• Journal of the Korean Vacuum Society
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• v.21 no.1
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• pp.48-54
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• 2012

Carbon coils could be synthesized on nickel catalyst layer-deposited silicon oxide substrate using $C_2H_2$ and $H_2$ as source gases and SF6 as an additive gas under thermal chemical vapor deposition system. The geometries of as-grown carbon materials were investigated with increasing the reaction temperature as the increment of $25^{\circ}C$ from $650^{\circ}C$ up to $800^{\circ}C$. At $650^{\circ}C$, the embryos for carbon coils were formed. With increasing the reaction temperature to $700^{\circ}C$, the coil-type geometries were developed. Further increasing the reaction temperature to $775^{\circ}C$, the development of wave-like nano-sized coils, instead of nano-sized coils, and occasional appearance of micro-sized carbon coils could be observed. Fluorine in $SF_6$ additive may shrink the micro-sized coil diameter via the reduction of Ni catalyst size by fluorine's etching role. Finally, the preparation of the micro-sized carbon coils having the smaller coil diameters, compared with the previously reported ones, could be possible using $SF_6$ additive.

• Korean Journal of Materials Research
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• v.8 no.7
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• pp.634-640
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• 1998

A well- shaped trench was investigated in view of the defect distribution along trench sidewall and bottom using high resolution transmission electron microscopy. The trench was formed by HBr plasma and additive gases in magnetically enhanced reactive ion etching system. Adding $0_2$ and other additive gases into HBr plasma makes it possible to eliminate sidewall undercut and lower surface roughness by forming the passivation layer of lateral etching, resulted in the well filled trench with oxide and polysilicon by subsequent deposition. The passivation layer of lateral etching was mainly composed of $SiO_xF_y$ $SiO_xBr_y$ confirmed by chemical analysis. It also affects the generation and distribution of lattice defects. Most of etch induced defects were found in the edge region of the trench bottom within the depth of 10$\AA$. They are generally decreased with the thickness of residue layer and almost disappeared below the uni¬formly thick residue layer. While the formation of crystalline defects in silicon substrate mainly depends on the incident angle and energy of etch species, the region of surface defects on the thickness of residue layer formed during trench etching.

• Journal of Magnetics
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• v.11 no.4
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• pp.195-207
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• 2006

The recently published and new results on design and fabrication of magnetophotonic crystals of different dimensionality are surveyed. Coupling of polarized light to 3D photonic crystals based on synthetic opals was studied in the case of low dielectric contrast. Transmissivity of opals was demonstrated to strongly depend on the propagation direction of light and its polarization. It was shown that in a vicinity of the frequency of a single Bragg resonance in a 3D photonic crystal the incident linearly polarized light excites inside the crystal the TE- and TM-eigen modes which passing through the crystal is influenced by Brags diffraction of electromagnetic field from different (hkl) sets of crystallographic planes. We also measured the faraday effect of opals immersed in a magneto-optically active liquid. It was shown that the behavior of the faraday rotation spectrum of the system of the opal sample and magneto-optically active liquid directly interrelates with transmittance anisotropy of the opal sample. The photonic band structure, transmittance and Faraday rotation of the light in three-dimensional magnetophotonic crystals of simple cubic and face centered cubic lattices formed from magneto-optically active spheres where studied by the layer Korringa-Kohn-Rostoker method. We found that a photonic band structure is most significantly altered by the magneto-optical activity of spheres for the high-symmetry directions where the degeneracies between TE and TM polarized modes for the corresponding non-magnetic photonic crystals exist. The significant enhancement of the Faraday rotation appears for these directions in the proximity of the band edges, because of the slowing down of the light. New approaches for one-dimensional magnetophotonic crystals fabrication optimized for the magneto-optical Faraday effect enhancement are proposed and realized. One-dimensional magnetophotonic crystals utilizing the second and the third photonic band gaps optimized for the Faraday effect enhancement have been successfully fabricated. Additionally, magnetophotonic crystals consist of a stack of ferrimagnetic Bi-substituted yttrium-iron garnet layers alternated with dielectric silicon oxide layers of the same optical thickness. High refractive index difference provides the strong spatial localization of the electromagnetic field with the wavelength corresponding to the long-wavelength edge of the photonic band gap.

• Journal of the Korean Ceramic Society
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• v.52 no.6
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• pp.410-416
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• 2015

Recently, a new $Y_2O_3$ coating deposited using the EB-PVD method has been developed for erosion resistant applications in fluorocarbon plasma environments. In this study, surface crack formation in the $Y_2O_3$ coating has been analyzed in terms of residual stress and elastic modulus. The coating, deposited on silicon substrate at temperatures higher than $600^{\circ}C$, showed itself to be sound, without surface cracks. When the residual stress of the coating was measured using the Stoney formula, it was found to be considerably lower than the value calculated using the elastic modulus and thermal expansion coefficient of bulk $Y_2O_3$. In addition, amorphous $SiO_2$ and crystalline $Al_2O_3$ coatings were similarly prepared and their residual stresses were compared to the calculated values. From nano-indentation measurement, the elastic modulus of the $Y_2O_3$ coating in the direction parallel to the coating surface was found to be lower than that in the normal direction. The lower modulus in the parallel direction was confirmed independently using the load-deflection curves of a micro-cantilever made of $Y_2O_3$ coating and from the average residual stress-temperature curve of the coated sample. The elastic modulus in these experiments was around 33 ~ 35 GPa, which is much lower than that of a sintered bulk sample. Thus, this low elastic modulus, which may come from the columnar feather-like structure of the coating, contributed to decreasing the average residual tensile stress. Finally, in terms of toughness and thermal cycling stability, the implications of the lowered elastic modulus are discussed.

• Journal of the Korean earth science society
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• v.22 no.3
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• pp.208-222
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• 2001

Geochemical investigations on suspended amorphous iron oxide material from the Kwangyang gold mine and its surrounding area, Cheonnam, Korea have been carried out. The sediments samples were collected from 11 location along Kwangyang mine area and were air dried and sieved to -80 mesh. These samples consist mainly of iron, silicon and alumina. The Fe$_2$O$_3$ contents ranges from 17.9 wt.% to 72.3 wt.%. The content of Fe$_2$O$_3$ increase with decreasing Si, Al, Mg, Na, K, Mn, and Ti, whereas the contents of Te, Au, Ga, Bi, Cd, Hg, Sb, and Se increase in the amorphous stream sediments. Amorphous stream sediments have been severely enriched for As (up to 54.9 ppm), Bi (up to 3.77 ppm), Cd (up to 3.65 ppm), Hg (up to 64 ppm), Sb (up to 10.1 ppm), Cu (up to 37.1 ppm), Mo (up to 8.86 ppm), Pb (up to 9.45 ppm) and Zn (up to 29.7 ppm). At the upstream site, the Au content (up to 4.4 ppm) in the amorphous stream sediments are relatively high but those contents decrease with distance of mine location. The content of Ag (up to 0.24 ppm) were low in upstream site but those contents increase significantly in the downstream sites. The X-ray diffraction patterns of the samples have virtually no sharp and discrete peaks, indicating that some samples are amorphous or poorly-ordered. The quartz, goethite, kaolinite and illite were associated in amorphous stream sediments. The infrared spectra for amorphous stream sediments show major absorption bands due to OH stretching, adsorbed molecular water, sulfate and Fe-O stretching, respectively.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.6
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• pp.30-37
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• 1989

The PIN type a-SiC:H/a-Si:H heterojunction solar cells were fabricated by using the rf glow discharge decomposition of $SiH_4$ mixed with $CH_4,B_2,H_6\;and\;PH_3.$ The efficiency of the solar cell of the $SnO_2/ITO$ was higher than that of ITO transparent oxide layer by 1.5%. The P layer was prepared with the thickness of $100{\AA}$ and $CH_4/SiH_4$ ration of 5. The I layer has been deposited on the P layer and it is not pure intrinsic but near N type. So $SiH_4$ mixed with $B_2H_6$ of 0.3ppm was used to change this N type nature to intrinsic having the thickness of 5000${\AA}$. And consecutively, the N layer was deposited with t ethickness of $400{\AA}$ using $SiH_4/PH_3$ mixtures. The solar cell demonstrated 0.94V of $V_{oc'}$ 14.6mA/cm of $J_{sc}$ and 58.2% of FF, resulting the efficiency of 8.0%. To minimize loss by the reflection of light, $MgF_2$ layer was coated on the lgass and the efficiency was improved by 0.5%. Therefore, the solar cell indicated overall efficiency of 8.5%.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.348-348
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• 2014

차세대 디스플레이 구동 회로 소자를 위한 재료로서, Amorphous Oxide Semiconductor (AOS)가 주목받고 있다. AOS는 기존의 Amorphous Silicon과 비교하여 뛰어난 이동도를 가지고 있으며, 넓은 밴드 갭에 의한 투명한 광학적 특성을 가지고 있다. 이러한 장점을 이용하여, AOS 박막은 thin film transistor (TFT)의 active channel로 이용 되고 있다. 하지만, AOS를 이용한 TFT의 경우, 시간이 경과함에 따라 $O_2$ 및 $H_2O$ 흡착에 의해 전기적 특성이 변하는 현상이 있다. 이러한 현상은 소자의 신뢰성에 있어 중요한 문제가 된다. 이러한 문제를 연구하기 위해 본 논문에서는, AOS 박막을 이용하여 bottom 게이트형 TFT를 제작하였다. 이를 위해 먼저, p-type Si 위에 건식산화방식으로 $SiO_2$(100 nm)를 성장시켜 게이트 산화막으로 이용하였다. 그리고 Zn과 Sn이 1: 2의 조성비를 가진 ZnSnO (ZTO) 용액을 제조한 후, 게이트 산화막 위에 spin coating 하였다. Splin coating된 용액에 남아 있는 솔벤트를 제거하기 위해 10분 동안 $230^{\circ}C$로 열처리를 한 후, 포토리소그래피와 에칭 공정을 이용하여 ZTO active channel을 형성하였다. 그 후, 박막 내에 남아 있는 불순물을 제거하고 ZTO TFT의 전기적인 특성을 향상시키기 위하여, $600^{\circ}C$의 열처리를 30분 동안 진행 하여 junctionless형 TFT 제작을 완료 하였다. 제작된 소자의 시간 경과에 따른 열화를 확인하기 위하여, 대기 중에서 2시간마다 HP-4156B 장비를 이용하여 전기적인 특성을 확인 하였으며, 이러한 열화는 후처리 공정을 통하여 회복시킬 수 있었다. 열화의 회복을 위한 후처리 공정으로, 퍼니스를 이용한 고온에서의 열처리와 microwave를 이용하여 저온 처리를 이용하였다. 결과적으로, TFT는 소자가 제작된 이후, 시간에 경과함에 따라서 on/off ratio가 감소하여 열화되는 경향을 보여 주었다. 이러한 현상은, TFT 소자의 ZTO back-channel에 대기 중에 있는 $O_2$ 및 $H_2O$의 분자의 물리적인 흡착으로 인한 것으로 보인다. 그리고 추가적인 후처리 공정들에 통해서, 다시 on/off ratio가 회복 되는 현상을 확인 하였다. 이러한 추가적인 후처리 공정은, 열화된 소자에 퍼니스에 의한 고온에서의 장시간 열처리, microwave를 이용한 저온에서 장시간 열처리, 그리고 microwave를 이용한 저온에서의 단 시간 처리를 수행 하였으며, 모든 소자에서 성공적으로 열화 되었던 전기적 특성이 회복됨을 확인 할 수 있었다. 이러한 결과는, 저온임에도 불구하고, microwave를 이용함으로 인하여, 물리적으로 흡착된 $O_2$ 및 $H_2O$가 짧은 시간 안에 ZTO TFT의 back-channel로부터 탈착이 가능함과 동시에 소자의 특성을 회복 가능 함 의미한다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.6 no.1
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• pp.78-82
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• 2005

Display manufacturing process has adopted RCA cleaning, applying to larger area and coping with environmental issue for last ten years. However, the approaching concept of ozonized, hydrogenised, or electrolyzed water cleaning technologies is within RCA clean paradigm. In this work, only electrolyzed anode water was applied to clean particles and organics as well as metals based on Pourbaix concept, and as a test vehicle, MgO particles were introduced to prove the new concept. The electrolyzed anode water is very oxidative with high oxidation reduction potential (ORP) and low in pH of more than 900 mV and 3.1, respectively. MgO particles were immersed in the anode water and its weight losses due to dissolution were measured with time. Weight losses were in the ranges of 100 to 500 micrograms in 250 ml anode water depending on their ORP and pH. Therefore it was concluded that the cleaning radicals in the anode water was at least in the range of 1 to $5{\times}10^{20}$ ea per 250 ml anode water equivalent to $1{\times}10^{18} ea/cm^2$. Hence it can be assumed that the anode water applied to display cleaning from now on $1{\times}10^{10}$ to $1{\times}10^{15} ea/cm^2$ ranges of contaminants are being treated. In addition, it was observed that anode water did not develop micro-roughness on hydrophobic surface while it did on the native silicon oxide.

• Journal of Korean Society of Environmental Engineers
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• v.37 no.12
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• pp.668-673
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• 2015

Alumina-based catalysts with different Ce loadings were studied in the decomposition of $CF_4$ using microwave heating system. Heating material of microwave system used Silicon Carbide. The crystallographic phases of catalysts were investigated by XRD and decomposition rates of $CF_4$ were examined by GC-TCD. The catalysts of 10 wt% Ce modified $Al_2O_3$ showed higher $CF_4$ decomposition rate than un-modified $Al_2O_3$ for $500^{\circ}C$ reaction temperature. The k value of catalysts shows the order of $Ce(20)/Al_2O_3=Ce(0)/Al_2O_3<Ce(5)/Al_2O_3<Ce(10)/Al_2O_3$. XRD patterns of $Ce(0)/Al_2O_3$ were no difference before and after the reaction and showed $Al_2O_3$ phases. With the increase in Ce loadings, $CeO_2$, $AlF_3$ of XRD peaks was observed. The results was indicated that Ce modifed $Al_2O_3$ than un-modifed $Al_2O_3$ was decreased reaction temperature to $200^{\circ}C$ with same decomposition rate. Also the appropriated cerium sulfate loadings on $Al_2O_3$ were 5~10 wt%.

• Journal of Sensor Science and Technology
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• v.1 no.2
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• pp.173-181
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• 1992

Tantalum pentoxide($Ta_{2}O_{5}$) thin films on p-type (100) silicon wafer were fabricated by RF reactive sputtering. Physical properties and structure of the specimens were examined by XRD and AES. From the C-V analysis, the dielectric constant of $Ta_{2}O_{5}$ films was in the range of 10-12 in the reactive gas atmosphere in which 10% of oxygen gas is mixed. The ratio of Ta : 0 was 1 : 2 and 1 : 2.49 by AES and RBS examination, respectively. The heat-treatment at $700^{\circ}C$ in $O_{2}$ ambient led to induce crystallization. When the heat-treatment temperature was $1000^{\circ}C$, the dielectric constant was 20.5 in $O_{2}$ ambient and 23 in $N_{2}$ ambient, respectively. The crystal structure of $Ta_{2}O_{5}$ film was pseudo hexagonal of ${\delta}-Ta_{2}O_{5}$. The flat band voltage shift(${\Delta}V_{FB}$) of the specimens and the leakage current density were decreased for higher oxygen mixing ratio. The maximum breakdown field was 2.4MV/cm at the oxygen mixing ratio of 10%. The $Ta_{2}O_{5}$ films will be applicable to hydrogen ion sensitive film and gate oxide material for memory device.