• Title/Summary/Keyword: tetraethylorthosilicate(TEOS)

Search Result 50, Processing Time 0.028 seconds

Preparation of Porous Silica-Pillared Montmorillonite: Simultaneous Intercalation of Amine-Tetraethylorthosilicate into H-Montmorillonite and Intra-Gallery Amine-Catalyzed Hydrolysis of Tetraethylorthosilicate

  • Gwon, O Yun;Park, Gyeong Won;Jeong, Sun Yeong
    • Bulletin of the Korean Chemical Society
    • /
    • v.22 no.7
    • /
    • pp.678-684
    • /
    • 2001
  • Porous silica-pillared montmorillonites were prepared by simultaneous intercalation of dodecylamine-TEOS [tetraethylorthosilicate, Si(OC2H5)4] into the H-montmorillonite and intragallery amine-catalyzed hydrolysis of TEOS. Mixtures of the H-montmorillonite, dodecylamine and TEOS at molar ratios of 1 : 2 : 15-30 and 1 : 2-6 : 20 resulted to swollen and viscous gel once at room temperature, allowing intercalation compounds which dodecylamine and TEOS were simultaneously intercalated into interlayer of H-montmorillonite. The hydrolysis of the gallery TEOS was conducted in water solution for 40 min at room temperature, affording siloxane-pillared H-montmorillonite. Calcination of samples at 500 $^{\circ}C$ in air resulted in silica-pillared montmorillonite with large specific surface areas between 403 and 577 m2 /g, depending on the reaction stoichiometry. The reaction at H-montmorillonite : dodecylamine : TEOS reaction stoichiometries of 1 : 2 : 15 and 1 : 4 : 20 resulted in high specific surface areas and mesopores with a narrow pore size distribution. Result indicates that the intragallery-amine catalyze the hydrolysis of gallery-TEOS and simultaneously have a role of gallery-templated micellar assemblies.

Pervaporation Separation of Water-Ethanol Mixture Using Crosslinked PVA/PSSA_MA/TEOS Hybrid Membranes (PVA/PSSA_MA/TEOS 막을 이용한 물/에탄올 계의 투과증발 분리)

  • Rhim, Ji-Won;Lee, Byung-Seong;Kim, Dae-Hoon;Yoon, Seok-Won;Im, Hyeon-Soo;Moon, Go-Young;Nam, Sang-Yong
    • Membrane Journal
    • /
    • v.18 no.1
    • /
    • pp.44-52
    • /
    • 2008
  • Pervaporation separation for water-ethanol mixtures has been carried out using crosslinked poly(vinyl alcohol) (PVA) membranes with poly(styrene sulfonic acid-co-maleic acid) (PSSA_MA) and at which tetraethylorthosilicate (TEOS) was introduced. The concentration of PSSA_MA was fixed 7 wt% over PVA and the TEOS contents, 3, 5, and 7 wt%, were varied against PVA. The composition of the feed mixtures were 10, 20, 30 and 50 wt% of water in it. PVA/PSSA_MA/5 wt% TEOS membrane showed the separation factor, 1730 and the permeability, $16.3g/m^2{\cdot}hr$ for water : ethanol = 10 : 90 at $50^{\circ}C$.

Preparation of Waterborne Polyurethane/Silica Nanocomposites Using Tetraethylorthosilicate (Tetraethylorthosilicate를 사용한 수분산 폴리우레탄/실리카 Nanocomposite의 제조)

  • Shin, Yong Tak;Hong, Min Gi;Choi, Jin Joo;Lee, Won Ki;Lee, Gyoung Bae;Yoo, Byung Won;Lee, Myung Goo;Song, Ki Chang
    • Korean Chemical Engineering Research
    • /
    • v.48 no.4
    • /
    • pp.428-433
    • /
    • 2010
  • Waterborne polyurethane(WPU) was synthesized from isophorone diisocyanate(IPDI), poly(tetramethylene glycol)(PTMG), dimethylol propionic acid(DMPA), triethylamine(TEA), ethylenediamine(EDA) and 3-aminopropyl triethoxysilane(APS) as a coupling agent. Subsequently, WPU/silica nanocomposites with different silica contents(0 to 8 wt%) were prepared by performing sol-gel reactions with tetraethylorthosilicate in the WPU matrix. The average particle size of the nanocomposite solutions increased with increasing TEOS content. Also, the prepared nanocomposites showed better thermal stability than pure WPU.

Influence of Oxidation Inhibitor on Carbon-Carbon Composites : 8. Studies on Thermal Decomposition Mechanism and Thermal Stability of Composites Impregnated with TEOS (산화억제제를 첨가한 탄소/탄소 복합재료의 물성에 관한 연구 : 8. TEOS를 함유한 복합재료의 열분해 메카니즘 및 열안정성 연구)

  • 박수진;서민강;이재락
    • Polymer(Korea)
    • /
    • v.25 no.6
    • /
    • pp.866-875
    • /
    • 2001
  • In this work, thermal decomposition mechanism based on kinetic parameters and thermal stability of carbon fiber-reinforced carbon matrix composites (C/C composites), have been studied under high temperature oxidative conditions with addition of tetra-ethylorthosilicate (TEOS) as an oxidation inhibitor. Thermogravimetric analysis (TGA) was executed to evaluate the thermal decomposition mechanism and thermal stability of C/C composites in the temperature range of 30 ~ $850^{\circ}C$. As a result, the kinetic parameters of the composites impregnated with TEOS, i.e., activation energy for thermal decomposition ($E_d$), order of reaction (n) , and pre-exponential factor (A) were evaluated as 136 kJ/mol, 0, and 2.3$\times$$10^9s^{-1}$, respectively. Especially, the IPDT and $E_d$ of C/C composites impregnated with TEOS were improved largely compared with the composites impregnated without TEOS, due to the formation of $SiO_2$ on composite surfaces, resulting in interrupting the oxygen attack to carbon active site in the composites.

  • PDF

Preparation of Ultrafine Silica Particle by Pyrolysis in the Gas Phase (기상열분해법에 의한 초미립 실리카분말 제조)

  • Jang, Hee Dong;Yoon, Ho Sung
    • Applied Chemistry for Engineering
    • /
    • v.8 no.6
    • /
    • pp.901-906
    • /
    • 1997
  • Ultrafine silicon dioxide($SiO_2$) powder was prepared from tetraethylorthosilicate(TEOS) by the gas-phase reaction. The effects of reaction temperature, flow rate of gas, TEOS concentration, and preheating temperature of reactants on the particle size were investigated. As the reaction temperature increased, average particle size of the silicone dioxide powder became smaller. Smaller particles were also obtained with decreasing the residence time of reactants in the reaction zone. Larger particles having narrow size distribution were produced with the high concentrations of the reactants. The effect of the preheating temperature was not considerable on the average particle size. The range of average particle size was from 30 nm to 58 nm depending on experimental conditions.

  • PDF

Fabrication and Characterization of LPCVD $P_2O_5-SiO_2$ Films for Inegrated Optics (1) -LPCVD of TEOS and TMPite (LPCVD $P_2O_5-SiO_2$ 집적광학박막의 제작 및 특성 연구(1) -TEOS와 TMPite의 LPCVD-)

  • 정환재
    • Korean Journal of Optics and Photonics
    • /
    • v.4 no.3
    • /
    • pp.266-275
    • /
    • 1993
  • We made $P_2O_5-SiO_2$ films on silicon for integrated optics application by low pressure chemical vapor deposition using TEOS (tetraethylorthosilicate) and TMPite (trimethylphosphite) and studied the deposition characteristics. The activation energy of the reaction was changed from 54.6 kcal/mole to 39.2 kcal/mole by incorporating the TMPite into the reaction of TEOS. The deposition rate and the P concentration of films increased in proportion to the flow of TMPite. As the deposition temperature increased, the deposition rate of the films increased but the P concentration decreased. The fabricated films showed the increase of refractive index of 0.0019 per 1 wt% of P concentration. The nonuniformity of films was ${\pm}$7% in thickness and ${\pm}$0.5wt% in P concentration and we showed this'nonuniformity is due to the nonuniform transport of TMPite. The films of more than 10wt% P concentration developed phosphoric acid on its surface when exposed to air for long time.

  • PDF

Studies on the Properties of the Plasma TEOS $SiO_2$ Film (PECVD TEOS $SiO_2$막의 특성에 관한 연구)

  • 이수천;이종무
    • Journal of the Korean Ceramic Society
    • /
    • v.31 no.2
    • /
    • pp.206-212
    • /
    • 1994
  • Effects of the film deposition process parameters on the properties such as deposition rate, etch rate, refractive index, stress and step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate glass (TEOS) SiO2 film were investigated and analysed using SEM, FTIR and SIMS techniques. Increasing TEOS flow or decreasing O2 flow increased the deposition rate and the compressive stress of the oxide film but produced a less denser film. The deposition rate decreased owing to the decrease in the sticking coefficient of the TEOS and the O2 molecules onto the substrate Si with increasing the substrate temperature. Increasing the substrate temperature produced a denser film with a lower etch rate and the higher refractive index by lowering SiOH and moisture contents. Increasing the rf power increases the ion bombardment energy. This increase in energy, in turn, increases the deposition rate and tends to make the film denser. No appreciable changes were found in the deposition rate but the refractive index and the stress of the film decreased with increasing the deposition pressure. The carbon content in the plasma TEOS CVD oxide film prepared under our standard deposition conditions were very low according to the SIMS analysis results.

  • PDF

Investigation of the Flow Dependence of a FET-Type Dissolved Oxygen Sensor and Its Reducing Method (FET형 용존 산소 센서의 유속에 의한 영향 조사와 감쇄 기법)

  • Jeong, H.;Kim, Y.J.;Lee, Y.C.;Sohn, B.K.
    • Journal of Sensor Science and Technology
    • /
    • v.10 no.3
    • /
    • pp.180-186
    • /
    • 2001
  • Recently, FET type dissolved oxygen sensor was proposed to overcome the disadvantages of the amperometric Clark-type sensor. The inherent problem of the proposed sensor, however, is the flow dependence of the sensor performances since the proposed sensor detects the pH change in close proximity to the working electrode. In this study, we decided the direction which minimize the flow effect in FIA(flow injection analysis) system. And a hydrodynamic buffer layer which can reduce the flow dependence were proposed. The suggested buffer-layers were formed onto sensing area and working electrode with mixed polymer matrix of TEOS(tetraethylorthosilicate) and DEDMS(diethoxydimethylsilane).

  • PDF

냉음극 변압기 플라즈마와 TEOS 소스를 이용한 $SiO_2$ 박막 증착

  • Lee, Je-Won;No, Gang-Hyeon;Song, Hyo-Seop;Kim, Seong-Ik;Lee, Eun-Ji;Lee, Se-Hui;Jo, Gwan-Sik
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.08a
    • /
    • pp.164-164
    • /
    • 2012
  • 저진공 (>100 mTorr)에서 냉음극 변압기 전원 소스를 이용하여 플라즈마를 발생시키는 시스템을 개발하였다. 또한 이 장치를 이용하여 Tetraethylorthosilicate (TEOS)를 기화시켜 이산화규소 ($SiO_2$) 박막 증착 기술을 연구하였다. 공정 압력은 400~1,000 mT이었다. 증착된 박막의 박막 두께, 굴절률 등의 측정을 실시하였다. 결과를 요약하면, 플라즈마 공정 압력이 증가함에 따라 박막 증착 속도는 약 200~300 A/min이었다. 또한 전압이 1,100에서 2,100 V로 증가함에 따라 산화막의 증착 속도는 약 300에서 40 nm/min으로 증가하였다. TEOS만을 사용하였을 때 굴절률은 약 1.5~1.6정도였다. 그러나 TEOS에 산소를 추가하면 자연 산화막의 굴절률인 1.46을 쉽게 얻을 수 있었다. 초기 연구 결과를 정리하면 냉음극 변압기 플라즈마 장치는 향후 실용적인 산화막 플라즈마 증착 연구 장치로 사용될 수 있을 것으로 생각된다.

  • PDF

Oxygen Permeation Characteristics of Nano-silica Hybrid Thin Films (나노 실리카 하이브리드 박막의 산소 투과 특성)

  • Kim, Seong-Woo
    • Journal of the Korean Applied Science and Technology
    • /
    • v.24 no.2
    • /
    • pp.174-181
    • /
    • 2007
  • In this study, $SiO_2/poly(ethylene-co-vinyl$ alcohol)(EVOH) hybrid coating materials with gas barrier property could be produced using sol-gel method. The biaxially oriented polypropylene (BOPP) substrate with surface pretreatment was coated with the prepared hybrid sols containing various inorganic silicate component by a spin coating method. Crystallization behavior of the hybrids was investigated in terms of analysis of X-ray diffraction and cooling thermogram from DSC experiment. From the morphological observation of the $SiO_2/EVOH$ hybrid gel, it was confirmed that there existed an optimum content of inorganic silicate precursor, Tetraethylorthosilicate (TEOS), to produce hybrid materials with dense microstructure, exhibiting uniformly dispersed silica particles with average size below 100 nm. When TEOS was added at below or above the optimum content, particle clusters with large domain were observed, resulting in phase separation. This morphological result was found to be in good agreement with that of oxygen permeability of the hybrid coated films. In the case of film coated with hybrid prepared from addition of 0.01 - 0.02mol of TEOS, a remarkable improvement in barrier property could be obtained, however, with the addition of TEOS more than 0.04 mol, the barrier property was dramatically reduced because of phase separation and micro-crack formation on the film surface.