• 제목/요약/키워드: synchrotron

검색결과 441건 처리시간 0.026초

방사광을 이용한 Si 웨이퍼 표면불순물 검출감도 향상 (Improvement of detection sensitivity of impurities on Si wafer surface using synchrotron radiation)

  • 김흥락;김광일;강성건;김동수;윤화식;류근걸;김영주
    • 한국진공학회지
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    • 제8권1호
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    • pp.13-19
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    • 1999
  • 방사광을 이용한 전반사 형광 분석법으로 Si 웨이퍼 표면 금속 불순물의 검출능을 향상시켰다. 측정장치는 특정 단색광 에너지만을 선택할 수 있는 모노크로메팅부, 측정챔버안으로 유입되는 방사광은 차폐하고 원하는 크기의 단색광을 선택하는 슬릿부 그리고 Si 웨이퍼 표면에서 전반사에 의해 발생하는 형광 X-선을 검출하는 측정부로 구성되어 있다. 단색광의 에너지는 10.90 KeV로 선택하였고, 최적의 전반사 조건을 확립하기 위하여 소멸시간과 Fe의 형광 X-선의 강도비의 관계를 이용하였다. 기존 X-선원을 이용하여 관찰한 결과와 비교하였을 경우에, 최대 약 50배까지 검출감도를 향상 시킬 수 있었다. 특히, TRXFA(Total Reflection X-ray Fluorescence Analyzer)법으로는 검출하기 어려운 $5\times10^{10}\textrm{atomas/cm}^2$ 수준의 금속오염은 방사광을 이용한 TRSFA(Total Reflection Synchrotron Fluorescence Analyzer)법으로는 충분히 검출할 수 있고, $5\times10^{9}\textrm{atomas/cm}^2$금속 불순물가지 검출할 수 있는 방법 및 장치를 개발하였다. 이를 이용하여 차세대 Si 웨이퍼의 초극미량 금속 불순물 분석에 이용할 수 있는 방법으로 기대된다.

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Structural Changes in Isothermal Crystallization Processes of Synthetic Polymers Studied by Time-Resolved Measurements of Synchrotron-Sourced X-Ray Scatterings and Vibrational Spectra

  • Tashiro, Kohji;Hama, Hisakatsu
    • Macromolecular Research
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    • 제12권1호
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    • pp.1-10
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    • 2004
  • The structural changes occurring in the isothermal crystallization processes of polyethylene (PE), poly-oxymethylene (POM), and vinylidene fluoridetrifluoroethylene (VDFTrFE) copolymer have been reviewed on the basis of our recent experimental data collected by the time-resolved measurements of synchrotron-sourced wide-angle (WAXS) and small-angle X-ray scatterings (SAXS) and infrared spectra. The temperature jump from the melt to a crystallization temperature could be measured at a cooling rate of 600-1,000 $^{\circ}C$/min, during which we collected the WAXS, SAXS, and infrared spectral data successfully at time intervals of ca. 10 sec. In the case of PE, the infrared spectral data clarified the generation of chain segments of partially disordered trans conformations immediately after the jump. These segments then became transformed into more-regular all-trans-zigzag forms, followed by the formation of an orthorhombic crystal lattice. At this stage, the generation of a stacked lamella structure having an 800-${\AA}$-long period was detected in the SAXS data. This structure was found to transfer successively to a more densely packed lamella structure having a 400-${\AA}$-long period as a result of the secondary crystallization of the amorphous region in-between the original lamellae. As for POM, the formation process of a stacked lamella structure was essentially the same as that mentioned above for PE, as evidenced from the analysis of SAXS and WAXS data. The observation of morphology-sensitive infrared bands revealed the evolution of fully extended helical chains after the generation of lamella having folded chain structures. We speculate that these extended chains exist as taut tie chains passing continuously through the neighboring lamellae. In the isothermal crystallization of VDFTrFE copolymer from the melt, a paraelectric high-temperature phase was detected at first and then it transferred into the ferroelectric low-temperature phase at a later stage. By analyzing the reflection profile of the WAXS data, the structural ordering in the high-temperature phase and the ferroelectric phase transition to the low-temperature phase of the multi-domain structure were traced successfully.

A Study on the Structural and Electrochemical Properties of Li0.99Ni0.46Mn1.56O4 Cathode Material Using Synchrotron based in-situ X-ray Diffraction

  • Choi, Sol;Yoon, JeongBae;Muhammad, Shoaib;Yoon, Won-Sub
    • Journal of Electrochemical Science and Technology
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    • 제4권1호
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    • pp.34-40
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    • 2013
  • The structural and electrochemical properties of $Li_{0.99}Ni_{0.46}Mn_{1.56}O_4$ ($Fd{\bar{3}}m$, disordered spinel) cathode material were studied and compared with stoichiometric $LiNi_{0.5}Mn_{1.5}O_4$ ($P4_332$, ordered spinel). First cycle discharge capacity of $Li_{0.99}Ni_{0.46}Mn_{1.56}O_4$ was similar to that of $LiNi_{0.5}Mn_{1.5}O_4$ at C/3 and 1C rate, but cycling performance of $Li_{0.99}Ni_{0.46}Mn_{1.56}O_4$ was better than that of $LiNi_{0.5}Mn_{1.5}O_4$ especially at high rate of 1C. This can be explained by performing synchrotron based in-situ XRD and results of GITT measurements. It is considered that faster lithium ion diffusion in the $Li_{0.99}Ni_{0.46}Mn_{1.56}O_4$ cathode results in the improvement of the rate capability. To study structural changes during cycling, synchrotron in-situ XRD patterns of both the samples were recorded at C/3 and 1C rate. Compared to stoichiometric $LiNi_{0.5}Mn_{1.5}O_4$, disordered $Li_{0.99}Ni_{0.46}Mn_{1.56}O_4$ spinel sample has pseudo one phase behavior and one step phase transition between two cubic phases. So, $LiNi_{0.5}Mn_{1.5}O_4$ would experience a much greater strain and stress, originating from the two phase transitions between three cubic phases and suffer from capacity loss during cycling especially at high rate.

In-situ Synchrotron Radiation Photoemission Spectroscopy Study of Properties Variation of Ta2O5 Film during the Atomic Layer Deposition

  • Lee, Seung Youb;Jeon, Cheolho;Jung, Woosung;Kim, Yooseok;Kim, Seok Hwan;An, Ki-Seok;Park, Chong-Yun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.283.2-283.2
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    • 2013
  • The variation of chemical and interfacial state during the growth of Ta2O5 films on the Si substrate by atomic layer deposition (ALD) was investigated using in-situ synchrotron radiation photoemission spectroscopy. A newly synthesized liquid precursor Ta(NtBu)(dmamp)2Me was used as the metal precursor, with Ar as a purging gas and H2O as the oxidant source. The core-level spectra of Si 2p, Ta 4f, and O 1s revealed that Ta suboxide and Si dioxide were formed at the initial stages of Ta2O5 growth. However, the Ta suboxide states almost disappeared as the ALD cycles progressed. Consequently, the Ta5+ state, which corresponds with the stoichiometric Ta2O5, only appeared after 4.0 cycles. Additionally, tantalum silicate was not detected at the interfacial states between Ta2O5 and Si. The measured valence band offset value between Ta2O5 and the Si substrate was 3.08 eV after 2.5 cycles.

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방사광 X-선 영상법을 이용한 소수성 마이크로 관 내 물-글리세롤 혼합물 슬러그 계면 가시화를 통한 동적접촉각 상관식 검증 (Verification of the Experimental Correlation for Dynamic Contact Angle by Visualizing Interfaces of Water-Glycerol Mixture Slug in a Hydrophobic Microtube via Synchrotron X-ray Imaging)

  • 장진규;김영현;김경준;이정훈;이연원;유동인
    • Korean Chemical Engineering Research
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    • 제60권1호
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    • pp.145-150
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    • 2022
  • 움직이는 접촉선에서의 계면 거동을 이해하기 위해 많은 연구자들은 동적접촉각에 대한 연구를 지속적으로 연구해 왔다. 하지만 가시화 기술의 한계로 선행연구에서의 동적접촉각에 대한 실험은 일반적으로 친수성 미세관에서 가시광선 기반으로 실험이 수행되었다. 하지만, 최근 다양한 연구 및 산업 분야에서 소수성 미세관에서의 동적접촉각에 대한 연구의 필요성이 대두되고 있다. 따라서, 본 연구에서는 높은 공간 및 시간 분해능을 갖는 방사광 X-선 영상법을 이용하여 소수성 마이크로 튜브 내 물-글리세롤 혼합물 슬러그의 동적접촉각을 측정하였으며, 이를 바탕으로 기존의 동적 접촉각 실험 상관식을 검증하였다.

Resistance Induction by Salicylic Acid Formulation in Cassava Plant against Fusarium solani

  • Saengchan, Chanon;Phansak, Piyaporn;Thumanu, Kanjana;Siriwong, Supatcharee;Le Thanh, Toan;Sangpueak, Rungthip;Thepbandit, Wannaporn;Papathoti, Narendra Kumar;Buensanteai, Natthiya
    • The Plant Pathology Journal
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    • 제38권3호
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    • pp.212-219
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    • 2022
  • Fusarium root rot caused by the soil-borne fungus Fusarium solani is one of the most important fungal diseases of cassava in Thailand, resulting in high yield losses of more than 80%. This study aimed to investigate if the exogenous application of salicylic acid formulations (Zacha) can induce resistance in cassava against Fusarium root rot and observe the biochemical changes in induced cassava leaf tissues through synchrotron radiation based on Fourier-transform infrared (SR-FTIR) microspectroscopy. We demonstrated that the application of Zacha11 prototype formulations could induce resistance against Fusarium root rot in cassava. The in vitro experimental results showed that Zacha11 prototype formulations inhibited the growth of F. solani at approximately 34.83%. Furthermore, a significant reduction in the disease severity of Fusarium root rot disease at 60 days after challenge inoculation was observed in cassava plants treated with Zacha11 at a concentration of 500 ppm (9.0%). Population densities of F. solani were determined at 7 days after inoculation. Treatment of the Zacha11 at a concentration of 500 ppm resulted in reduced populations compared with the distilled water control and differences among treatment means at each assay date. Moreover, the SR-FTIR spectral changes of Zacha11-treated epidermal tissues of leaves had higher integral areas of lipids, lignins, and pectins (1,770-1,700/cm), amide I (1,700-1,600/cm), amide II (1,600-1,500/cm), hemicellulose, lignin (1,300-1,200/cm), and cellulose (1,155/cm). Therefore, alteration in defensive carbohydrates, lipids, and proteins contributed to generate barriers against Fusarium invasion in cassava roots, leading to lower the root rot disease severity.

Beam position measurement system at HIRFL-CSRm

  • Min Li ;Guoqing Xiao ;Ruishi Mao ;Tiecheng Zhao ;Youjin Yuan ;Weilong Li ;Kai Zhou;Xincai Kang;Peng Li ;Juan Li
    • Nuclear Engineering and Technology
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    • 제55권4호
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    • pp.1332-1341
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    • 2023
  • Beam position measurement system can not only provide the beam position monitoring, but also be used for global orbit correction to reduce beam loss risk and maximize acceptance. The Beam Position Monitors (BPM) are installed along the synchrotron to acquire beam position with the front-end electronics and data acquisition system (DAQ). To realize high precision orbit measurement in the main heavy ion synchrotron and cooling storage ring of heavy-ion research facility in Lanzhou (HIRFL-CSRm), a series of alignment and calibration work has been implemented on the BPM and its DAQ system. This paper analyzed the tests performed in the laboratory as well as with beam based on the developed algorithms and hardware. Several filtering algorithms were designed and implemented on the acquired BPM raw data, then the beam position and resolution were calculated and analyzed. The results show that the position precision was significantly improved from more than 100 ㎛ to about 50 ㎛ by implementing the new designed filtering algorithm. According to the analyzation of the measurement results and upcoming physical requirements, further upgrade scheme for the BPM DAQ system of CSRm based on field programmable gate array (FPGA) technology was proposed and discussed.

LIGA 공정에서의 노광시간과 X선마스크 흡광체의 두께 (Exposure Time and X-Ray Absorber thickness in the LIGA Process)

  • 길계환;이승섭;염영일
    • 한국진공학회지
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    • 제8권2호
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    • pp.102-110
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    • 1999
  • The LIGA X-ray exposure step was modelled into three inequalities, by assuming that the X-ray energy attenuated within a resist is deposited only in the localized range of the resist. From these inequalities, equations for the minimum and maximum exposure times required for a good quality microstructure were obtained. Also, an equation for the thickness of an X-ray mask absorber was obtained from the exposure requirement of threshold dose deposition. The calculation method of the synchrotron radiation power from a synchrotron radiation source was introduced and applied to an X-ray exposure step. A power from a synchrotron radiation source was introduced and applied to an X-ray exposure step/ A power function of photon energy, approximating the attenuation length of the representative LIGA resist, PMMA, and the mean photon energy of the XZ-rays incident upon an X-ray mask absorber were applied to the above mentioned equations. Consequently, the tendencies of the minimum and maximum exposure and with respect to mean photon energy and thick ness of PMMA was obtained. Additionally, the tendencies of the necessary thickness of PMMA and photon energy of the X-ray mask absorber with respect to thickness of PMMA and photon energy of the X-rays incident upon an X-ray mask absorber were examined. The minimum exposure time increases monotonically with increasing mean photon energy for the same total power density and is not a function of the thickness of resist. The minimum exposure time increases with increasing mean photon energy for the same total power density in the case of the general LIGA process, where the thickness of PMMA is thinner than the attenuation length of PMMA. Additionally, the minimum exposure time increases monotonically with increasing thickness of PMMA. The maximally exposable thickness of resist is proportional to the attenuation length of the resist at the mean photon energy with its proportional constant of ln $(Dd_m/D_{dv})$. The necessary thickness of a gold X-ray mask absorber due to absorption edges of gold, increases smoothly with increasing PMMA thickness ratio, and is independent of the total power density itself. The simplicity of the derived equations has made clearly understandable the X-ray exposure phenomenon and the correlation among the exposure times, the attenuation coefficient and the thickness of an X-ray mask absorber, the attenuation coefficient and the thickness of the resist, and the synchrotron radiation power density.

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