• Title/Summary/Keyword: surface display

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Vertical Alignment of Liquid Crystals by Ordering Effect of Self-assembled Monolayers on the Ion-beam-irradiated Anisotropic Surface

  • Park, Ji-Sub;Seok, Keun-Yeong;Hwang, Soo-Won;Kim, Jae-Chang;Yoon, Tae-Hoon;Kim, Jae-Hoon;Kim, Hak-Rin
    • Journal of Information Display
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    • v.11 no.4
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    • pp.144-148
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    • 2010
  • In this paper, vertically aligned (VA) liquid crystal (LC) modes were investigated using the alkyl chain ordering effect of self-assembled monolayers (SAMs) prepared on the anisotropic inorganic surface. On the anisotropic surface prepared through oblique ion beam irradiations, the SAM molecules are adsorbed, producing macroscopic alkyl chain ordering, which can determine the pretilt direction of the vertically aligned LC molecules through the intermolecular interactions on the surface.

Decay and diffusion characteristic of electron and ion surface charges on MgO

  • Syn, Ho-Jung;Jeong, Dong-Cheol;Lee, Tae-Ho;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.377-380
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    • 2008
  • In this work, we measured the spatiotemporal surface charge distribution by the longitudinal electro-optic amplitude modulation method with BSO single crystal to investigate the decay and diffusion characteristics of surface charges in three types of MgO. The speed of decay and diffusion of two different kinds doped MgO is compared with those of pure MgO. The difference in the characteristics of the decay and diffusion between the electron and ion surface charges is investigated separately. We found that the rate of ion decay is the major factor that makes the difference of the temporal variation of wall voltage among different types doped MgO.

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Influences of anti-reflection surface treatment on legibility of reflective-type displays

  • Jeng, Shie-Chang;Lin, Yan-Rung;Liao, Chi-Chang;Ding, Jau-Min;Wen, Chao-Hua;Lin, Po-Hung;Lin, Yu-Ting;Hwang, Sheue-Ling
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1295-1298
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    • 2006
  • Influences of anti-reflection surface treatment, radius of curvature and ambient illuminance on legibility of reflective-type displays were studied. The results showed that legibility mainly depended on the surface treatment. Better surface treatment also produced less visual fatigue after the letter-search task

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LC Aligning Ability of the Liquid Crystal Display using Photopolymer Layers Containing an Acrylate unite Photopolymerized by a Photoinitiator

  • Hwang, Jeoung-Yeon;Seo, Dae-Shik;Kim, Jun-Young;Kim, Tae-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.489-492
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    • 2003
  • Photoalignment materials of PGMAcr, poly[3-(acryloyloxy)-2-hydroxypropyl methacrylate] using an acrylate unit photopolymerized by a photo-initiator and PGMA4Ch, poly[3- (4-ehalconyloxy)-2-hydroxypropyl methacrylate] using photodimerization by the chalcone group were synthesized. Also, the liquid crystal (LC) alignment capabilities on the photopolymer layers were studied. A good LC alignment with UV exposure on the PGMAcr surface can be obtained. However, LC alignment defects were observed on the PGMA4Ch surface. The LC alignment capability of the PGMAcr surface by the photoinitiator was better than that of the PGMA4Ch surface by the chalcone group which is a photosensitive moiety.

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EO Performances of the Ion Beam Aligned TN-LCD on a Diamond-like-Carbon Thin Film Surface

  • Hwang, Jeoung-Yeon;Jo, Yong-Min;Seo, Dae-Shik;Rho, Soon-Joon;Baik, Hong-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.497-499
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    • 2003
  • Electro-optical (EO) performances of the ion beam aligned twisted nematic (TN)-liquid crystal display (LCD) with oblique ion beam exposure on the DLC thin film surface were studied. An excellent voltage-transmittance (VT) curve of the ion beam aligned TN-LCD was observed with oblique ion beam exposure on the DLC thin film surface for 1 min. Also, a faster response time for the ion beam aligned TN-LCD can be achieved with oblique ion beam exposure on the DLC thin film surface for 1 min can be achieved.

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Effect of Coating and Machining Parameters on Surface Finish in Dry Drilling of Aluminium 6061 (Al 6061의 드릴가공에서 공구코팅과 공정변수가 표면정도에 미치는 영향)

  • Choi, Man Sung
    • Journal of the Semiconductor & Display Technology
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    • v.14 no.2
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    • pp.47-52
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    • 2015
  • In this paper, the performance of uncoated- and Titanium nitride aluminium TiAlN-PVD coated- carbide twist drills were investigated when drilling aluminium alloy, Al 6061. This research focuses on the optimization of drilling parameters using the Taguchi technique to obtain minimum surface roughness and thrust force. A number of drilling experiments were conducted using the L9 orthogonal array on a CNC vertical machining center. The experiments were performed on Al 6061 material l blocks using uncoated and coated HSS twist drills under dry cutting conditions. Analysis of variance(ANOVA) was employed to determine the most significant control factors. The main objective is to find the important factors and combination of factors influence the machining process to achieve low surface roughness and low cutting thrust force. From the analysis of the Taguchi method indicates that among the all-significant parameters, feed rate are more significant influence on surface roughness and cutting thrust than spindle speed.

Discharge Dynamics of AC Plasma Display Panel

  • Whang, Ki-Woong;Seo, Jeong-Hyun;Yoon, Cha-Keun;Chung, Woo-Joon;Kim, Joong-Kyun
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 1999.11a
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    • pp.53-57
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    • 1999
  • To investigate the discharge dynamics of alternating current plasma display panel (ACPDP), we measured the spatio-temporally resolved VUV and IR emission by an intensified charge coupled device (CCD). The breakdown beings around the anode inner edge and moves towards the cathode surface. As the ionization intensifies in front of the cathode surface, another emission region appears on the anode surface. While the anode side emission does not move but grows, the cathode side emission moves out and spreads over the entire cathode surface. The discharge dynamics emission by a 2 dimensional numerical simulation suggests that a cathode-directed streamer formation play an important role.

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Coolant Path Geometry for Improved Electrostatic Chuck Temperature Variation (정전척 온도분포 개선을 위한 냉각수 관로 형상)

  • Lee, Ki-Seok
    • Journal of the Semiconductor & Display Technology
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    • v.10 no.4
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    • pp.21-23
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    • 2011
  • Uniformity of plasma etching processes critically depends on the wafer temperature and its distribution. The wafer temperature is affected by plasma, chucking force, He back side pressure and the surface temperature of ESC(electrostatic chuck). In this work, 3D mathematical modeling is used to investigate the influence of the geometry of coolant path and the temperature distribution of the ESC surface. The model that has the coolant path with less change of the cross-sectional area and the curvature shows low standard deviation of the ESC surface temperature distribution than the model with the coolant path of the larger surface area and more geometric change.

A study on the Grindability of Fine Ceramics by Experimental Method (실험적 방법에 의한 파인세라믹스의 연삭성에 관한 연구)

  • Kim, Seong-Kyeum
    • Journal of the Semiconductor & Display Technology
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    • v.10 no.3
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    • pp.35-42
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    • 2011
  • This paper describes the characteristics of high speed grinding and the influence of wheel surface speed V and a grindability of the grinding materials. The various fine ceramics pieces was ground by metal and vitrified bonded diamond wheel. The surface roughness of fine ceramics(Zirconia($ZrO_2$), Silicon Carbide(SiC), Silicon Nitride($Si_3N_4$), Alumina($Al_2O_3$)) decreases from $0.05{\mu}m(R_{max})$ to $0.025{\mu}m(R_{max})$ when the wheel speed at grinding point increases the wheel speed. Relation between the temperature at grinding point and surface roughness was linear. Abrasive jet machining(AJM), a specialized from of shot blasting, is considered one of the most helpful micro machining methods for hard and brittle materials such as glasses and ceramics by constant pressure grinding.

Effects of Forced Self Driving Function in Silicon Wafer Polishing Head on the Planarization of Polished Wafer Surfaces (실리콘 웨이퍼 연마헤드의 강제구동 방식이 웨이퍼 연마 평탄도에 미치는 영향 연구)

  • Kim, Kyoungjin;Park, Joong-Youn
    • Journal of the Semiconductor & Display Technology
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    • v.13 no.1
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    • pp.13-17
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    • 2014
  • Since the semiconductor manufacturing requires the silicon wafers with extraordinary degree of surface flatness, the surface polishing of wafers from ingot cutting is an important process for deciding surface quality of wafers. The present study introduces the development of wafer polishing equipment and, especially, the wafer polishing head that employs the forced self-driving of installed silicon wafer as well as the wax wafer mounting technique. A series of wafer polishing tests have been carried out to investigate the effects of self-driving function in wafer polishing head. The test results for wafer planarization showed that the LLS counts and SBIR of polished wafer surfaces were generally improved by adopting the self-driven polishing head in wafer polishing stations.