• IE interfaces
• /
• v.11 no.2
• /
• pp.107-117
• /
• 1998

This paper presents a useful method of registration in manufacturing of shadow color mask for cathode ray tubes of the FTM (Flat Tension Mask) type, wherein the shadow mask and front panel are interchangeable when mask-panels are assembled, which is called ICM system. Theoretical analysis and alignment process are presented. The pattern of mask aperture is registered with a screen pattern of corresponding geometry of the panel in flat tension mask tube. Registration accuracy of panel and mask affects the purity of color cathode ray tube concerned with mislanding. It tries to minimize the misregistration caused by variances, which are mechanical error, mask stretching position error, restrictive number of fiducial point, etc.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2004.08a
• /
• pp.487-490
• /
• 2004

In order to simulate OLED evaporation process, modeling of directional distribution of the vaporized organic materials, film thickness distribution profile and pattern-mask shadow effect are required In accordance with many literatures; all of them except shadow effect modeling are studied and developed. In this paper, modeling algorithm of evaporation shadow is presented for process simulation of full-color OLED evaporating system. In OLED evaporating process the offset position of the point cell-source against the substrate rotation axis and the usage of the patterned mask are the principal causes for evaporation shadow. For geometric simulation of shadow using z-map, the film thickness profile, which is condensed on a glass substrate, is converted to the z-map data. In practical evaporation process, the glass substrate is rotated. This physical fact is solved and modeled mathematically for z-map simulation. After simulating the evaporation process, the z-map data can present the shadow-effected film thickness profile. Z-map is an efficient method in that the cross-sectional presentations of the film thickness profile and thickness distribution evaluation are easily and rapidly achieved.

• 제어로봇시스템학회:학술대회논문집
• /
• 1992.10b
• /
• pp.176-180
• /
• 1992

At the KACC'91 conference, we proposed a method of automatic detection of shape of the faulty holes of a shadow mask which is used in a cathode-ray tube of a color television. In this method, the image data are taken from two areas of the mask with CCD camera. Comparing the shape of holes in these two areas by use of a signal processing technique, we can find any fault in the shape of holes. This paper describes the effect of smoothing filters of effectively finding the faulty holes from the difference image data. A computer simulation and actual experiment with a shadow mask have shown that this method of fault detection is very effective for practical use.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2005.06a
• /
• pp.1277-1280
• /
• 2005

A high-aspect-ratio and high-resolution stainless steel shadow mask for organic thin-film transistors (OTFTs) circuit has been fabricated by a new method which combines photochemical machining, micro-electrical discharge machining (micro-EDM), and electrochemical etching (ECE). First, connection lines and source-drain holes are roughly machined by photochemical etching, and then the part of source and drain holes is finished by the combination of micro-EDM and ECE processes. Using this method a $100\;\mu{m}$ thick stainless steel (AISI 304) shadow mask for inverter can be fabricated with the channel length of $30\;\mu{m}\;and\;10\;\mu{m}\;respectively.\;The\;width\;of\;connection line\;is\;150\;\mu{m}$. The aspect ratio of the wall is about 5 and 15, respectively. Metal lines and source-drain electrodes of OTFTs were successfully deposited through the fabricated shadow mask.

• Transactions of the Korean Society for Noise and Vibration Engineering
• /
• v.15 no.5 s.98
• /
• pp.595-603
• /
• 2005

In this work, the multiple dynamic absorber( MDA ) is introduced to reduce several vibration modes of shadow mask simultaneously and its design method is developed from the theory of the simple dynamic absorber. When designing the dynamic absorber, there are three significant design parameters such as mass, damping ratio and tuning frequency. Therefore the sensitivity analysis for those parameters has been executed in order to find out the design criteria of multiple dynamic absorber using the finite element model of shadow mask. The multiple dynamic absorber(MDA) designed by the proposed method is tested theoretically and experimentally to estimate the efficiency of vibration reduction. From the results, it is verified that the method is feasible to apply the system having the multiple nitration modes and more efficient than the thin wire-type damper used commercially to reduce the vibration of shadow mask.

• Clean Technology
• /
• v.13 no.3
• /
• pp.188-194
• /
• 2007

In the present study, we developed a methodology to minimize a waste solution produced in the etching process. The condition for the optimization of the GRS process was studied on the basis of laboratory experiment and field test as well as pilot test. Through the study, we analyse the relation of the main process variables and the yield of the GRS process. The application of the new operation condition and the reactor internal modification results in 10% yield improvement in the GRS process and accordingly decreases a wasted solution.

• Journal of the Korean Society for Precision Engineering
• /
• v.17 no.8
• /
• pp.100-105
• /
• 2000

In this study the structural design concepts of main parameters of a Cathode Ray Tube(CRT) such as frame spring and shadow mask were proposed to guarantee a failure-proof CRT under mechanical shock. With computer simulation and experiments some information on the structural design concept was obtained as followings: the frame and the shadow mask of the CRT needed designing to increase strength so double-beads shape at the corner of frame was newly designed for it, And the spring which interconnected frame with panel glass was required to deform elastically for the purpose of absorbing the shock energy in the direction of drop. A new type of spring 'twisting spring' was designed to achieve the flexibility in that direction. By using it the deformation energy of a shadow mask could reduced to some degree. To accomplish those simulations commerical codes Pam-Crash and I-DEAS were used and a typical CRT was analyzed as an example to prove the usefulness of this study.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.08a
• /
• pp.321-323
• /
• 2012

유기 발광 다이오우드는(OLEDs) 자체 발광 소자로써 높은 시야각, 높은 효율, 그리고 빠른 응답속도 등의 장점을 가지고 있어 차세대 디스플레이 및 조명 소자로서 많은 연구가 진행되고 있다. 특히 유기 발광 다이오우드는 차세대 반도체 조명 소자로서 조명의 패러다임을 바꿀 수 있는 기술로 인식되고 있다. 하지만, 유기 발광 다이오우드 조명의 상용화를 위해서는 가격 경쟁력을 갖추는 것이 시급하며, 이를 위해 저가 공정 개발이 필요하다. 본 연구에서는 유기발광 다이오우드 조명 제작에 필수적인 전면 전극 및 절연막 증착 공정을 기존의 노광 공정이 아닌 shadow mask 기술을 적용하여 형성하였다. 먼저 유리 기판 상에 150 nm 두께의 ITO 막을 shadow mask를 이용하여 증착하였다. 기존 공정에서는 노광 및 식각 공정을 이용하여 증착하는 것이 일반적이며, 광학적, 전기적 특성 또한 타 공정 방법에 비해 우수하다. 하지만 일련의 복잡한 공정으로 인해 제조 원가를 상승 시키는 단점이 있다. Fig. 1은 shadow mask를 이용하여 ITO를 증착을 수행한 공정의 모식도이다. ITO 박막 증착 후 표면 거칠기 제어 및 면저항 제어를 위해 O2 plasma 처리와 RTA 공정을 추가 수행하였다. Fig. 2(a)는 플라즈마 처리 및 열처리 공정 수행 후에 측정한 표면 AFM 사진이다. 열처리 및 플라즈마 처리 후에 ITO 박막의 표면 거칠기는 10배 이상 향상되었으며, 이는 유기 발광 다이오우드 조명 소자의 전면 투명 전극으로 사용되기에 적합한 값이다. 또한 전기적 특성 중 하나인 면저항 값은 열처리 및 플라즈마 처리 전/후의 값에서 많은 차이를 보인다. 표면 거칠기가 향상됨에 따라 면저항 값 역시 향상되는 결과를 보여주는데, 표면 처리전후의 면저항 값은 각각 28.17, 13.18 ${\Omega}/{\Box}$이다. 일반적으로 유기 발광 다이오우드의 전면 투명 전극으로 사용되기 위해서는 15 ${\Omega}/{\Box}$이하의 면저항 값이 필요한데, 표면 처리 후의 면저항값들은 이로한 조건을 만족한다. Fig. 3은 shadow mask 기술을 이용하여 절연막까지 형성한 유기 발광 다이오우드 소자의 전자 현미경 사진으로, 기존의 공정을 이용한 경우와 큰 차이는 없으며, 다만 shadow tail이 약 $30{\mu}m$ 정도 발생함을 확인할 수 있다. 절연막의 특성 평가 기준인 누설 전류 밀도는 $10-5A/cm^2$으로 기존의 공정을 이용한 경우에 비해 95% 수준으로서 shadow mask를 이용한 공정이 기존의 노광 및 식각 공정을 이용한 경우에 비해 공정 수는 9개가 단축됨에도 불구하고, 각 증착 박막의 특성에는 큰 차이가 없음을 알 수 있다.

• Transactions of Materials Processing
• /
• v.12 no.2
• /
• pp.123-127
• /
• 2003

The cold rolling conditions for the ultra thin steel for tension mask are very important because the residual stress that affects the flatness of strip is generate during the cold rolling. The residual stress in the sheet causes etching curls when it suffers perforation process. The residual stress through the thickness. To estimate the residual stress and deformation due to etching curl. FEM analysis is performed. Numerical simulation employ a ANSY5 5.6 and an elastic-plastic constitutive equation. The simulation results indicate the distribution of residual stress in the rolled sheet can be controlled by selecting the rolling conditions properly.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2004.10a
• /
• pp.560-563
• /
• 2004

Invar is a compound metal of Fe-Ni system and contain 36％ Ni. The most distinction characteristic of Invar is the coefficient of thermal expansion is 1.0 10$^{-6}$ /$^{\circ}C$. That is a tenth of general steel material. This low thermal expansion characteristic of Invar is applied to the missile, aircraft, monitor CRT and frontier display's shadow mask such as FED and OLED. The usage of the Invar shadow mask for display is increasing due to the requirement of larger size and flatness monitor. The Invar shadow mask is machined by two ways electro-forming and laser now. However the electro-forming takes a too long time and the laser machining is accompanied with Burr. In this study, PEMM(pulse electrochemical micro machining) is conducted to machine the micro hole to the Invar and 80${\mu}{\textrm}{m}$ hole was machined.