• 제목/요약/키워드: single crystal thin films

검색결과 297건 처리시간 0.031초

Room Temperature Growth of Magnetite Films on Arachic Acid Monomolecular Layers

  • Ishihara, Takashi;Kitamoto, Yoshitaka;Shirasaki, Fumio;Abe, Masanori
    • The Korean Journal of Ceramics
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    • 제6권4호
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    • pp.401-404
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    • 2000
  • Mimicking the bacterial synthesis of magnetosomes, in which the functionalized surface of a cytoplasmic (lipid) membrane is considered to be stimulating the crystal growth of magnetite, we have successfully grown magnetite films at $30^{\circ}C$ using an arachic acid monomolecular layer as a functionalized surface. The lipid monomolecular layer was spread on an aqueous solution of FeCl$_2$ which was oxidized by flowing a mixed gas, with ratio $O_2$/$N_2$=1/2000, on the surface of the lipid layer. Mossbauer and X-ray diffraction analyses revealed that the Fe$_3$O$_4$ films contain small amounts of ferric hydroxyl impurity phases of ${\alpha}$-FeOOH and ${\tau}$-FeOOH. This is because the oxygen partial pressure at the ferrite/aqueous interface changed as the film (through which the gas penetrated) increased in thickness. Methods to obtain single phase magnetite films are proposed.

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MOCVD 법에 의해 증착 된 coated conductor용 $YBa_{2}$$Cu_{3}$$O_{7-x}$의 증착조건 (Deposition conditions of $YBa_{2}$$Cu_{3}$$O_{7-x}$ deposited by a MOCVD method for coated conductors)

  • 선종원;전병혁;김찬중
    • 한국초전도저온공학회:학술대회논문집
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    • 한국초전도저온공학회 2003년도 추계학술대회 논문집
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    • pp.83-86
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    • 2003
  • YBa$_2$Cu$_3$$O_{7-x}$ thin films for coated conductor application were deposited on a MgO single crystalline substrate by a metal organic chemical vapor deposition (MOCVD) system of a vertical type using a single liquid source. The film uniformity was enhanced by controlling the gas shower head structure, the distance between the shower head and substrate, and the rotation of the substrate. The source mole ratio of Y(thd)$_3$: Ba(thd)$_2$: Cu(thd)$_2$ was changed for obtaining stoichiometric film. The phase formation, crystal orientation, surface morphology and film composition were investigated with different source mole ratios, and the critical temperature (T$_{c}$) was measured.red.

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New Ruthenium Complexes for Semiconductor Device Using Atomic Layer Deposition

  • Jung, Eun Ae;Han, Jeong Hwan;Park, Bo Keun;Jeon, Dong Ju;Kim, Chang Gyoun;Chung, Taek-Mo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.363-363
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    • 2014
  • Ruthenium (Ru) has attractive material properties due to its promising characteristics such as a low resistivity ($7.1{\mu}{\Omega}{\cdot}cm$ in the bulk), a high work function of 4.7 eV, and feasibility for the dry etch process. These properties make Ru films appropriate for various applications in the state-of-art semiconductor device technologies. Thus, it has been widely investigated as an electrode for capacitor in the dynamic random access memory (DRAM), a metal gate for metal-oxide semiconductor field effect transistor (MOSFET), and a seed layer for Cu metallization. Due to the continuous shrinkage of microelectronic devices, better deposition processes for Ru thin films are critically required with excellent step coverages in high aspect ratio (AR) structures. In these respects, atomic layer deposition (ALD) is a viable solution for preparing Ru thin films because it enables atomic-scale control of the film thickness with excellent conformality. A recent investigation reported that the nucleation of ALD-Ru film was enhanced considerably by using a zero-valent metallorganic precursor, compared to the utilization of precursors with higher metal valences. In this study, we will present our research results on the synthesis and characterization of novel ruthenium complexes. The ruthenium compounds were easy synthesized by the reaction of ruthenium halide with appropriate organic ligands in protic solvent, and characterized by NMR, elemental analysis and thermogravimetric analysis. The molecular structures of the complexes were studied by single crystal diffraction. ALD of Ru film was demonstrated using the new Ru metallorganic precursor and O2 as the Ru source and reactant, respectively, at the deposition temperatures of $300-350^{\circ}C$. Self-limited reaction behavior was observed as increasing Ru precursor and O2 pulse time, suggesting that newly developed Ru precursor is applicable for ALD process. Detailed discussions on the chemical and structural properties of Ru thin films as well as its growth behavior using new Ru precursor will be also presented.

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산소가 혼입된 Cr 박막의 질화처리에 따른 구조적 특성 (Structural Properties of Ammoniated Thin Cr Films with Oxygen Incorporated During Deposition)

  • 김준;변창섭;김선태
    • 한국재료학회지
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    • 제24권4호
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    • pp.194-200
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    • 2014
  • Metallic Cr film coatings of $1.2{\mu}m$ thickness were prepared by DC magnetron sputter deposition method on c-plane sapphire substrates. The thin Cr films were ammoniated during horizontal furnace thermal annealing for 10-240 min in $NH_3$ gas flow conditions between 400 and $900^{\circ}C$. After annealing, changes in the crystal phase and chemical constituents of the films were characterized using X-ray diffraction (XRD) and energy dispersive X-ray photoelectron spectroscopy (XPS) surface analysis. Nitridation of the metallic Cr films begins at $500^{\circ}C$ and with further increases in annealing temperature not only chromium nitrides ($Cr_2N$ and CrN) but also chromium oxide ($Cr_2O_3$) was detected. The oxygen in the films originated from contamination during the film formation. With further increase of temperature above $800^{\circ}C$, the nitrogen species were sufficiently supplied to the film's surface and transformed to the single-phase of CrN. However, the CrN phase was only available in a very small process window owing to the oxygen contamination during the sputter deposition. From the XPS analysis, the atomic concentration of oxygen in the as-deposited film was about 40 at% and decreased to the value of 15 at% with increase in annealing temperature up to $900^{\circ}C$, while the nitrogen concentration was increased to 42 at%.

단결정 형성을 위한 열역학 분석 (Analysis of Thermodynamics for Single Crystal Formation)

  • 천민우;양승호;박용필
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 학술대회 및 기술세미나 논문집 디스플레이 광소자
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    • pp.70-73
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    • 2006
  • High quality $Bi_2Sr_2Ca_nCu_{n+1}O_x$ superconducting thin films fabricated by using the evaporation method at various substrate temperatures, $T_{sub}$, and ozone gas pressures, $pO_3$. The correlation diagrams of the $Bi_2Sr_2Ca_nCu_{n+1}O_x$ phases with $T_{sub}$ and $pO_3$ are established in the 2212 arid 2223 compositional films. In spite of 2212 compositional sputtering, Bi2201 and Bi2223 as well as Bi2212 phases come out as stable phases depending on $T_{sub}$ and $pO_3$. From these results, the thermodynamic evaluation of ${\Delta}H$ and ${\Delta}S$, which are related with Gibbs' free energy change for single Bi2212 or Bi2223 phase, was performed.

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다결정 및 박막형 $Sr_2Nb_2O_7$의 입자배향과 전기적특성 (Grain Orientation and Electrical Properties of $Sr_2Nb_2O_7$ Ceramics and Thin Films)

  • 손창헌;전상재;남효덕;이희영
    • 한국전기전자재료학회논문지
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    • 제11권4호
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    • pp.274-280
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    • 1998
  • Polycrystalline $Sr_2Nb_2O_7$ ceramics with very high Curie temperature were sintered using the powder derived by the chemical coprecipitation method (CCP). The phase evolution and grain-orientation of sintered samples were examined by XRD, while sintering behavior, dielectric properties and polarization were studied by SEM and ferroelectric tester. Extremely high degree of grain-orientation was observed along the (0k0) direction, which resulted in anisotropic dielectric properties of the sintered samples, with the dielectric constant values approaching those for single crystal. Thin film fabrication of $Sr_2Nb_2O_7$ in the pyroniobate family was also attempted on $SiO_2$/Si(100), Pt/$SiO_2$/Si(100), Pt/Ti/$SiO_2$/Si(100) and Pt/$ZrO_2/SiO_2/Si_2(100)$ substrates, using metalorganic decomposition (MOD) process. Neodecanoate precursor solution was prepared by mixing strontium neodecanoate with niobium neodecanoate synthesized from niobium ethoxide. It was found that $Sr_2Nb_2O_7$ single phase appeared in XRD patterns the samples annealed above $950^{\circ}C$. The effect of substrate type on film microstructure and dielectric properties was observed.

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YBCO PLD 타겟에 BZO 나노분말 첨가에 따른 PLD-YBCO 박막의 자속고정 효과 (The Effect of the Addition of BZO Nanopowder in the YBCO PLD Targets on the Flux Pinning Properties of BZO-YBCO Thin Film)

  • 송규정;고락길;이영석;박유미;양주생;김호섭;하홍수;하동우;김석환;오상수;김덕진;박찬;유상임
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.20-21
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    • 2005
  • [ $BaZrO_3$ ], nanopowder was added to YBCO powder to make ($BazrO_3)_x(YBCO)_{(100-x)mol.-%}$ ($BZO_x$-YBCO) ($0{\leq}x{\leq}10$) composite targets fur pulsed laser deposition of superconducting layer in order to investigate the effect of the addition of BZO nanopowder in the YBCO target on the flux pinning properties of $BZO_x$-YBCO thin films. All the $BZO_x$-YBCO thin films were grown on single crystal STO substrate under similar conditions in the PLD chamber. The effect of YBCO targets doped with BZO on the flux pinning properties of $BZO_x$-YBCO thin films has been investigated comparatively. The isothermal magnetizations M(H) of the films were measured at temperatures between 5 and 80 K in fields up to 5 T, employing a PPMS. The optimal amount of BZO nanopowders in $BZO_x$-YBCO thin films to obtain the strongest flux pinning effects at high magnetic fields is about 6 mol.-%.

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HVPE법으로 성장시킨 GaN의 극성 분석 (Investigation of the Polarity in GaN Grown by HVPE)

  • 정회구;정수진
    • 한국결정학회지
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    • 제14권2호
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    • pp.93-104
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    • 2003
  • The crystals of group-Ⅲ nitride semiconductors with wurtzite structure exhibit a strong polarity. Especially, GaN has characteristics of different growth rate, anisotropic electrical and optical properties due to the polarity. In this work, GaN epilayer was grown and the polarities of the crystals were observed by the chemical wet etching and SP-EFM. GaN thin films were deposited on c-plane A1₂O₃ substrate under the variations of growth conditions by HVPE such as the deposition temperature of the buffer layer, the deposition time, the ratio of Group-V and Ⅲ and the deposition temperature of the film. The adquate results were obtained under the conditions of 500℃, 90 seconds, 1333 and 1080℃, respectively. It is observed that the GaN layer grown without the buffer layer has N-polarity and the GaN layer grown on the buffer layer has Ga-polarity. Fine crystal single particles were grown on c-plane A1₂O₃ and SiO₂, layer. The external shape of the crystal shows {10-11}{10-10}(000-1) planes as expected in the PBC theory and anisotropic behavior along c-axis is obvious. As a result of etching on each plane, (000-1) and {10-11}planes were etched strongly due to the N-polarity and {10-10} plane was not affected due to the non-polarity. In the case of the crystal grown on c-plane A1₂O₃, two types of crystals were grown. They were hexagonal pyramidal-shape with {10-11}plane and hexagonal prism with basal plane. The latter might be grown by twin plane reentrant edge (TPRE) growth.

페라이트 도금법에 의한 $Ni_xFe_{3-x}O_4$ 박막의 제조와 자기적 성질 (Preparation of$Ni_xFe_{3-x}O_4$ Films by the Ferrite Plating and Their Magnetic Properties)

  • 하태욱;이정식;김일원
    • 한국자기학회지
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    • 제8권5호
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    • pp.295-299
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    • 1998
  • 페라이트 도금 방법은 진공이 불필요하며 저온(<10$0^{\circ}C$)에서 페라이트 박막을 제작할 수 있다. 이 방법으로 기판온도 8$0^{\circ}C$, 산화용액의 pH 7.1~8.8 영역에서 모두 스피넬 구조의 NixFe3-xO4 (x=0.162~0.138) 박막을 얻었다. 이들은 열처리를 하지 않았음에도 불구하고 결정성이 우수한 다결정의 박막을 얻었다. 박막의 성장속도는 산화용액의 pH가 7.1에서 8.8까지 변함에 따라 성장속도가 143$\AA$/min에서 255 $\AA$/min 까지 증가하였다. 산화용액의 pH가 증가할수록 입경의 크기가 증가하고, 보자력은 감소하였다.

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늦은 용액증발법으로 제작한 유기단결정 para-toluene sulfonate의 비선형 광학상수 측정 (Measurement of nonlinear optical constant of organic single crystal para-toluene sulfonate prepared by slow solution evaporation method)

  • 황보창권
    • 한국광학회지
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    • 제9권2호
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    • pp.76-85
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    • 1998
  • 서서히 용액을 증발시키는 늦은 용액증발법을 이용하여 유기단결정 p-toluene sulfonate(PTS) 덩어리와 박막을 제작하였다. 유기 단결정 PTS 덩어리는 Z-scan 방법을 이용하여 1600 nm, 95fs 레이저 광으로 3차와 5차 비선형 굴절률 $n_{2}$$n_{3}$를 측정하였으며, PTS 박막 도파관에서는 다중모드 출력을 관측하였다. 입력광의 세기가 2~5 GW/$cm^{2}$영역에서 PTS의 비선형 광학계수는 $n_{2}=6{\times}10^{-4}cm^{2}$/GW, $n_{3}=-7{\times}10^{-5}cm^{4}/GW^{2}$이고 2광자 흡수와 3광자 흡수는 없었다. 빛의 세기가 강한 5~16 GW/$cm^{2}$영역에서는 비선형 슈레딩거식과 빠른 푸리에변환 광전파방법을 이용하여 시료 내에서 전파광의 모양이 가우시안 광에서 왜곡되어 전파되는 것을 전산모의하였다.

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