• Title/Summary/Keyword: silicon neural probe

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Neural Interface with a Silicon Neural Probe in the Advancement of Microtechnology

  • Oh, Seung-Jae;Song, Jong-Keun;Kim, Sung-June
    • Biotechnology and Bioprocess Engineering:BBE
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    • v.8 no.4
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    • pp.252-256
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    • 2003
  • In this paper we describe the status of a silicon-based microelectrode for neural recording and an advanced neural interface. We have developed a silicon neural probe, using a combination of plasma and wet etching techniques. This process enables the probe thickness to be controlled precisely. To enhance the CMOS compatibility in the fabrication process, we investigated the feasibility of the site material of the doped polycrystalline silicon with small grains of around 50 nm in size. This silicon electrode demonstrated a favorable performance with respect to impedance spectra, surface topography and acute neural recording. These results showed that the silicon neural probe can be used as an advanced microelectrode for neurological applications.

Fabrication of Depth-probe type Silicon Microelectrode array for Neural signal Recording (신경신호기록용 탐침형 반도체 미세전극 어레이의 제작)

  • Yoon, T.H.;Hwang, E.J.;Shin, D.Y.;Kim, S.J.
    • Proceedings of the KOSOMBE Conference
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    • v.1998 no.11
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    • pp.147-148
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    • 1998
  • In this paper, we developed the process for depth-probe type silicon microelectrode arrays. The process consists of four mask steps only. The steps are for defining sites, windows, and for shaping probe using plasma etch from above, and for shaping using wet etch from below, respectively. The probe thickness is controlled by dry etching, not by impurity diffusion. We used gold electrodes with a triple dielectric system consisting of oxide/nitride/oxide. The shank of the probe taper from 200um to tens of urn tip and has 30 um thickness.

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Fabrication of Depth Probe Type Semiconductor Microelectrode Arrays for Neural Recording Using Both Dry and wet Etching of Silicon (실리콘 건식식각과 습식식각을 이용한 신경 신호 기록용 탐침형 반도체 미세전극 어레이의 제작)

  • 신동용;윤태환;황은정;오승재;신형철;김성준
    • Journal of Biomedical Engineering Research
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    • v.22 no.2
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    • pp.145-150
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    • 2001
  • 대뇌 피질에 삽입하여 깊이에 따라 신경 신호를 기록하기 위한 탐침형 반도체 미세전극 어레이(depth-type silicon microelectrode array, 일명 SNU probe)를 제작하였다. 붕소를 확산시켜 생성된 고농도 p-type doping된 p+ 영역을 습식식각 정지점으로 사용하는 기존의 방법과 달리 실리콘 웨이퍼의 앞면을 건식식각하여 원하는 탐침 두께만큼의 깊이로 트렌치(trench)를 형성한 후 뒷면을 습식식각하는 방법으로 탐침 형태의 미세 구조를 만들었다. 제작된 반도체 미세전극 어레이의 탐침 두께는 30 $\mu\textrm{m}$이며 실리콘 건식식각을 위한 마스크로 6 $\mu\textrm{m}$ 두께의 LTO(low temperature oxide)를 사용하였다. 탐침의 두께는 개발된 본 공정을 이용해서 5~90 $\mu\textrm{m}$ 범위까지 쉽게 조절할 수 있었다. 탐침의 두께를 보다 쉽게 조절할 수 있게 됨에 따라 여러 신경조직에 필요한 다양한 구조의 반도체 미세전극 어레이를 개발할 수 있게 되었다. 본 공정을 이용해서 개발된 4채널 SUN probe를 사용하여 흰쥐의 제1차 체감각 피질에서 4채널 신경 신호를 동시에 기록하였으며, 전기적 특성검사에서 기존의 탐침형 반도체 미세전극, 텅스텐 전극과 대등하거나 우수한 신호대 잡음비(signal to noise ratio, SNR)특성을 가짐을 확인하였다.

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Neural Recordings Obtained from Peripheral Nerves Using Semiconductor Microelectrode (반도체 미세전극을 이용한 말초 신경에서의 신경 신호 기록)

  • Hwang, E.J.;Kim, S.J.;Cho, H.W.;Oh, W.T.
    • Proceedings of the KOSOMBE Conference
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    • v.1997 no.11
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    • pp.31-34
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    • 1997
  • A semiconductor microelectrode array has been successfully used in obtaining single unit recordings from medial giant nerve of clay fish, rat saphenous nerve and abdominal ganglia of aplysia. The recording device fabricated using silicon microfabrication techniques is a depth-probe type and, previously, has been mostly used to record from central nerve system of vertebrates. From invertebrates, and also from peripheral nerves of vertebrates, however, the quality of the recorded signal depends heavily on the recording conditions, such as the proximity of the electrode site to the nerve cells and the size of the neuron. We have modeled the signal to noise ratio as unctions of these parameters and compared the experimental data with the calculated values thus obtained.

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