• Proceedings of the Korea Concrete Institute Conference
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• 1999.04a
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• pp.343-348
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• 1999

The purpose of this study is to evaluated the effects of added expanded polystyrene on the basic properties of UP mortar. Polyester resin mortars are prepared with expanded polystyrene ratio in styrene monomer (EPS/PS), and the ratio of total polystyrene resin to UP resin (PS/UP). And it is tested for viscosity of UP resin added PS resin, slump-flow test, working life, flexural and compressive strengths, and curing shrinkage test. From the test result, Viscosity of resin for polymer mortar increases with increasing PS content. Curing shrinkage of UP mortar is considerably smaller than that of plain UP mortar, nevertheless, reduction in the strengths is not recognized according to adding PS resin. In this study, we can obtain the optimum mix proportions of polymer mortar using PS resin.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1993.05a
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• pp.28-32
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• 1993

A deposition rate of styrene thin films is linearly increased, but one of benzene thin films is nonlinearly increased with increasing discharge power under maintaining a polymerization time, pressure and monomer flow rate. And, the reduction of transmittance at shortwave is larger than that of transmittance at longwave. The refractive index with wavelength is various from 1.55 to 1.65. The refractive index of their thin films is decreased with increasing discharge power. Also, it is known that measured results are valid because the calculation of the extinction coefficient is about $10^3$ within variation of refractive index.

• Elastomers and Composites
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• v.53 no.1
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• pp.1-5
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• 2018

In the current research, the curing kinetics of a mixture system consisting of a Bisphenol-A type vinyl ester resin and styrene monomer was studied. Methylethylketone peroxide and cobalt octoate were used as the polymerization initiator and accelerator respectively. Thermograms with several different heating rates were obtained using non-isothermal differential scanning calorimetry. Activation energy values analyzed by the Flynn-Wall-Ozawa isoconversional method showed a three-step change with conversion ${\alpha}$: a slight decrease initially for ${\alpha}$ < 0.1, a constant value of 47.9 kJ/mol in the range 0.1 < ${\alpha}$ < 0.7, and a slow increase for 0.7 < ${\alpha}$. When assuming a constant activation energy of 47.9 kJ/mol, an autocatalytic model of the Sestak-Berggren equation was considered as the proper mathematical model of the conversion function, indicating an overall order of 1.2.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.36 no.1
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• pp.29-35
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• 1987

TPolystyrene thin films are prepared by glow discharge of sytrene monomer vapor th establish the growth mechanism of organic thin films by the plasma polymerization. As the discharge parameters, discharge current(5mA-20mA), frequency (10kHz-50kHz, 13.56MHz), gaspressure (0.2torr-1.5torr), and discharge time(2min-12min)are adopted. Plasma-polymerized filmsof styrene vapor are identified as polystyrene by IR spectra. The thickness of plasma-polymerized films increases with gas pressure, frequency and discharge current in the region of the low frequency and below the allowed gas pressure where the polymerization occurs. It is suggested that the growth mechanism can be explained by ionic reaction in d.c. and low frequency region, and by radical reaction in high frequency region.

• Proceedings of the KIEE Conference
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• 1994.07b
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• pp.1400-1402
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• 1994

Plasma polymerized thin films was prepared using an interelectrod inductively coupled gas-flow-type reactor. Styrene was chosen as the monomer to be used. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage 30kV, and the pattern in the resist was developed with RIE 80 with argon gas mixture ratio, pressure and RF power. The molecular structure of thin films was investigated by GPC and FT-IR and then was discussed in relation to its quality as a resist. In the case of plasma polymerization, thickness of resist could be controlled by discharge duration and power. Also etch rate is increased as to growing pressure with RIE 80.

• YAKHAK HOEJI
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• v.33 no.6
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• pp.372-376
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• 1989

Equilibrium swelling and pH-sensitivity of a polyelectrolyte copolymer hydrogel were controlled by employing copolymers with different hydrophilic-hydrophobic balances. Model pH-sensitive hydrogels, e.g., poly(methacrylic acid), poly(methacrylic acid-co-acrylamide), poly(methacrylic acid-co-2-hydroxyethylmethacrylate), poly(methacrylic acid-co-styrene) were synthesized at various monomer compositions. As hydrophobicity of the copolymer hydrogels increased, the equilibrium swelling decreased while the pH-sensitivity increased. In the case of poly(methacrylic acid-co-acrylamide), polymer-polymer interaction significantly affected the equilibrium swelling and provided a wide range control of pH-sensitivity.

• Proceedings of the Korea Concrete Institute Conference
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• 1992.04a
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• pp.35-40
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• 1992

Results of an experimental study on the manufacture, the workability and mechanical properties of steel fiber reinforced polyester resin composites utilizing industrial waste products are presented in this paper. The fly ash polyester resin composites using steel fiber, fly ash and calcium carbonic acid (CaCo3), unsaturated polyester resin, styrene monomer, cobalt octate and methyl ethyl ketone peroxide, fine and coarse aggregates are prepared with various filler~binder rations, binder rates and mixing conditions. As a test results, the workability of steel fiber reinforced polyester resin composites are considerably dropped with increasing fly ash-binder ratio and steel fiber volume. And compressive, flexural strength and bending toughness of the composites are remarkably improved with augmenting fiber contents.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1994.05a
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• pp.138-140
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• 1994

Plasma polymerized thin film was prepared using an interelectrod inductively coupled gas-flow-type reactor. Styrene was chosen as the monomer to be used. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage 30kV, and the pattern in the resist was developed with RIE 80 with argon gas mixture ratio, pressure and RF power. The effect of charge of discharge power on growth rate and etching rate of the thin films were studied. The molecular structure of thin films were investigated by FIR and then was discussed in relation to its quality as a resist. In the case of Plasma polymerization, thickness of resist could be controlled by discharge duration and power. Also etch rate is increased as to growing argon gas and RF power with RIE 80.

• Proceedings of the KIEE Conference
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• 1993.07b
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• pp.1189-1192
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• 1993

Organic thin films were fabricated an using interelectrode capacitively coupled type plasma polymerizaion apparatus, and their optical properties were investigated. A deposition rate of styrene thin films is linearly increased, but one or vinyl-pyridine thin films is nonlinearly increased with increasing of polymerization time, pressure and monomer flow rate. The transmittance of single layer thin films is constant, but that of multi-layer appeared irregular peak with increasing of the number of layers. And then the refractive index of organic thin films is various from 1.55 to 1.65 with wavelength, the extinction coefficient indicated $10^{-3}$.

• Proceedings of the KIEE Conference
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• 1994.11a
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• pp.278-280
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• 1994

The purpose of this paper is to describe an application of plasma polymerized thin film as an electron beam resist. Plasma polymerized thin film was prepared using an interelectrod inductively coupled gas-flow-type reactor. Styrene was chosen as the monomer to be used. This thin films were also delineated by the electron-beam apparatus and the pattern in the resist was developed with RIE and plasma polymerized apparatus. The effect of charge of pressure on growth rate and etching rate of the thin films were studied. The molecular structure of thin film was investigated by FT-IR and then was discussed in relation to its quality as a resist.