than the CEN.PK2-1D strain. The JHS100 strain demonstrated the highest cell growth, glucose consumption and ethanol production. In particular, an anaerobic batch fermentation of the JHS100 strain using cassava hydrolysate with 250 g/L glucose resulted in a 106.1 g/L ethanol concentration, 0.42 g/g ethanol yield and 3.15 g/L-hr ethanol productivity, which were 53%, 13%, 53% higher than the corresponding values for the CEN.PK2-1D strain. By changing the pure YP medium to cassava hydrolysate, 19% and 17% decreases in ethanol yield and productivity for the CEN.PK2-1D strain were observed, whereas the cultures of the JHS100 and JHS200 stains showed similar ethanol productivities and only an 8% decrease in ethanol yield. Furthermore, the JHS100 and JHS200 stains produced lower levels of glycerol and acetate byproducts than the CEN.PK2-1D strain. Consequently, the outstanding ethanol fermentation performance of the industrial strains might be owing to rapid cell growth, high ethanol tolerance, low nitrogen requirements and the low formation of by-products.

• Childhood Kidney Diseases
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• v.14 no.2
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• pp.143-153
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• 2010

Purpose: Recently, massive proteinuria has been observed in some transplant patients after switching cyclosporine A (CsA) to sirolimus. To evaluate the pathogenesis of sirolimus-associated proteinuria, we investigated the early changes in slit diaphragm molecules by various administrative conditions of sirolimus and CsA. Methods: In vitro-Mouse podocytes were incubated with buffer (C), sirolimus ($10\;{\mu}g/mL$) after CsA ($10\;{\mu}g/mL$) (C-S), sirolimus only (S) and CsA and sirolimus simultaneously (C+S) for 12, 24, and 48 hours. In vivo- twenty four SPF female Wistar rats were divided into 4 groups buffer (C), sirolimus after 2 weeks of CsA (C-S), sirolimus only (S) and CsA and sirolimus simultaneously (C+S). All groups were treated by intraperitoneal injection every other day for 4 weeks (CsA: 25 mg/kg, sirolimus: 0.5 mg/kg). The changes in mRNA of slit diaphragm molecules were examined by RT-PCR. Results: The mRNA of nephrin was significantly decreased in group C-S and C+S in vitro. In vivo, the mRNA of nephrin in all groups using sirolimus and the mRNA of podocin in group C-S and C+S were decreased. Microscopically, group C-S and C+S showed small vacuolization and calcification in proximal tubular epithelial cells. Immunohistochemistry using nephrin and podocin antibodies did not show remarkable decrease of staining along the glomerular capillaries. Electron-microscopically, focal fusion of foot processes was seen in group C-S and C+S. Conclusion: This study suggests the decrease of slit diaphragm molecules (nephrin and podocin) in podocyte may be one of the causes of sirolimus associated proteinuria, and podocyte injury by sirolimus may need a primary hit by CsA to develop the proteinuria.

• Microbiology and Biotechnology Letters
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• v.50 no.3
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• pp.337-346
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• 2022

The purpose of this study was to investigate the antioxidant and anti-inflammatory activities of hot water (AMPW) and 70% ethanol (AMPE) extracts of apple mango (Mangifera indica L.) peel. The antioxidant activities were measured using a total polyphenol, electron-donating, 2,2'-azinobis [3-ethylbenzothiazoline6-sulfonic acid] (ABTS) radical scavenging assay. The total polyphenol content of AMPW and AMPE was 66.08 ± 0.62 mg TAE/100 g and 100.13 ± 0.23 mg TAE/100 g, respectively. As a result of measuring the electrondonating ability, at a concentration of 1,000 ㎍/ml, AMPW and AMPE showed an effectiveness of 86% and 94%, respectively. The ABTS assay showed 80% and 98% respective radical scavenging activity for AMPW and AMPE, at a concentration of 1,000 ㎍/ml. The cell viability on macrophage cells was performed using a 3-[4,5-dimethyl-thiazol-2-yl]-2,5-diphenyl-tetrazoliumbromide (MTT) assay, and the results showed more than 90% cell viability at a 100 ㎍/ml concentration. Anti-inflammatory activity was verified by confirming nitric oxide (NO) production inhibitory activity, inducible nitric oxide synthase (iNOS), and cyclooxygenase-2 (COX-2) protein and mRNA expression inhibitory activity from lipopolysaccharide (LPS)-treated RAW 264.7 cells. The NO production inhibitory effects were measured using the Griess assay, which confirmed 45% and 40% inhibition after treatment with AMPW and AMPE, respectively. Moreover, the protein and mRNA expression of inflammatory-related factors iNOS and COX-2, decreased in a concentrationdependent manner. In conclusion, this study showed antioxidant and anti-inflammatory effects of Mangifera indica L. peel and revealed its promising potential for application as an antioxidant and anti-inflammatory agent.

• Korean Journal of Materials Research
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• v.15 no.3
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• pp.161-165
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• 2005

We investigated selective dry etching of GaAs over AlGaAs and InGaP in high density planar inductively coupled $BCl_3/SF_6$ plasmas. The process parameters were ICP source power (0-500 W), RE chuck power (0-30W) and gas composition $(60-100\%\;BCl_3\;in\;BCl_3/SF_6)$. The process results were characterized in terms of etch rate, selectivities of GaAs over AlGaAs and InGaP, surface morphology, surface roughness and residues after etching. $BCl_3/SF_6$ selective etching of GaAs showed quite good results in this study. Selectivities of GaAs $(GaAs:AlGaAs\~36:1,\;GaAs:InGaP\~45:1)$ were superior at $18BCl_3/2SF_6$, 20 W RF chuck power, 300 W ICP source power and 7.5 mTorr. Addition of $(5-15\%)SF_6\;to\;BCl_3$ produced relatively high selectivities of GaAs over AlGaAs and InGaP during etching due to decrease of etch rates of AlGaAs and InGaP (boiling points of etch products: $AlF_3\~1300^{\circ}C,\;InF_3>1200^{\circ}C$ at atmosphere) at the condition. SEM and AFM data showed slightly sloped sidewall and somewhat rough surface$(RMS\~9nm)$. XPS study on the surface of processed GaAs proved a very clean surface after dry etching. It shows that planar inductively coupled $BCl_3/SF_6$ plasmas could be a good candidate for selective dry etching of GaAs over AlGaAs and InGaP.