• Title/Summary/Keyword: solution deposition method

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A Study on the Magnetic Properties of the Co-Ni-P thin Plate by Electroless Plating (무전해도금법에 의한 Co-Ni-P 박막의 자기적특성에 관한 연구)

  • Kim, C.W.;Lee, C.;Yoon, S.R.;Joung, I.
    • Korean Journal of Materials Research
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    • v.5 no.8
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    • pp.1013-1019
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    • 1995
  • The thin plate of Co-Ni-P was deposited on the polyester film by the electroless plating method. Through present experiments, deposition rates and metal compositions of the plates were determined according to compositions of solution, pH and temperature. Also, magnetic properties of plates were examined according to metal compositions. Considering magnetic properties and deposition rates of electroless plating, the best condition was obtained as pH of 8.5 and 90℃. It was observed that metal compositions were evidently varied by the pH of solutions and the concentration of complex agents. However. they were not affected by other factors. At the optimum condition, the composition of the plate was Co(78%), Ni(16%), and P(6%). Also, it was found that the coercive force was 370 Oe, and squareness was 0.65 at this condition. Magnetic properties (hard or soft) of thin plates were determined by metal compositions. Therefore. the plate became soft magnetic plate as the composition of nickel increased over 30 per cents. The crystal structure of the soft magnetic plate was found to be amorphous in which it was strongly oriented to the (111)phahe of nickel. On the ohter hand, the hard magnetic place was found to be hcp crystalline of α-cobalt which was oriented to the (101)phase of cobalt and the (100)phase of cobalt.

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Electrochemical Reduction of Perchlorate Using Mercury Film Electrode (수은 막전극을 이용한 수용액 중 과염소산이온의 전기화학적 환원)

  • Myung, Noseung;Kim, Eun Young;Jee, Hyung-Woo;Keum, Narae;Rhee, Insook;Paeng, Ki-Jung
    • Journal of the Korean Electrochemical Society
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    • v.19 no.3
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    • pp.95-100
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    • 2016
  • A method for electrochemical degradation of the perchlorate anion ($ClO_4{^-}$) using mercury film electrode has been studied. Electrochemical method has relatively simple pre-treatment. However, electrochemical method should avoid interference from hydrogen evolution at the applied potential to degradation of perchlorate ion, and thus applied electrode should have large hydrogen overvoltage which suppressed the hydrogen evolution at the working reduction potential to prevent hydrogen evolution. In this study, we used mercury film electrode as a working electrode which has a large overvoltage. Ag / AgCl (sat. NaCl) was used as a reference electrode, and platinum was used as a counter electrode. Mercury film electrode was made by cyclic voltammetry (CV) method. The deposition time was decided as 10 minute, and the stability of the mercury electrode in perchlorate solution was confirmed by CV. The reduction potential of perchlorate was checked by using CV method, and decomposition of perchlorate was performed by using chronoamperometric (CA) method. Also, ion chromatography (IC) was used to confirm the degradation rates of perchlorate.

Fabrication of Artificial Sea Urchin Structure for Light Harvesting Device Applications

  • Yeo, Chan-Il;Kwon, Ji-Hye;Kim, Joon-Beom;Lee, Yong-Tak
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.380-381
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    • 2012
  • Bioinspired sea urchin-like structures were fabricated on silicon by inductively coupled plasma (ICP) etching using lens-like shape hexagonally patterned photoresist (PR) patterns and subsequent metal-assisted chemical etching (MaCE) [1]. The lens-like shape PR patterns with a diameter of 2 ${\mu}m$ were formed by conventional lithography method followed by thermal reflow process of PR patterns on a hotplate at $170^{\circ}C$ for 40 s. ICP etching process was carried out in an SF6 plasma ambient using an optimum etching conditions such as radio-frequency power of 50 W, ICP power of 25 W, SF6 flow rate of 30 sccm, process pressure of 10 mTorr, and etching time of 150 s in order to produce micron structure with tapered etch profile. 15 nm thick Ag film was evaporated on the samples using e-beam evaporator with a deposition rate of 0.05 nm/s. To form Ag nanoparticles (NPs), the samples were thermally treated (thermally dewetted) in a rapid thermal annealing system at $500^{\circ}C$ for 1 min in a nitrogen environment. The Ag thickness and thermal dewetting conditions were carefully chosen to obtain isolated Ag NPs. To fabricate needle-like nanostructures on both the micron structure (i.e., sea urchin-like structures) and flat surface of silicon, MaCE process, which is based on the strong catalytic activity of metal, was performed in a chemical etchant (HNO3: HF: H2O = 4: 1: 20) using Ag NPs at room temperature for 1 min. Finally, the residual Ag NPs were removed by immersion in a HNO3 solution. The fabricated structures after each process steps are shown in figure 1. It is well-known that the hierarchical micro- and nanostructures have efficient light harvesting properties [2-3]. Therefore, this fabrication technique for production of sea urchin-like structures is applicable to improve the performance of light harvesting devices.

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Electrodeposition of Silicon in Ionic Liquid of [bmpy]$Tf_2N$

  • Park, Je-Sik;Lee, Cheol-Gyeong
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.10a
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    • pp.30.1-30.1
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    • 2011
  • Silicon is one of useful materials in various industry such as semiconductor, solar cell, and secondary battery. The metallic silicon produces generally melting process for ingot type or chemical vapor deposition (CVD) for thin film type. However, these methods have disadvantages of high cost, complicated process, and consumption of much energy. Electrodeposition has been known as a powerful synthesis method for obtaining metallic species by relatively simple operation with current and voltage control. Unfortunately, the electrodeposition of the silicon is impossible in aqueous electrolyte solution due to its low oxidation-reduction equilibrium potential. Ionic liquids are simply defined as ionic melts with a melting point below $100^{\circ}C$. Characteristics of the ionic liquids are high ionic conductivities, low vapour pressures, chemical stability, and wide electrochemical windows. The ionic liquids enable the electrochemically active elements, such as silicon, titanium, and aluminum, to be reduced to their metallic states without vigorous hydrogen gas evolution. In this study, the electrodeposion of silicon has been investigated in ionic liquid of 1-butyl-3-methylpyrolidinium bis (trifluoromethylsulfonyl) imide ([bmpy]$Tf_2N$) saturated with $SiCl_4$ at room temperature. Also, the effect of electrode materials on the electrodeposition and morphological characteristics of the silicon electrodeposited were analyzed The silicon electrodeposited on gold substrate was composed of the metallic Si with single crystalline size between 100~200nm. The silicon content by XPS analysis was detected in 31.3 wt% and the others were oxygen, gold, and carbon. The oxygen was detected much in edge area of th electrode due to $SiO_2$ from a partial oxidation of the metallic Si.

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Effects of Laser Doping on Selective Emitter Si Solar Cells (레이져를 이용한 도핑 특성과 선택적 도핑 에미터 실리콘 태양전지의 제작)

  • Park, Sungeun;Park, Hyomin;Nam, Junggyu;Yang, JungYup;Lee, Dongho;Min, Byoung Koun;Kim, Kyung Nam;Park, Se Jin;Lee, Hae-Seok;Kim, Donghwan;Kang, Yoonmook;Kim, Dongseop
    • Current Photovoltaic Research
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    • v.4 no.2
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    • pp.54-58
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    • 2016
  • Laser-doped selective emitter process requires dopant source deposition, spin-on-glass, and is able to form selective emitter through SiNx layer by laser irradiation on desired locations. However, after laser doping process, the remaining dopant layer needs to be washed out. Laser-induced melting of pre-deposited impurity doping is a precise selective doping method minimizing addition of process steps. In this study, we introduce a novel scheme for fabricating highly efficient selective emitter solar cell by laser doping. During this process, laser induced damage induces front contact destabilization due to the hindrance of silver nucleation even though laser doping has a potential of commercialization with simple process concept. When the laser induced damage is effectively removed using solution etch back process, the disadvantage of laser doping was effectively removed. The devices fabricated using laser doping scheme power conversion efficiency was significantly improved about 1% abs. after removal the laser damages.

Microstructural Observation of Multi-coated YBCO Films Prepared by TFA-MOD (TFA-MOD법으로 제조된 다층 YBCO 박막의 미세구조 관찰)

  • Jang, Seok-Hern;Lim, Jun-Hyung;Lee, Chang-Min;Hwang, Soo-Min;Choi, Jun-Hyuk;Shim, Jong-Hyun;Joo, Jin-Ho;Kim, Chan-Joong
    • Progress in Superconductivity
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    • v.9 no.2
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    • pp.167-172
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    • 2008
  • We fabricated $YBa_2Cu_3O_{7-x}$(YBCO) films on (00l) $LaAlO_3$ substrates prepared by metal organic deposition(MOD) method using trifluoroacetate(TFA) solution. The films with various thicknesses were prepared by repeating the dip-coating and calcining processes. The effects of film thickness on phase formation, microstructures, and critical properties were evaluated by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy. The microstructure and resultant critical current($I_C$) and critical current density($J_C$) varied remarkably with film thickness: The ($I_C$) value increased from 39 to 160 A/cm-width as the number of coatings increased from one to four, while the corresponding $J_C$ was measured to be in the range of $0.84-1.21\;MA/cm^2$. Both the $I_C$ and $J_C$ decreased when an additional coating was applied due to microstructural degradation, indicating that the optimum thickness is in the range of $1.1-1.8\;{\mu}m$. The possible cause for the decrease in the $I_C$ and $J_C$ value for film thicker than $1.8\;{\mu}m$ include non-uniform thickness, increased surface roughness, and the poor formability of the YBCO phase and texture arising from the insufficient heat treatment time with respect to the increased thickness.

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Evaluating the Catalytic Effects of Carbon Materials on the Photocatalytic Reduction and Oxidation Reactions of TiO2

  • Khan, Gulzar;Kim, Young Kwang;Choi, Sung Kyu;Han, Dong Suk;Abdel-Wahab, Ahmed;Park, Hyunwoong
    • Bulletin of the Korean Chemical Society
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    • v.34 no.4
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    • pp.1137-1144
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    • 2013
  • $TiO_2$ composites with seven different carbon materials (activated carbons, graphite, carbon fibers, single-walled carbon nanotubes, multi-walled carbon nanotubes, graphene oxides, and reduced graphene oxides) that are virgin or treated with nitric acid are prepared through an evaporation method. The photocatalytic activities of the as-prepared samples are evaluated in terms of $H_2$ production from aqueous methanol solution (photo-catalytic reduction: PCR) and degradation of aqueous pollutants (phenol, methylene blue, and rhodamine B) (photocatalytic oxidation: PCO) under AM 1.5-light irradiation. Despite varying effects depending on the kinds of carbon materials and their surface treatment, composites typically show enhanced PCR activity with maximum 50 times higher $H_2$ production as compared to bare $TiO_2$. Conversely, the carbon-induced synergy effects on PCO activities are insignificant for all three substrates. Colorimetric quantification of hydroxyl radicals supports the absence of carbon effects. However, platinum deposition on the binary composites displays the enhanced effect on both PCR and PCO reactions. These differing effects of carbon materials on PCR and PCO reactions of $TiO_2$ are discussed in terms of physicochemical properties of carbon materials, coupling states of $TiO_2$/carbon composites, interfacial charge transfers. Various surface characterizations of composites (UV-Vis diffuse reflectance, SEM, FTIR, surface area, electrical conductivity, and photoluminescence) are performed to gain insight on their photocatalytic redox behaviors.

A Study on Corrosion Characteristics of Multilayered WC- $Ti_{1-x}$A $l_{x}$N Coatings Deposited on AISI D2 Steel

  • Ahn, S.H.;Yoo, J.H.;Kim, J.G.;Lee, H.Y.;Han, J.G.
    • Journal of the Korean institute of surface engineering
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    • v.36 no.1
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    • pp.79-84
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    • 2003
  • $WC-Ti_{1}$ -xA $l_{x}$ N multilayered coatings are performed by their periodically repeated structures of lamellae of WC-Ti/$WC-Ti_{1}$ -xA $l_{x}$ Nmaterials. The $WC-Ti_{1}$ -xA $l_{x}$ N coatings with variable Al content were deposited onto AISI D2 steel by cathodic arc deposition (CAD) method. The electrochemical behavior of multilayered $WC-Ti_{1}$ -xA $l_{x}$ N coatings with different phases (WC- Ti$0.6/Al_{0.4}$ N, $WC-Ti_{0.53}$$Al_{0.47}$N, $WC-Ti_{0.5}$ $Al_{0.5}$ N and $WC-Ti_{ 0.43}$$Al_{0.57}$ N) was investigated in deaerated 3.5% NaCl solution at room temperature. The corrosion behaviors for the multilayered coatings were investigated by electrochemical techniques (potentiodynamic polarization) and surface analyses (X-ray diffraction (XRD), scanning electron microscopy (SEM), and glow discharge optical emission spectroscopy (GDOES)). In the petentiodynamic polarization test, the corrosion current density of $WC-Ti_{0.5}$$Al_{0.5}$N was lower than others.

Application and Functionalization of Graphene Oxide on Cotton Fabric Via Aerosol Spray Pyrolysis (그래핀 옥사이드의 에어로졸 분무열분해 공정을 통한 면직물의 전기전도성 및 물성 평가)

  • Ohm, Hyunji;Cho, Gilsoo
    • Fashion & Textile Research Journal
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    • v.24 no.1
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    • pp.138-145
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    • 2022
  • Today, graphene loaded textiles are being considered promising smart clothing due to their high conductivity. In this study, we reported reduced graphene oxide(r-GO) deposited pure cotton fabrics fabricated with a colloidal solution of graphene(GO), using a one-step aerosol spray pyrolysis(ASP) process and their potential application on smart textiles. The ASP process is advantageous in that it is easily implementable and can be applied for continuous processing. Moreover, this process has never been applied to deposit r-GO on pure cotton fabric. The field emission-scanning microscopy (FE-SEM) observation, Fourier transform-infrared(FT-IR) analysis, Raman spectroscopy, X-ray diffraction(XRD) analysis, and ultraviolet transmittance(UVT) were used to evaluate material properties of the r-GO colloids. The resistance was also measured to evaluate the electrical conductivity of the specimens. The results revealed that the r-GO was successfully deposed on specimens, and the specimen with the highest electrical conductivity demonstrated an electrical resistance value of 2.27 kΩ/sq. Taken together, the results revealed that the ASP method demonstrated a high potential for effective deposition of r-GO on cotton fabric specimens and is a prospect for the development of conductive cotton-based smart clothing. Therefore, this study is also meaningful in that the ASP process can be newly applied by depositing r-GO on the pure cotton fabric.

STI Top Profile Improvement and Gap-Fill HLD Thickness Evaluation (STI의 Top Profile 개선 및 Gap-Fill HLD 두께 평가)

  • Seong-Jun, Kang;Yang-Hee, Joung
    • The Journal of the Korea institute of electronic communication sciences
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    • v.17 no.6
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    • pp.1175-1180
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    • 2022
  • STI has been studied a lot as a process technology for wide area planarization according to miniaturization and high integration of semiconductor devices. In this study, as methods for improving the STI profile, wet etching of pad oxide using hydrofluorine solution and dry etching of O2+CF4 after STI dry etching were proposed. This process technology showed improvement in profile imbalance and leakage current between patterns according to device density compared to the conventional method. In addition, as a result of measuring the HLD thickness after CMP for a device having the same STI depth and HLD deposition, the measured value was different depending on the device density. It was confirmed that this was due to the difference in the thickness of the nitride film according to the device density after CMP and the selectivity of the slurry.