• 천문학회지
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• 제54권2호
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• pp.49-60
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• 2021

Observations of line of sight (LOS) Doppler velocity and non-thermal line width in the off-limb solar corona are often used for investigating the Alfvén wave signatures in the corona. In this study, we compare LOS Doppler velocities and non-thermal line widths obtained simultaneously from two different instruments, Coronal Multichannel Polarimeter (CoMP) and Hinode/EUV Imaging Spectrometer (EIS), on various off-limb coronal regions: flaring and quiescent active regions, equatorial quiet region, and polar prominence and plume regions observed in 2012-2014. CoMP provides the polarization at the Fe xiii 10747 Å coronal forbidden lines which allows their spectral line intensity, LOS Doppler velocity, and line width to be measured with a low spectral resolution of 1.2 Å in 2-D off limb corona between 1.05 and 1.40 RSun, while Hinode/EIS gives us the EUV spectral information with a high spectral resolution (0.025 Å) in a limited field of view raster scan. In order to compare them, we make pseudo raster scan CoMP maps using information of each EIS scan slit time and position. We compare the CoMP and EIS spectroscopic maps by visual inspection, and examine their pixel to pixel correlations and percentages of pixel numbers satisfying the condition that the differences between CoMP and EIS spectroscopic quantities are within the EIS measurement accuracy: ±3 km s-1 for LOS Doppler velocity and ±9 km s-1 for non-thermal width. The main results are summarized as follows. By comparing CoMP and EIS Doppler velocity distributions, we find that they are consistent with each other overall in the active regions and equatorial quiet region (0.25 ≤ CC ≤ 0.7), while they are partially similar to each other in the overlying loops of prominences and near the bottom of the polar plume (0.02 ≤ CC ≤ 0.18). CoMP Doppler velocities are consistent with the EIS ones within the EIS measurement accuracy in most regions (≥ 87% of pixels) except for the polar region (45% of pixels). We find that CoMP and EIS non-thermal width distributions are similar overall in the active regions (0.06 ≤ CC ≤ 0.61), while they seem to be different in the others (-0.1 ≤ CC ≤ 0.00). CoMP non-thermal widths are similar to EIS ones within the EIS measurement accuracy in a quiescent active region (79% of pixels), while they do not match in the other regions (≤ 61% of pixels); the CoMP observations tend to underestimate the widths by about 20% to 40% compared to the EIS ones. Our results demonstrate that CoMP observations can provide reliable 2-D LOS Doppler velocity distributions on active regions and might provide their non-thermal width distributions.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.375-375
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• 2010

CdTe as an absorber material is widely used in thin film solar cells with the heterostructure due to its almost ideal band gap energy of 1.45 eV, high photovoltaic conversion efficiency, low cost and stable performance. The deposition methods and preparation conditions for the fabrication of CdTe are very important for the achievement of high solar cell conversion efficiency. There are some rearranged reports about the deposition methods available for the preparation of CdTe thin films such as close spaced sublimation (CSS), physical vapor deposition (PVD), vacuum evaporation, vapor transport deposition (VTD), closed space vapor transport, electrodeposition, screen printing, spray pyrolysis, metalorganic chemical vapor deposition (MOCVD), and RF sputtering. The RF sputtering method for the preparation of CdTe thin films has important advantages in that the thin films can be prepared at low growth temperatures with large-area deposition suitable for mass-production. The authors reported that the optical and electrical properties of CdTe thin film were closely connected by the thickness-uniformity of the film in the previous study [1], which means that the better optical absorbance and the higher carrier concentration could be obtained in the better condition of thickness-uniformity for CdTe thin film. The thickness-uniformity could be controlled and improved by the some process parameters such as vacuum level and RF power in the sputtering process of CdTe thin films. However, there is a limitation to improve the thickness-uniformity only in the preparation process [1]. So it is necessary to introduce the external or additional method for improving the thickness-uniformity of CdTe thin film because the cell size of thin film solar cell will be enlarged. Therefore, the authors firstly applied the chemical mechanical polishing (CMP) process to improving the thickness-uniformity of CdTe thin films with a G&P POLI-450 CMP polisher [2]. CMP process is the most important process in semiconductor manufacturing processes in order to planarize the surface of the wafer even over 300 mm and to form the copper interconnects with damascene process. Some important CMP characteristics for CdTe were obtained including removal rate (RR), WIWNU%, RMS roughness, and peak-to-valley roughness [2]. With these important results, the CMP process for CdTe thin films was performed to improve the thickness-uniformity of the sputtering-deposited CdTe thin film which had the worst two thickness-uniformities of them. Some optical properties including optical transmittance and absorbance of the CdTe thin films were measured by using a UV-Visible spectrophotometer (Varian Techtron, Cary500scan) in the range of 400 - 800 nm. After CMP process, the thickness-uniformities became better than that of the best condition in the previous sputtering process of CdTe thin films. Consequently, the optical properties were directly affected by the thickness-uniformity of CdTe thin film. The absorbance of CdTe thin films was improved although the thickness of CdTe thin film was not changed.

• Journal of Photoscience
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• 제9권2호
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• pp.197-200
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• 2002

UVR-induced immunosuppression contributes to skin cancer. The aim was to construct accurate dose response curves for primary and secondary contact sensitivity for solar-simulated UVR (ssUVR; 290-400nm), UVA and UVB as the role of UVA in immunosuppression is controversial. We used a xenon arc source. The mice were immobilised, enabling accurate dosing. C57BL/6 mice were immunosuppressed at half the dose of ssUVR required to cause sunburn but not by higher doses (up to the sunburn dose). Thus, ssUVR causes systemic immunosuppression only over a narrow, low dose range. UVA caused suppression at low but not high doses whereas UVB induced immunosuppression at all doses tested. 8 weeks later the mice were resensitised to assess tolerance. Mice exposed to the minimum immunosuppressive dose of ssUVR prior to primary sensitisation were tolerant to re-sensitisation. However, at higher doses of ssUVR, these mice were protected from tolerance. Interestingly, while low doses of UV A caused immunosuppression, even lower doses enhanced the response to the second sensitisation. Higher doses of UVA had no affect. UVB induced tolerance in a dose related manner. Thus, ssUVR only induces immunosuppression and tolerance over a narrow dose range. Both UVA and UVB are immunosuppressive at this dose, while higher doses of UVA protect from the suppressive effects of UVB. Surprisingly very low doses of UVA enhanced memory development. Thus UVR has complex effects on the immune system depending on dose and spectrum.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2010년도 추계학술대회 초록집
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• pp.57.2-57.2
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• 2010

투명전도 산화막(Transparent conducing oxide: TCO)은 태양 전지, 터치패널, 가스 센서 등 여러 분야에 적용할 수 있는 물질로서 전기 전도성과 광 투과성을 동시에 가진다. 높은 전기 전도성과 광 투과성을 가지는 Sb:$In_2O_3$(ITO)는 투명전도 산화막 재료로써 가장 일반적으로 사용되고 있으나 인듐의 매장량 한계로 인해 가격이 높다는 단점이 있다. 본 연구에서는 ITO 대체 TCO 물질인 Al doped ZnO(AZO)를 rf magnetron sputter를 이용하여 최적의 수소 도핑량을 찾아 ITO의 전기적 광학적 성질과 비교하였다. AZO 박막은(ZnO:Al2O3 2wt.%)타겟을 이용하여 heater 온도 250도에서 슬라이드 글래스 및 코닝 글래스에 증착시켰고 비교군인 ITO박막은 (In2O3:$SnO_2$ 10wt.%)타겟을 이용하여 수소 도핑 없이 350도로 증착시켰다. AZO 및 ITO 박막의 전기적 특성은 hall measurement를 이용하여 측정하였고, UV-VIS spectrophotometer로 광학적 특성을 측정하였다. 수소 도핑량이 증가함에 따라 AZO 박막의 캐리어 농도가 증가하여 전기적 특성이 향상되었고, 가시광 영역에서 높은 평균 투과도를 유지 하였다. AZO 박막과 ITO 박막의 전기적 및 광학적 특성을 비교한 결과, 최적 수소 도핑량을 가진 AZO 박막은 ITO 박막에 준하는 특성을 보였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.393-393
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• 2012

Optically active nanostructures such as subwavelength moth-eye antireflective structures or surface enhanced Raman spectroscopy (SERS) active structures have been demonstrated to provide the effective suppression of unwanted reflections as in subwavelength structure (SWS) or effective enhancement of selective signals as in SERS. While various nanopatterning techniques such as photolithography, electron-beam lithography, wafer level nanoimprinting lithography, and interference lithography can be employed to fabricate these nanostructures, roll-to-roll (R2R) nanoimprinting is gaining interests due to its low cost, continuous, and scalable process. R2R nanoimprinting requires a master to produce a stamp that can be wrapped around a quartz roller for repeated nanoimprinting process. Among many possibilities, two different types of mask can be employed to fabricate optically active nanostructures. One is self-assembled Au nanoparticles on Si substrate by depositing Au film with sputtering followed by annealing process. The other is monolayer silica particles dissolved in ethanol spread on the wafer by spin-coating method. The process is optimized by considering the density of Au and silica nano particles, depth and shape of the patterns. The depth of the pattern can be controlled with dry etch process using reactive ion etching (RIE) with the mixture of SF6 and CHF3. The resultant nanostructures are characterized for their reflectance using UV-Vis-NIR spectrophotometer (Agilent technology, Cary 5000) and for surface morphology using scanning electron microscope (SEM, JEOL JSM-7100F). Once optimized, these optically active nanostructures can be used to replicate with roll-to-roll process or soft lithography for various applications including displays, solar cells, and biosensors.

• 동의생리병리학회지
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• 제31권2호
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• pp.105-110
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• 2017

Prolonged exposure to solar ultraviolet A (UVA) radiation has been known to cause premature skin aging (photo-aging). UVA radiation generates ROS thereby induce degenerative changes of skin such as degradation of dermal collagen, elastic fibers. Matrix metalloproteinases (MMPs), the proteolytic enzymes have been implicated as a major player in the development of UVA-induced photo-aging. Many studies have been conducted to block the harmful effects of UV radiation on the skin. Recently, we are interested in the availability of fermented red ginseng (FRG) as natural matrix metalloproteinases inhibitors (MMPIs). The efficacy difference between red ginseng and FRG has been compared. Both RG and FRG have no cytotoxic effects below the concentration of $300{\mu}g/ml$. Human dermal fibroblasts (HDFs) were pretreated with FRG or RG for 24h, followed by irradiation of UVA. Then, we measured the intracellular ROS production and the expression of MMP, $IL-1{\beta}$ at the mRNA level. We also examined the intracellular localization of $NF-{\kappa}B$ and MMP-9 on the FRG or RG treated and UVA-irradiated HDFs. FRG decreased the intracellular ROS production elicited by UVA. In addition, FRG decreased the mRNA expression of MMP-3, MMP-9, and $IL-1{\beta}$ more efficiently than RG. Furthermore, FRG suppressed the nuclear localization of $NF-{\kappa}B$, and the expression of MMP-9. Taken together, our results suggest that FRG is promising agents to prevent UVA-induced photo-aging by suppressing MMP expression and inflammation.

• 공업화학
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• 제10권7호
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• pp.1035-1040
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• 1999

자외선 조사하에서 $TiO_2$를 촉매로 하여 trichloroethylene의 광분해반응을 행하였다. 여러 가지 $TiO_2$ 촉매의 활성을 비교하였고, 반응조건에 따른 광분해 활성을 조사하였다. 또한 빛의 세기에 따른 분해활성과 반응물에 첨가된 물의 영향을 조사하였다. 여러 가지 $TiO_2$ 촉매에서 P-25가 가장 높은 활성을 보였고, anatase형이 rutile형보다 높은 활성을 보였다. 또한 반응물의 유속이 느릴수록 또한 초기농도가 낮을수록 trichloroethylene의 분해 반응 활성은 증가하였고, 산화제로서 공기를 사용하는 것이 효과적이었다. 한편 반응물에 첨가된 물은 촉매의 활성을 감소시켰고, 빛의 세기가 증가할수록 분해 반응속도가 증가하였으나 태양광에 의해서는 분해율이 매우 낮았다. trichloroethylene의 농도가 낮을 경우에는 촉매의 활성저하가 거의 일어나지 않았다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.433-433
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• 2009

ZnO-based materials have been extensively studied for optoelectronic applications due to their superiors physical properties such as wide direct bandgap (~3.37 eV), large exciton binding energy (~60 meV), high transparency in the visible region, and low cost. Especially, one-dimensional (1D) ZnO nanostructures have attracted considerable attention owing to quantum confinement effect and high crystalline quality. Additionally, various nanostructures of ZnO such as nanorods, nanowires, nanoflower, and nanotubes have stimulated the interests because of their semiconducting. and piezoelectric properties. Among them, vertically aligned ZnO nanorods can bring the improved performance in various promising photoelectric fields including piezo-nanogenerators, UV lasers, dye sensitized solar cells, and photo-catalysis. In this work, we studied the effect of the annealing temperature of homo seed layers on the formation of ZnO nanorods grown by hydrothermal method. The effect of annealing temperature of seed layer on the length and orientation of the nanorods was investigated scanning electron microscopy investigation. Transmission electron microscopy and X-ray diffraction measurement were performed to understand the effect of annealing temperatures of seed layers on the formation of nanorods. Moreover, the optical properties of the seed layers and the nanorods were studied by room temperature photoluminescence.

• 한국결정성장학회지
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• 제21권5호
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• pp.205-209
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• 2011

ZnO는 반도전성과 초전도성을 나타내며 광학적으로도 독특한 재료로 가스센서, 태양전지, 광학도파관 등 여러 방면에 널리 활용되고 있다. 본 논문에서는 이러한 ZnO에 Al을 첨가함에 따라 광학적 특성에 어떠한 영향을 미치는지 알아보기 위하여 ZnO에 Al 첨가량 변화에 따른 나노구조체를 제작하여 특성을 비교하였다. ZnO 용액은 PVP, ethanol, zinc acetate를 이용하여 Sol의 형태로 제작하였으며, Al첨가용액을 넣어 Al이 첨가된 ZnO Sol을 제작하였다. 제작된 Sol을 전기 방사법을 이용하여 나노구조체를 제조하였다. 제조된 섬유들을 각각 300, 500, $700^{\circ}C$로 열처리 한 후 나노 구조체를 XRD, XPS, SEM을 이용하여 분석하였다. 또한 TGA, DSC를 이용하여 온도변화에 따른 질량 및 열량의 변화를 측정하였다. UVvis를 이용하여 ZnO와 Al이 첨가된 ZnO의 흡광도를 측정 비교하였다.

• 한국전기전자재료학회논문지
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• 제27권9호
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• pp.589-593
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• 2014

AlNO multi-layer thin films on aluminum substrates were prepared by DC reactive magnetron sputtering method. $Al_2O_3$/AlNO(LMVF)/AlNO(HMVF)/Al/substrate of 4 multi-layer has been prepared in an Ar and ($N_2+O_2$) gas mixture, and $Al_2O_3$ of top layer is anti-reflection layer on double AlNO(LMVF)/AlNO(HMVF) layers and Al metal of infrared reflection layer. In this study, the roughness and surface properties of AlNO thin films were estimated by field emission scanning electron microscopy(FE-SEM). The grain size of AlNO thin films increased with increasing sputtering power. The composition of thin films has been systematically investigated using electron probe microanalysis(EPMA). The optical properties with wavelength spectrum were recorded by UV-Vis-NIR spectrophotometry at a range of 200~1,500 nm. The absorptance of AlNO films shows the increasing trend with swelling ($N_2+O_2$) gas mixture in HMVF and LMVF deposition. The excellent optical performance showed above 98% of absorptance in visible wavelength region.