• Title/Summary/Keyword: space deposition

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An analysis on the impurities generated by discharge in AC plasma display panel (교류 플라즈마 표시기 방전 시 발생하는 불순물 종의 분석)

  • 김광남;김중균;양진호;황기웅;이석현
    • Journal of the Korean Vacuum Society
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    • v.8 no.4A
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    • pp.482-489
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    • 1999
  • AC PDP(P1asma Display Pane1)s use the mixture of inert gases to generate a discharge inside the display pixels. Impurities such as CO, $CO_2$ and OH inside discharge region may deteriorate the characteristics of PDP operation during long life time of PDP. Electro-negative gas such as CO can cause the sustain pulse amplitude to rise by attaching electrons which will play an important role in the earlier stage of the discharge. MgO film is used to protect the dielectric layer in AC PDP, and is in contact with the free space of display pixel where it is filled with the inert gas mixture. So, MgO film can be a main source of impurities. In this experiment, we observed the change of impurity generation of various MgO films which were deposited by different methods, by using QMS. (quadropole mass spectrometer) The main impurites were $H_2$, CO and $CO_2$. And with the comparison of the TPD (temperature programmed desorption) result, it can be understood that impurity gases are generated by sputtering of MgO surface not by outgassing. Deposition method had effects on the characteristics of the impurity generation. The MgO film manufactured by e-beam evaporation generated more amount of impurity gases than the MgO films manufactured by sputtering or ion-plating. And also heat treatment of MgO film after deposition decreased the magnitude of impurity gas generation.

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Multi-functional Micro/Nano Printing Process with ElectroSpray Deposition(ESD) (ESD를 이용한 다기능 미세 프린팅 공정)

  • Kim D.S.;Lee W.H.;Lim H.E.;Park Y.D.;Lee K.B.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.597-598
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    • 2006
  • In this study, we used the ESD method to prepare the protein microarrays for observation the stem cell responses to pattern size, space and shapes. The ESD method allows a reduction in spot size, high efficiency of substance transfer, and high rate in fabrication as a result of ability to simultaneously deposit thousands of identical spots. Typical electro spraying conditions for the deposition of proteins were a voltage of $3{\sim}5keV$ and the humidity under 30%. The patterns of masks have a variety of shapes, spaces, and hole sizes from 10 um to $300{\mu}m$. Three kinds of proteins(collagen, fibronectin, and vitronectin dissolved in PBS) are deposited in a dry state, preserving the functional activity of proteins. Stem cells were cultured on each protein patterned sample at $37^{\circ}C$ for 1day.

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Diagnostics of Magnetron Sputtering Plasmas: Distributions of Density and Velocity of Sputtered Metal Atoms

  • Sasaki, Koichi
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.98-99
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    • 2012
  • Deposition of thin films using magnetron sputtering plasmas is a well-developed, classical technology. However, detailed investigations using advanced diagnostics are insufficient in magnetron sputtering, in comparison with plasma-aided dry etching and plasma-enhanced chemical vapor deposition. In this talk, we will show examples of diagnostic works on magnetron sputtering employing metal targets. Diagnostic methods which have fine spatial resolutions are suitable for magnetron sputtering plasmas since they have significant spatial distributions. We are using two-dimensional laser-induced fluorescence spectroscopy, in which the plasma space is illuminated by a tunable laser beam with a planer shape. A charge-coupled device camera with a gated image intensifier is used for taking the picture of the image of laser-induced fluorescence formed on the planer laser beam. The picture of laser-induced fluorescence directly represents the two-dimensional distribution of the atom density probed by the tunable laser beam, when an intense laser with a relatively wide line-width is used. When a weak laser beam with a relatively narrow linewidth is used, the laser-induced fluorescence represents the density distribution of atoms which feel the laser wavelength to be resonant via the Doppler shift corresponding to their velocities. In this case, we can obtain the velocity distribution function of atoms by scanning the wavelength of the laser beam around the line center.

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A solar Cell Fiber using Semi-conductive Polymers (반도체형 고분자를 이용한 태양전지섬유)

  • Song, Jun-Hyung;Kim, Joo-Yong
    • Textile Coloration and Finishing
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    • v.20 no.1
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    • pp.44-47
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    • 2008
  • Organic semi-conductive materials have characteristics such as the advantages of easy formability, low-cost and diversity along with moderate semi-conductive properties. In this paper, we developed a flexible organic-inorganic hybrid solar cell fiber. First, we made a solar cell on the glass and attached the solar cell on the glass fiber similarly. In the latter case, thermal deposition method was employed in order to effectively apply ITO onto fiber surface. The amount of ITO was controlled by varying the temperature from 25, 150 to $300^{\circ}C$. Optimum result was obtained at $150^{\circ}C$ where maximize the deposition amount without significant decomposition of ITO. Despite of maximum open circuit voltage of 0.39V, the resulting current was quite unstable and weak, limiting realistic applications. It was, however, concluded that the flexible solar cell fiber developed showed a possibility of low-weight application from functional clothing for military to space suit mainly due to flexibility and thus wear ability.

Field Emission Characteristics and Growth Analysis of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition (플라즈마 화학 기상 증착법을 이용한 탄소나노튜브의 성장 분석 및 전계방출 특성)

  • 오정근;주병권;김남수
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.12S
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    • pp.1248-1254
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    • 2003
  • Carbon nanotubes(CNTs) are grown by using Co catalyst metal. CNTs fabricated by PECVD(plasma enhanced chemical vapor deposition) method are studied in terms of surface reaction and surface structure by TEM and Raman analysing method and ate analysed in its electrical field emission characteristics with variation of space between anode and cathode. Acetylene(C$_2$H$_2$) gas is used as the carbon source, while ammonia and hydrogen gas are used as catalyst and dilution gas. The CNTs grown by hydrogen(H$_2$) gas plasma indicates better vortical alignment, lower temperature process, and longer tip, compared to that grown by ammonia(NH$_3$) gas plasma. The CNTs fabricated with Co(cobalt) catalyst metal and PECVD method show the multiwall structure in mid-circle type in tip-end and the inner vacancy of 10nm. Emission properties of CNTs indicate the turn-on field to be 2.6 V/${\mu}{\textrm}{m}$ We suggest that CNTs can be possibly applied to the emitter tip of FEDs and high brightness flat lamp because of low temperature CNTs growth, low turn-on field.

Field Emission Characteristics and Growth Analysis of Carbon Nanotubes by plasma-enhanced chemical vapor deposition (플라즈마 화학 기상 증착법을 이용한 탄소나노튜브의 성장 분석 및 전계방출 특성)

  • Oh, Jung-Keun;Ju, Byeong-Kwon;Kim, Nam-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.71-75
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    • 2003
  • Carbon nanotubes(CNTs) are grown by using Co catalyst metal. CNTs fabricated by PECVD(plasma enhanced chemical vapor deposition) method are studied in terms of surface reaction and surface structure by TEM and Raman analysing method and are analysed in its electrical field emission characteristics with variation of space between anode and cathode. Acetylene($C_2H_2$) gas is used as the carbon source, while ammonia and hydrogen gas are used as catalyst and dilution gas. The CNTs grown by hydrogen($H_2$) gas plasma indicates better vertical alignment, lower temperature process and longer tip, compared to that grown by ammonia($NH_3$) gas plasma. The CNTs fabricated with Co(cobalt) catalyst metal and PECVD method show the multiwall structure in mid-circle type in tip-end and the inner vacancy of 10nm. Emission properties of CNTs indicate the turn-on field to be $2.6\;V/{\mu}m$. We suggest that CNTs can be possibly applied to the emitter tip of FEDs and high brightness flat lamp because of low temperature CNTs growth, low turn-on field.

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Polarization Maintaining Dichroic Beam-splitter and Its Surface Shape Control by Back Side AR Coating

  • Ma, Chong;Chen, Gang;Liu, Dingquan;Zhang, Rongjun;He, Junbo;Zhu, Xudan;Li, Daqi
    • Current Optics and Photonics
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    • v.5 no.5
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    • pp.576-582
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    • 2021
  • Dichroic beam-splitter (DBS) with polarization-maintaining took an important role in the free space quantum telecommunication tests on the Micius satellite of China. In this presentation, we designed and prepared a 50 layer polarization-maintaining DBS coating by a dual ion beam sputtering deposition (Dual-IBS) method. In order to solve a stress problem, an 18 layer special anti-reflection (AR) coating with similar physical thickness ratio was deposited on the backside. By stress compensation, the surface flatness RMS value of the DBS sample decreased from 0.341 λ (@632.8 nm) to 0.103 λ while beam splitting and polarization maintaining properties were almost kept unchanged. Further, we discussed the mechanism of film stress and stress compensation by equation deduction and found that total stress had a strong relationship with the total physical thickness and the ratio of layer materials.

Hydrophobic Surface Treatment with Anisotropic Characteristics Using Laser Selective Deposition (레이저 선택적 증착을 통한 이방특성의 소수성 표면처리)

  • Kim, Ji-Hun;Kwon, Ye-Ji;Yang, Hoon-Seok;Kim, Joohan
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.19 no.11
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    • pp.109-115
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    • 2020
  • Surfaces with various roughnesses were produced through laser processing, and the anisotropy and hydrophobicity of the surfaces were examined in the context of the microstructures. The fine particles transferred to the glass surface exhibited different sizes, and the roughness increased. Due to the change in the roughness, the liquid could not penetrate the space between the fine particles, and it was thus exposed to the air. We analyzed this phenomenon using the combined Wenzel and Cassie-Baxter models. Excessive fine particle formation on the substrate tended to increase the roughness and surface energy. The silver-glass-air contact analysis could clarify the mechanism of the reduction of the contact angle and differences in the metastable and stable states when the particles did not completely cover the glass substrate. The formation of microstructures with fine particles through the laser selective deposition led to the generation of an anisotropic surface as the water droplets diffused toward the glass substrate with a relatively high surface energy level.

Effect of Artificial Structures on the Long-Term Topographic Changes at Daehang-ri Intertidal Flat, the West Coast of Korea (인공구조물에 의한 대항리 갯벌의 장기 지형변화)

  • Choi, Tae-Jin;Jeong, Eui-Young;Yang, Young Jin;Choi, Jin-Yong
    • Journal of The Korean Society of Agricultural Engineers
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    • v.62 no.2
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    • pp.75-82
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    • 2020
  • The Daehang-ri intertidal flat located the just outside of the Saemangeum dike has been reported to show new-developing flats. Based on the topographic surveys of 21 times from 2000 to 2016 by a leveling method every year, this site clearly shows variation of deposition/erosion in time and space. Deposition has consistently occurred at the rate of +3.75 cm per year at the area along the dike (Zone 1), and this tidal flat is expanding and prograding seaward. In the area of far from the dike (Zone 2), on the other hand, erosion prevails at the rate of -2.38 cm per year, and this zone tends to retreat landward. However, the erosional trend of Zone 2 has slightly slowed down since 2014. As a whole from 2000 to 2016, net deposition is recorded over 3.0 m at the upper beach and the area adjacent to the dike (Zone 1), while erosion up to 1.0 m in Zone 2. In conclusion, the results at the Daehang-ri intertidal flat clearly revealed that its topographic changes were induced by the artificial structures and water masses through its sluice gate. Counter-clockwise gyre newly created after the sea dikes construction probably results in relocating of sediment outside the dike 1 by transportation of materials eroded from the south to the north along the coast.

Investigation of Vanadium-based Thin Interlayer for Cu Diffusion Barrier

  • Han, Dong-Seok;Park, Jong-Wan;Mun, Dae-Yong;Park, Jae-Hyeong;Mun, Yeon-Geon;Kim, Ung-Seon;Sin, Sae-Yeong
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.41.2-41.2
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    • 2011
  • Recently, scaling down of ULSI (Ultra Large Scale Integration) circuit of CMOS (Complementary Metal Oxide Semiconductor) based electronic devices become much faster speed and smaller size than ever before. However, very narrow interconnect line width causes some drawbacks. For example, deposition of conformal and thin barrier is not easy moreover metallization process needs deposition of diffusion barrier and glue layer. Therefore, there is not enough space for copper filling process. In order to overcome these negative effects, simple process of copper metallization is required. In this research, Cu-V thin alloy film was formed by using RF magnetron sputter deposition system. Cu-V alloy film was deposited on the plane $SiO_2$/Si bi-layer substrate with smooth and uniform surface. Cu-V film thickness was about 50 nm. Cu-V layer was deposited at RT, 100, 150, 200, and $250^{\circ}C$. XRD, AFM, Hall measurement system, and XPS were used to analyze Cu-V thin film. For the barrier formation, Cu-V film was annealed at 200, 300, 400, 500, and $600^{\circ}C$ (1 hour). As a result, V-based thin interlayer between Cu-V film and $SiO_2$ dielectric layer was formed by itself with annealing. Thin interlayer was confirmed by TEM (Transmission Electron Microscope) analysis. Barrier thermal stability was tested with I-V (for measuring leakage current) and XRD analysis after 300, 400, 500, 600, and $700^{\circ}C$ (12 hour) annealing. With this research, over $500^{\circ}C$ annealed barrier has large leakage current. However V-based diffusion barrier annealed at $400^{\circ}C$ has good thermal stability. Thus, thermal stability of vanadium-based thin interlayer as diffusion barrier is good for copper interconnection.

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